Valley-dependent topologically protected elastic waves using continuous graphene membranes on patterned substrates
العنوان: | Valley-dependent topologically protected elastic waves using continuous graphene membranes on patterned substrates |
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المؤلفون: | Jaehyung Hong, Joo Hwan Oh, Sung Youb Kim, Harold S. Park |
المصدر: | Nanoscale. 12:8997-9004 |
بيانات النشر: | Royal Society of Chemistry (RSC), 2020. |
سنة النشر: | 2020 |
مصطلحات موضوعية: | Materials science, Condensed matter physics, Graphene, Wave propagation, 02 engineering and technology, Substrate (electronics), 021001 nanoscience & nanotechnology, 01 natural sciences, law.invention, Membrane, Lattice constant, Hall effect, law, 0103 physical sciences, Nano, General Materials Science, 010306 general physics, 0210 nano-technology, Mechanical wave |
الوصف: | We present a novel structure for topologically protected propagation of mechanical waves in a continuous, elastic membrane using an analog of the quantum valley Hall effect. Our system involves a thin, continuous graphene monolayer lying on a pre-patterned substrate, and as such, it can be employed across multiple length scales ranging from the nano to macroscales. This enables it to support topologically-protected waves at frequencies that can be tuned from the kHz to GHz range by either selective pre-tensioning of the overlaying membrane, or by increasing the lattice parameter of the underlying substrate. We show through numerical simulations that this continuous system is robust against imperfections, is immune to backscattering losses, and supports topologically-protected wave propagation along all available paths and angles. We demonstrate the ability to support topologically-protected interface modes using monolayer graphene, which does not intrinsically support topologically non-trivial elastic waves. |
تدمد: | 2040-3372 2040-3364 |
الوصول الحر: | https://explore.openaire.eu/search/publication?articleId=doi_dedup___::41520c2b71ecbc1ec4011bad7453cef9Test https://doi.org/10.1039/c9nr09809gTest |
حقوق: | CLOSED |
رقم الانضمام: | edsair.doi.dedup.....41520c2b71ecbc1ec4011bad7453cef9 |
قاعدة البيانات: | OpenAIRE |
تدمد: | 20403372 20403364 |
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