التفاصيل البيبلوغرافية
| العنوان: |
Publication Guidelines for Semiconductor Plasma-Etch Technology |
| المؤلفون: |
Harry J. Levinson |
| المصدر: |
Journal of Micro/Nanopatterning, Materials, and Metrology. 20 |
| بيانات النشر: |
SPIE-Intl Soc Optical Eng, 2021. |
| سنة النشر: |
2021 |
| مصطلحات موضوعية: |
Materials science, ComputerSystemsOrganization_COMPUTERSYSTEMIMPLEMENTATION, business.industry, Hardware_PERFORMANCEANDRELIABILITY, Plasma, GeneralLiterature_MISCELLANEOUS, Metrology, law.invention, Semiconductor, Semiconductor plasma, Etching (microfabrication), law, Hardware_INTEGRATEDCIRCUITS, Optoelectronics, Photolithography, business |
| الوصف: |
Editor-in-Chief Harry Levinson outlines new guidelines for semiconductor plasma-etch technology. |
| تدمد: |
2708-8340 |
| الوصول الحر: |
https://explore.openaire.eu/search/publication?articleId=doi_________::70bb23fbe7ab0dd1fc9f011856b69b2cTest
https://doi.org/10.1117/1.jmm.20.4.040103Test |
| حقوق: |
OPEN |
| رقم الانضمام: |
edsair.doi...........70bb23fbe7ab0dd1fc9f011856b69b2c |
| قاعدة البيانات: |
OpenAIRE |
