المؤلفون: Yue Sun, Xuanwu Kang, Yingkui Zheng, Ke Wei, Pengfei Li, Wenbo Wang, Xinyu Liu, Guoqi Zhang

المصدر: Nanomaterials; Volume 10; Issue 4; Pages: 657

مصطلحات موضوعية: GaN, inductively coupled plasma (ICP), mesa, sidewall profile, quasi-vertical, Schottky barrier diode (SBD), dry etch

وصف الملف: application/pdf

العلاقة: https://dx.doi.org/10.3390/nano10040657Test

الإتاحة: https://doi.org/10.3390/nano10040657Test

المؤلفون: Sun, Y. (author), Kang, Xuanwu (author), Zheng, Yingkui (author), Wei, Ke (author), Li, Pengfei (author), Wang, Wenbo (author), Liu, Xinyu (author), Zhang, Kouchi (author)

مصطلحات موضوعية: Dry etch, GaN, Inductively coupled plasma (ICP), Mesa, Quasi-vertical, Schottky barrier diode (SBD), Sidewall profile

العلاقة: http://www.scopus.com/inward/record.url?scp=85083191406&partnerID=8YFLogxKTest; Nanomaterials--2079-4991--c3d209c3-afaf-4fee-b828-18cbf52471bf; http://resolver.tudelft.nl/uuid:e0a4f1dd-2798-442c-b5c1-e139b49321acTest; https://doi.org/10.3390/nano10040657Test

الإتاحة: https://doi.org/10.3390/nano10040657Test
http://resolver.tudelft.nl/uuid:e0a4f1dd-2798-442c-b5c1-e139b49321acTest

المؤلفون: Liao, E.B., Teh, W.H., Teoh, K.W., Tay, A.A.O., Feng, H.H., Kumar, R.

المساهمون: MECHANICAL ENGINEERING

المصدر: Scopus

مصطلحات موضوعية: BCB, Etch rate, Selectivity, Sidewall profile

العلاقة: Liao, E.B., Teh, W.H., Teoh, K.W., Tay, A.A.O., Feng, H.H., Kumar, R. (2006-05-10). Etching control of benzocyclobutene in CF4 / O2 and SF6 / O2 plasmas with thick photoresist and titanium masks. Thin Solid Films 504 (1-2) : 252-256. ScholarBank@NUS Repository. https://doi.org/10.1016/j.tsf.2005.09.159Test; http://scholarbank.nus.edu.sg/handle/10635/85960Test; 000236486200060

الإتاحة: https://doi.org/10.1016/j.tsf.2005.09.159Test
http://scholarbank.nus.edu.sg/handle/10635/85960Test

المؤلفون: Škutek, Bohumil

المساهمون: Maňas, Miroslav, Šanda, Štěpán

مصطلحات موضوعية: kaučuková směs, míchání, vytlačování, fyzikálně mechanické vlastnosti, RPA 2000, smykový modul, ztrátový faktor, dynamická viskozita, profil bočnice, rubber compound, mixing, extrusion, physical ? mechanical properties, shear modulus, loss factor, dynamic viscosity, sidewall profile

وصف الملف: 80 s.; 3082453 bytes; application/pdf

العلاقة: Elektronický archiv Knihovny UTB; http://hdl.handle.net/10563/23408Test; 25916

الإتاحة: http://hdl.handle.net/10563/23408Test

المؤلفون: SOO CHOI PHENG

المساهمون: MATERIALS SCIENCE, VALIYAVEETTIL, SURESH, YEADON, MARK, PHILPOTT, MICHAEL R

مصطلحات موضوعية: photoresist, lithography, photoacid diffusion, sidewall profile, etch resistance, pattern placement accuracy

العلاقة: SOO CHOI PHENG (2006-03-01). Design and optimization of lithographic materials and processing. ScholarBank@NUS Repository.; http://scholarbank.nus.edu.sg/handle/10635/15063Test; NOT_IN_WOS

الإتاحة: http://scholarbank.nus.edu.sg/handle/10635/15063Test

مصطلحات الفهرس: Dry etch, GaN, Inductively coupled plasma (ICP), Mesa, Quasi-vertical, Schottky barrier diode (SBD), Sidewall profile, journal article

URL: http://resolver.tudelft.nl/uuid:e0a4f1dd-2798-442c-b5c1-e139b49321acTest
http://www.scopus.com/inward/record.url?scp=85083191406&partnerID=8YFLogxKTest
http://www.scopus.com/inward/record.url?scp=85083191406&partnerID=8YFLogxKTest
Nanomaterials--2079-4991--c3d209c3-afaf-4fee-b828-18cbf52471bf

مصطلحات الفهرس: Dry etch, GaN, Inductively coupled plasma (ICP), Mesa, Quasi-vertical, Schottky barrier diode (SBD), Sidewall profile, journal article

URL: http://resolver.tudelft.nl/uuid:e0a4f1dd-2798-442c-b5c1-e139b49321acTest
http://www.scopus.com/inward/record.url?scp=85083191406&partnerID=8YFLogxKTest
http://www.scopus.com/inward/record.url?scp=85083191406&partnerID=8YFLogxKTest
Nanomaterials--2079-4991--c3d209c3-afaf-4fee-b828-18cbf52471bf