المؤلفون: Jonathan E. Thomas, Katharina Stapelmann

المصدر: Plasma, Vol 7, Iss 2, Pp 386-426 (2024)

مصطلحات موضوعية: plasma control, predictive control, cold atmospheric plasma, machine learning, plasma processing, dielectric barrier discharge, Physics, QC1-999, Plasma physics. Ionized gases, QC717.6-718.8

وصف الملف: electronic resource

العلاقة: https://www.mdpi.com/2571-6182/7/2/22Test; https://doaj.org/toc/2571-6182Test

الوصول الحر: https://doaj.org/article/a40648822d5847fdaf9d63af770bffe3Test

المؤلفون: Kenji Ishikawa, Kazunori Koga, Noriyasu Ohno

المصدر: Plasma, Vol 7, Iss 1, Pp 160-177 (2024)

مصطلحات موضوعية: plasma-driven sciences, plasma processing, plasma-wall interactions, plasma agriculture, plasma seed science, Physics, QC1-999, Plasma physics. Ionized gases, QC717.6-718.8

وصف الملف: electronic resource

العلاقة: https://www.mdpi.com/2571-6182/7/1/11Test; https://doaj.org/toc/2571-6182Test

الوصول الحر: https://doaj.org/article/6de1109ed7c341029c3ac38793672f65Test

المؤلفون: E. J. M. Van Heesch, T. Huiskamp, K. Yan, F. J. C. M. Beckers, H. W. M. Smulders, G. J. J. Winands, R. H. P. Lemmens, P. P. M. Blom, S. Davalos Segura, W. F. L. M. Hoeben, S. V. B. Van Paasen, J. J. Van Oorschot, A. G. A. Bonkestoter, M. L. J. Van Den Brand, M. Hennink, R. W. J. Smulders, A. J. M. Pemen, P. C. T. Van Der Laan

المصدر: Frontiers in Chemistry, Vol 12 (2024)

مصطلحات موضوعية: cold plasma, nanosecond pulses, pulsed processing, plasma processing, VOC, emission control, Chemistry, QD1-999

وصف الملف: electronic resource

العلاقة: https://www.frontiersin.org/articles/10.3389/fchem.2024.1386055/fullTest; https://doaj.org/toc/2296-2646Test

الوصول الحر: https://doaj.org/article/40e3ccd3cc2c496bbc9abd60a7657904Test

المؤلفون: Ruoyu Han, Yuchen Cao, Pengfei Li, Jing Xie, Xi Chen

المصدر: Energy Reports, Vol 9, Iss , Pp 213-220 (2023)

مصطلحات موضوعية: Aerogel, Nanomaterial preparation, Surface modification, Plasma processing, Electrical explosion, Electrical engineering. Electronics. Nuclear engineering, TK1-9971

وصف الملف: electronic resource

العلاقة: http://www.sciencedirect.com/science/article/pii/S2352484723004225Test; https://doaj.org/toc/2352-4847Test

الوصول الحر: https://doaj.org/article/7b2e942deaa14cc8be10693128278d9bTest

المؤلفون: Villeneuve-Faure, C, Mitronika, Maria, Dan, A, P, Boudou, Laurent, Ravisy, William, Besland, M, P, Richard-Plouet, Mireille, Goullet, Antoine

المساهمون: Diélectriques Solides et Fiabilité (LAPLACE-DSF), LAboratoire PLasma et Conversion d'Energie (LAPLACE), Université Toulouse III - Paul Sabatier (UT3), Université de Toulouse (UT)-Université de Toulouse (UT)-Centre National de la Recherche Scientifique (CNRS)-Institut National Polytechnique (Toulouse) (Toulouse INP), Université de Toulouse (UT)-Université Toulouse III - Paul Sabatier (UT3), Université de Toulouse (UT), Institut des Matériaux de Nantes Jean Rouxel (IMN), Institut de Chimie - CNRS Chimie (INC-CNRS)-Centre National de la Recherche Scientifique (CNRS)-Nantes université - UFR des Sciences et des Techniques (Nantes univ - UFR ST), Nantes Université - pôle Sciences et technologie, Nantes Université (Nantes Univ)-Nantes Université (Nantes Univ)-Nantes Université - pôle Sciences et technologie, Nantes Université (Nantes Univ)-Nantes Université (Nantes Univ)-Nantes Université - Ecole Polytechnique de l'Université de Nantes (Nantes Univ - EPUN), Nantes Université (Nantes Univ)-Nantes Université (Nantes Univ), French GDR SEEDS

المصدر: EISSN: 2632-959X ; Nano Express ; https://hal.science/hal-04549301Test ; Nano Express, 2024, 5 (1), pp.015010. ⟨10.1088/2632-959x/ad220d⟩

مصطلحات موضوعية: TiO2-SiO2 nanocomposite thin films, atomic force microscopy, low-pressure plasma processing, dielectric thin films, [CHIM.MATE]Chemical Sciences/Material chemistry, [PHYS]Physics [physics]

