دورية أكاديمية
Schiff base precursor compounds for the chemical beam epitaxy of oxide thin films .1. Deposition of CuO on MgO[001] using copper(II) bis(benzoylacetone)-ethylendiimine
العنوان: | Schiff base precursor compounds for the chemical beam epitaxy of oxide thin films .1. Deposition of CuO on MgO[001] using copper(II) bis(benzoylacetone)-ethylendiimine |
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المؤلفون: | Fritsch, E, Machler, E, Arrouy, F, Berke, H, Povey, I, Willmott, PR, Locquet, Jean-Pierre |
بيانات النشر: | AMER INST PHYSICS WOODBURY |
سنة النشر: | 1996 |
المجموعة: | KU Leuven: Lirias |
مصطلحات موضوعية: | GROWTH, OXYGEN, VAPOR, MOCVD, CU2O, MGO |
الوصف: | A new precursor compound for the deposition of copper oxide thin films under molecular beam conditio us, copper bis(benzoylacetone)-ethylenediimine, has been characterized by thermal analysis and in situ mass spectrometry. Its stability and decomposition behavior are reported as well as its use for the deposition of epitaxial cooper oxide thin films on MgO. (C) 1996 American Vacuum Society. ; status: published |
نوع الوثيقة: | article in journal/newspaper |
اللغة: | English |
تدمد: | 0734-2101 |
العلاقة: | Journal of vacuum science & technology. A, An international journal devoted to vacuum, surfaces, and films vol:14 issue:6 pages:3208-3213; date:IBM CORP,DIV RES,ZURICH RES LAB,CH-8803 RUSCHLIKON,SWITZERLAND; UNIV ZURICH,INST ORGAN CHEM,CH-8057 ZURICH,SWITZERLAND; https://lirias.kuleuven.be/handle/123456789/141074Test |
الإتاحة: | https://lirias.kuleuven.be/handle/123456789/141074Test |
رقم الانضمام: | edsbas.52385C8 |
قاعدة البيانات: | BASE |
تدمد: | 07342101 |
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