المؤلفون: Greengard, Samuel¹ (AUTHOR)

المصدر: Communications of the ACM. Jul2024, Vol. 67 Issue 7, p14-16. 3p.

مصطلحات موضوعية: *INTEGRATED circuits, LITHOGRAPHY, NANOIMPRINT lithography, EXTREME ultraviolet lithography, SEMICONDUCTORS, MOORE'S law

الشركة/الكيان: ASML Holding NV , CANON Inc. CANNY

المؤلفون: Endo, Kensaku¹ (AUTHOR), Hashiyada, Shun^2,3 (AUTHOR), Narushima, Tetsuya^2,3 (AUTHOR), Togawa, Yoshihiko¹ (AUTHOR) ytogawa@omu.ac.jp, Okamoto, Hiromi^2,3 (AUTHOR) aho@ims.ac.jp

المصدر: Journal of Chemical Physics. 12/21/2023, Vol. 159 Issue 23, p1-10. 10p.

مصطلحات موضوعية: *ROTATIONAL symmetry, *ELECTRON beam lithography, *OPTICAL measurements, *NANOSTRUCTURES, *RECIPROCITY (Psychology)

المؤلفون: Cui, Xuewen¹ (AUTHOR), Zhang, Siliang¹ (AUTHOR), Cong, Xue¹ (AUTHOR), Gao, Jiaxing¹ (AUTHOR), Wu, Yurui¹ (AUTHOR), Guo, Xudong¹ (AUTHOR) scoopguo@iccas.ac.cn, Hu, Rui¹ (AUTHOR), Wang, Shuangqing¹ (AUTHOR) g1704@iccas.ac.cn, Chen, Jinping² (AUTHOR), Li, Yi² (AUTHOR), Du, Wenna³ (AUTHOR), Yang, Guoqiang¹ (AUTHOR) gqyang@iccas.ac.cn

المصدر: Nanotechnology. 7/15/2024, Vol. 35 Issue 29, p1-10. 10p.

مصطلحات موضوعية: *ELECTRON beam lithography, *ELECTRON beams, *IODONIUM salts, *MOLECULAR structure, *ETHANOL, *LITHOGRAPHY

المؤلفون: Hassaan, Muhammad¹ (AUTHOR) muhammadhassaan@ieee.org, Saleem, Umama¹ (AUTHOR), Singh, Akash¹ (AUTHOR), Haque, Abrar Jawad¹ (AUTHOR), Wang, Kaiying¹ (AUTHOR) kaiying.wang@usn.no

المصدر: Materials (1996-1944). Jun2024, Vol. 17 Issue 11, p2552. 18p.

مصطلحات موضوعية: *PHOTORESISTS, *EXTREME ultraviolet lithography, *PHOTOLITHOGRAPHY, *ULTRAVIOLET lithography, *LITHOGRAPHY, *ELECTRON beam lithography

المؤلفون: Kim, Minsu¹ (AUTHOR), Kyeong, Dokyung¹ (AUTHOR), Kwak, Moon Kyu¹ (AUTHOR) mkkwak@knu.ac.kr

المصدر: Small Structures. Jun2024, Vol. 5 Issue 6, p1-9. 9p.

مصطلحات موضوعية: *LITHOGRAPHY, *MICROSTRUCTURE, *FEMTOSECOND lasers, *SOFT lithography

المؤلفون: Komiya, Kazuki^1,2 (AUTHOR) komiya.kazuki@iri-tokyo.jp, Nagata, Koki¹ (AUTHOR), Yamaoka, Hidehiko¹ (AUTHOR), Date, Shuichi¹ (AUTHOR), Miyashita, Yuito¹ (AUTHOR), Yan, Min² (AUTHOR)

المصدر: Electronics & Communications in Japan. Mar2024, Vol. 107 Issue 1, p1-5. 5p.

مصطلحات موضوعية: ELECTRON beam lithography, ELECTRIC fields, MICROFABRICATION

المؤلفون: Andersen, Molly P.^1,2 (AUTHOR), Rodenbach, Linsey K.^2,3 (AUTHOR), Rosen, Ilan T.^2,4 (AUTHOR), Lin, Stanley C.⁵ (AUTHOR), Pan, Lei⁶ (AUTHOR), Zhang, Peng⁶ (AUTHOR), Tai, Lixuan⁶ (AUTHOR), Wang, Kang L.⁶ (AUTHOR), Kastner, Marc A.^2,3,7 (AUTHOR), Goldhaber-Gordon, David^2,3 (AUTHOR) goldhaber-gordon@stanford.edu

المصدر: Journal of Applied Physics. 6/28/2023, Vol. 133 Issue 24, p1-10. 10p.

مصطلحات موضوعية: *ELECTRON beam lithography, *TOPOLOGICAL insulators, *THIN films, *CONDENSED matter physics, *ELECTRON beams, *NANOSTRUCTURES, *MAJORANA fermions

المؤلفون: Cui, Siyuan¹ (AUTHOR), Sun, Ke¹ (AUTHOR), Liao, Zhefu¹ (AUTHOR), Zhou, Qianxi¹ (AUTHOR), Jin, Leonard² (AUTHOR), Jin, Conglong³ (AUTHOR), Hu, Jiahui³ (AUTHOR), Wen, Kuo-Sheng³ (AUTHOR), Liu, Sheng^1,4 (AUTHOR) victor_liu63@vip.126.com, Zhou, Shengjun^1,4 (AUTHOR) zhousj@whu.edu.cn

المصدر: Science Bulletin. Jul2024, Vol. 69 Issue 13, p2080-2088. 9p.

مصطلحات موضوعية: *NANOIMPRINT lithography, *OPTOELECTRONIC devices, *SUBSTRATES (Materials science), *ALUMINUM oxide, *DISLOCATION density

المؤلفون: Safaefar, Firouz¹, Karamde, Javad² j-karamdel@azad.ac.ir, Veladi, Hadi^1,3 veladi@tabrizu.ac.ir, Maleki, Masoud^1,4

المصدر: BioImpacts. Jul2024, Vol. 14 Issue 4, p1-8. 8p.

مصطلحات موضوعية: *LABS on a chip, *SOFT lithography, *MICROFLUIDIC devices, *OVUM, *SPERMATOZOA, *REPRODUCTIVE technology, *MICROLITHOGRAPHY

المؤلفون: Nuguri, Sravya M.¹, Shreiber, Daniel², Cerjan, Benjamin³, Einck, Vincent¹, Halas, Naomi J.³, Griep, Mark H.² mark.h.griep.civ@army.mil, Watkins, James J.³ watkins@polysci.umass.edu

المصدر: Advanced Optical Materials. Jun2024, p1. 11p. 6 Illustrations, 1 Chart.

مصطلحات موضوعية: *FANO resonance, *NANOIMPRINT lithography, *WEARABLE technology, *COLOR, *METAMATERIALS, *OPTOELECTRONIC devices