العلاقة: hal-04549301; https://hal.science/hal-04549301Test; https://hal.science/hal-04549301/documentTest; https://hal.science/hal-04549301/file/Villeneuve-Faure_2024_Nano_Express_5_015010.pdfTest

الإتاحة: https://doi.org/10.1088/2632-959x/ad220dTest
https://hal.science/hal-04549301Test
https://hal.science/hal-04549301/documentTest
https://hal.science/hal-04549301/file/Villeneuve-Faure_2024_Nano_Express_5_015010.pdfTest

المؤلفون: Khanit Matra, Wanattapong Aryuwong, Wichayada Meetang, Suparada Ruthairat, Chanchai Dechthummarong, Wutthichok Sangwang, Vijitra Luang-In

المصدر: IEEE Access, Vol 11, Pp 114777-114789 (2023)

مصطلحات موضوعية: Inulin, polysaccharide, depolymerization, antioxidant, plasma–liquid interactions, solution plasma processing, Electrical engineering. Electronics. Nuclear engineering, TK1-9971

وصف الملف: electronic resource

العلاقة: https://ieeexplore.ieee.org/document/10268923Test/; https://doaj.org/toc/2169-3536Test

الوصول الحر: https://doaj.org/article/8f9099dd4d7646b3879e66523480b48eTest

المؤلفون: C Villeneuve-Faure, M Mitronika, A P Dan, L Boudou, W Ravisy, M P Besland, M Richard-Plouet, A Goullet

المصدر: Nano Express, Vol 5, Iss 1, p 015010 (2024)

مصطلحات موضوعية: TiO2–SiO2 nanocomposite thin films, atomic force microscopy, low-pressure plasma processing, dielectric thin films, Chemical technology, TP1-1185

وصف الملف: electronic resource

العلاقة: https://doaj.org/toc/2632-959XTest

الوصول الحر: https://doaj.org/article/988d8f0423cc496fb787a6b8e3a9cffcTest

المؤلفون: Ye Rin Lee, Do Yeob Kim, Jae Young Kim, Da Hye Lee, Gyu Tae Bae, Hyojun Jang, Joo Young Park, Sunghoon Jung, Eun Young Jung, Choon-Sang Park, Hyung-Kun Lee, Heung-Sik Tae

المصدر: Nanomaterials, Vol 14, Iss 1, p 40 (2023)

مصطلحات موضوعية: air–liquid discharge, organic compound decomposition, pin–liquid barrier discharge, pin–liquid discharge, plasma processing, total dissolved phosphorus, Chemistry, QD1-999

وصف الملف: electronic resource

العلاقة: https://www.mdpi.com/2079-4991/14/1/40Test; https://doaj.org/toc/2079-4991Test

الوصول الحر: https://doaj.org/article/0b2878613d07438c8bcbc6b87fc61f80Test

المؤلفون: Minsu Choi, Youngseok Lee, Yebin You, Chulhee Cho, Wonnyoung Jeong, Inho Seong, Byeongyeop Choi, Sijun Kim, Youbin Seol, Shinjae You, Geun Young Yeom

المصدر: Materials, Vol 16, Iss 16, p 5624 (2023)

مصطلحات موضوعية: plasma processing, greenhouse effect, greenhouse gas, global warming potential, alternative precursors, C4F8, Technology, Electrical engineering. Electronics. Nuclear engineering, TK1-9971, Engineering (General). Civil engineering (General), TA1-2040, Microscopy, QH201-278.5, Descriptive and experimental mechanics, QC120-168.85

وصف الملف: electronic resource

العلاقة: https://www.mdpi.com/1996-1944/16/16/5624Test; https://doaj.org/toc/1996-1944Test

الوصول الحر: https://doaj.org/article/eb7cc9d5599c426b9a57e264a096c7f0Test

المؤلفون: Sharma, Sarveshwar, Sirse, Nishant, Turner, Miles M., Kuley, Animesh

مصطلحات موضوعية: Computer simulation, Electronic engineering, Plasma processing, Plasmas

وصف الملف: application/pdf

العلاقة: https://doras.dcu.ie/29976Test/; https://sciencedirect.com/science/article/abs/pii/S0375960124000410Test; https://doi.org/10.48550/arXiv.2309.08310Test; https://doras.dcu.ie/29976/1/Manuscript%20V8_SS_final.pdfTest; Sharma, Sarveshwar, Sirse, Nishant, Turner, Miles M. orcid logoorcid:0000-0001-9713-6198 and Kuley, Animesh (2023) A harmonic study of electric field nonlinearity and field reversal in collisionless capacitive discharges driven by sawtooth-like waveforms. Physics Letters A, 498 . p. 129346.

الإتاحة: https://doi.org/10.48550/arXiv.2309.08310Test
https://doras.dcu.ie/29976/1/Manuscript%20V8_SS_final.pdfTest