التفاصيل البيبلوغرافية
| العنوان: |
Effect of He+ ion implantation on Rb+-K+ exchanged KTiOPO4 optical waveguide. |
| المؤلفون: |
Wang, Liang-Ling1 sps_wangll@ujn.edu.cn, Cui, Xiao-Jun1 ss_cuixj@ujn.edu.cn, Liu, Nian-Qiao1 Liunianqiao126@126.com |
| المصدر: |
Modern Physics Letters B. Aug2018, Vol. 32 Issue 24, pN.PAG-N.PAG. 9p. |
| مصطلحات موضوعية: |
*OPTICAL properties of potassium titanyl phosphates, *ION implantation, *ION exchange (Chemistry), *OPTICAL waveguides, *X-ray diffraction |
| مستخلص: |
We report on the effect of 500 keV He + ion implantation with a fluence of 3 × 1 0 1 6 ions/cm2 on Rb + -K + ion exchanged KTiOPO4 optical waveguide. The refractive index distribution after ion implantation, ion exchange, and ion implantation and subsequent ion exchange were reconstructed by reflectivity calculation method, inverse Wentzel–Kramers–Brillouin, and intensity calculation method, respectively. The near field intensity distribution of the waveguides was simulated by Beam Propagation Method. The phase analysis of the samples was measured by X-ray diffraction technique. The damage layer formed in the depth of maximum nuclear energy deposition by ion implantation acts as a barrier to block the ions diffusion into the sample. Results exhibit that ion implantation and subsequent ion exchange are effective means for optical waveguide formation. [ABSTRACT FROM AUTHOR] |
| قاعدة البيانات: |
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