دورية أكاديمية
Effects of elevated-temperature deposition on the atomic structure of amorphous Ta₂O₅ films
| العنوان: | Effects of elevated-temperature deposition on the atomic structure of amorphous Ta₂O₅ films |
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| المؤلفون: | Prasai, K., Lee, K., Baloukas, Bill, Cheng, H. P., Fazio, M., Martinu, Ludvik, Mehta, A., Menoni, C. S., Schiettekatte, F., Shink, R., Shyam, B., Vajente, G., Fejer, M. M., Bassiri, R. |
| بيانات النشر: | AIP Publishing |
| سنة النشر: | 2023 |
| المجموعة: | École Polytechnique de Montréal: PolyPublie |
| مصطلحات موضوعية: | 1900 Génie biomédical, 2500 Génie électrique et électronique, 3100 Physique, 3101 Études atomiques et moléculaires |
| الوصف: | Brownian thermal noise as a result of mechanical loss in optical coatings will become the dominant source of noise at the most sensitive frequencies of ground-based gravitational-wave detectors. Experiments found, however, that a candidate material, amorphous Ta2O5, is unable to form an ultrastable glass and, consequently, to yield a film with significantly reduced mechanical loss through elevated-temperature deposition alone. X-ray scattering PDF measurements are carried out on films deposited and subsequently annealed at various temperatures. Inverse atomic modeling is used to analyze the short and medium range features in the atomic structure of these films. Furthermore, in silico deposition simulations of Ta2O5 are carried out at various substrate temperatures and an atomic level analysis of the growth at high temperatures is presented. It is observed that upon elevated-temperature deposition, short range features remain identical, whereas medium range order increases. After annealing, however, both the short and medium range orders of films deposited at different substrate temperatures are nearly identical. A discussion on the surface diffusion and glass transition temperatures indicates that future pursuits of ultrastable low-mechanical-loss films through elevated temperature deposition should focus on materials with a high surface mobility, and/or lower glass transition temperatures in the range of achievable deposition temperatueres. |
| نوع الوثيقة: | article in journal/newspaper |
| وصف الملف: | text |
| اللغة: | English |
| العلاقة: | https://publications.polymtl.ca/57310/1/2023_Prasai_Effects_Elevated-temperature_Deposition_Atomic_Structure.pdfTest; Prasai, K., Lee, K., Baloukas, B., Cheng, H. P., Fazio, M., Martinu, L., Mehta, A., Menoni, C. S., Schiettekatte, F., Shink, R., Shyam, B., Vajente, G., Fejer, M. M., & Bassiri, R. (2023). Effects of elevated-temperature deposition on the atomic structure of amorphous Ta₂O₅ films. APL Materials, 11(12), 121112 (8 pages). |
| DOI: | 10.1063/5.0170100 |
| الإتاحة: | https://doi.org/10.1063/5.0170100Test https://publications.polymtl.ca/57310Test/ https://publications.polymtl.ca/57310/1/2023_Prasai_Effects_Elevated-temperature_Deposition_Atomic_Structure.pdfTest |
| حقوق: | cc_by |
| رقم الانضمام: | edsbas.DCB5DC9C |
| قاعدة البيانات: | BASE |
| DOI: | 10.1063/5.0170100 |
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