دورية أكاديمية

Schiff base precursor compounds for the chemical beam epitaxy of oxide thin films .1. Deposition of CuO on MgO[001] using copper(II) bis(benzoylacetone)-ethylendiimine

التفاصيل البيبلوغرافية
العنوان: Schiff base precursor compounds for the chemical beam epitaxy of oxide thin films .1. Deposition of CuO on MgO[001] using copper(II) bis(benzoylacetone)-ethylendiimine
المؤلفون: Fritsch, E, Machler, E, Arrouy, F, Berke, H, Povey, I, Willmott, PR, Locquet, Jean-Pierre
بيانات النشر: AMER INST PHYSICS
WOODBURY
سنة النشر: 1996
المجموعة: KU Leuven: Lirias
مصطلحات موضوعية: GROWTH, OXYGEN, VAPOR, MOCVD, CU2O, MGO
الوصف: A new precursor compound for the deposition of copper oxide thin films under molecular beam conditio us, copper bis(benzoylacetone)-ethylenediimine, has been characterized by thermal analysis and in situ mass spectrometry. Its stability and decomposition behavior are reported as well as its use for the deposition of epitaxial cooper oxide thin films on MgO. (C) 1996 American Vacuum Society. ; status: published
نوع الوثيقة: article in journal/newspaper
اللغة: English
تدمد: 0734-2101
العلاقة: Journal of vacuum science & technology. A, An international journal devoted to vacuum, surfaces, and films vol:14 issue:6 pages:3208-3213; date:IBM CORP,DIV RES,ZURICH RES LAB,CH-8803 RUSCHLIKON,SWITZERLAND; UNIV ZURICH,INST ORGAN CHEM,CH-8057 ZURICH,SWITZERLAND; https://lirias.kuleuven.be/handle/123456789/141074Test
الإتاحة: https://lirias.kuleuven.be/handle/123456789/141074Test
رقم الانضمام: edsbas.52385C8
قاعدة البيانات: BASE