دورية أكاديمية

Effective Optimization Strategy for Electron Beam Lithography of Molecular Glass Negative Photoresist

التفاصيل البيبلوغرافية
العنوان: Effective Optimization Strategy for Electron Beam Lithography of Molecular Glass Negative Photoresist
المؤلفون: Jiaxing Gao, Siliang Zhang, Xuewen Cui, Xue Cong, Xudong Guo, Rui Hu, Shuangqing Wang, Jinping Chen, Yi Li, Guoqiang Yang
المصدر: Advanced Materials Interfaces, Vol 10, Iss 20, Pp n/a-n/a (2023)
بيانات النشر: Wiley-VCH, 2023.
سنة النشر: 2023
المجموعة: LCC:Physics
LCC:Technology
مصطلحات موضوعية: electron beam lithography, molecular glass negative photoresists, photoacid generators, photodegradable nucleophiles, Physics, QC1-999, Technology
الوصف: Abstract As the crucial dimension (CD) of logic circuits continues to shrink, the photoresist metrics, including resolution, line edge roughness, and sensitivity, are faced with significant challenges. Photoresists are indispensable in the integrated circuit manufacturing industry, and specifically in achieving smaller critical dimensions. In this study, the effects of two categories of photosensitive compounds on lithography performance are explored, through a series of sulfonium salt‐based photoacid generators (PAGs) with diverse reactivity and photodegradable nucleophiles (PDNs) with varying nucleophilicity. The detailed characterization and exposure experiments suggest that the reactive alterations of different PAGs are mostly associated with the amount of phenyl composed of cations in PAGs. The “PDN first, PAG second” strategy, which employs a combination of low reactivity PAG and high reactivity PDN and involves PDN decomposition first and PAG decomposition second in the electron beam lithography process, achieves high sensitivity (100–270 µC cm−2), high resolution (25 nm 1:1 line/space, L/S), and low line edge roughness (LER ≤ 3.3 nm) stripes. This approach outperforms conventional formulations and may provide a potentially effective and useful strategy to improve electron beam photoresists.
نوع الوثيقة: article
وصف الملف: electronic resource
اللغة: English
تدمد: 2196-7350
العلاقة: https://doaj.org/toc/2196-7350Test
DOI: 10.1002/admi.202300194
الوصول الحر: https://doaj.org/article/d2d1ae8dc0e64c1fba2863baddb479d8Test
رقم الانضمام: edsdoj.2d1ae8dc0e64c1fba2863baddb479d8
قاعدة البيانات: Directory of Open Access Journals
الوصف
تدمد:21967350
DOI:10.1002/admi.202300194