المؤلفون: Endo, Kensaku¹ (AUTHOR), Hashiyada, Shun^2,3 (AUTHOR), Narushima, Tetsuya^2,3 (AUTHOR), Togawa, Yoshihiko¹ (AUTHOR) ytogawa@omu.ac.jp, Okamoto, Hiromi^2,3 (AUTHOR) aho@ims.ac.jp

المصدر: Journal of Chemical Physics. 12/21/2023, Vol. 159 Issue 23, p1-10. 10p.

مصطلحات موضوعية: *ROTATIONAL symmetry, *ELECTRON beam lithography, *OPTICAL measurements, *NANOSTRUCTURES, *RECIPROCITY (Psychology)

المؤلفون: Komiya, Kazuki^1,2 (AUTHOR) komiya.kazuki@iri-tokyo.jp, Nagata, Koki¹ (AUTHOR), Yamaoka, Hidehiko¹ (AUTHOR), Date, Shuichi¹ (AUTHOR), Miyashita, Yuito¹ (AUTHOR), Yan, Min² (AUTHOR)

المصدر: Electronics & Communications in Japan. Mar2024, Vol. 107 Issue 1, p1-5. 5p.

مصطلحات موضوعية: ELECTRON beam lithography, ELECTRIC fields, MICROFABRICATION

المؤلفون: Andersen, Molly P.^1,2 (AUTHOR), Rodenbach, Linsey K.^2,3 (AUTHOR), Rosen, Ilan T.^2,4 (AUTHOR), Lin, Stanley C.⁵ (AUTHOR), Pan, Lei⁶ (AUTHOR), Zhang, Peng⁶ (AUTHOR), Tai, Lixuan⁶ (AUTHOR), Wang, Kang L.⁶ (AUTHOR), Kastner, Marc A.^2,3,7 (AUTHOR), Goldhaber-Gordon, David^2,3 (AUTHOR) goldhaber-gordon@stanford.edu

المصدر: Journal of Applied Physics. 6/28/2023, Vol. 133 Issue 24, p1-10. 10p.

مصطلحات موضوعية: *ELECTRON beam lithography, *TOPOLOGICAL insulators, *THIN films, *CONDENSED matter physics, *ELECTRON beams, *NANOSTRUCTURES, *MAJORANA fermions

المؤلفون: Cui, Xuewen¹ (AUTHOR), Zhang, Siliang¹ (AUTHOR), Cong, Xue¹ (AUTHOR), Gao, Jiaxing¹ (AUTHOR), Wu, Yurui¹ (AUTHOR), Guo, Xudong¹ (AUTHOR) scoopguo@iccas.ac.cn, Hu, Rui¹ (AUTHOR), Wang, Shuangqing¹ (AUTHOR) g1704@iccas.ac.cn, Chen, Jinping² (AUTHOR), Li, Yi² (AUTHOR), Du, Wenna³ (AUTHOR), Yang, Guoqiang¹ (AUTHOR) gqyang@iccas.ac.cn

المصدر: Nanotechnology. 7/15/2024, Vol. 35 Issue 29, p1-10. 10p.

مصطلحات موضوعية: *ELECTRON beam lithography, *ELECTRON beams, *IODONIUM salts, *MOLECULAR structure, *ETHANOL, *LITHOGRAPHY

المؤلفون: Cao, Danlin^1,2 (AUTHOR), Li, Dan³ (AUTHOR), Hu, Jianyang^1,2 (AUTHOR), Li, Chang^1,2 (AUTHOR), Chen, Chen⁴ (AUTHOR), Wang, Yiqun⁴ (AUTHOR), Lin, Jie^1,5 (AUTHOR) linjie@hit.edu.cn, Jin, Peng^1,2 (AUTHOR) P.Jin@hit.edu.cn

المصدر: Nanotechnology. 5/20/2024, Vol. 35 Issue 21, p1-7. 7p.

مصطلحات موضوعية: *ELECTRON beam lithography, *ATOMIC layer deposition, *ATOMIC beams, *DISPLACEMENT (Mechanics), *ELECTROMAGNETIC waves, *ACCELERATION measurements

المؤلفون: Falcone, Virginia¹ (AUTHOR) virginia.falcone@polimi.it, Barzaghi, Andrea¹ (AUTHOR), Signorelli, Fabio² (AUTHOR), Valente, Joao³ (AUTHOR), Firoozabadi, Saleh⁴ (AUTHOR), Zucchetti, Carlo⁵ (AUTHOR), Bergamaschini, Roberto⁶ (AUTHOR), Ballabio, Andrea¹ (AUTHOR), Bottegoni, Federico⁵ (AUTHOR), Zappa, Franco² (AUTHOR), Montalenti, Francesco⁶ (AUTHOR), Miglio, Leo⁶ (AUTHOR), Volz, Kerstin⁴ (AUTHOR), Paul, Douglas J.³ (AUTHOR), Biagioni, Paolo⁵ (AUTHOR), Tosi, Alberto² (AUTHOR), Isella, Giovanni¹ (AUTHOR)

المصدر: Advanced Optical Materials. May2024, Vol. 12 Issue 14, p1-8. 8p.

مصطلحات موضوعية: *PLASMA-enhanced chemical vapor deposition, *ELECTRON beam lithography, *INFRARED absorption, *CHEMICAL vapor deposition, *PHOTOTHERMAL effect, *NEAR infrared radiation, *EPITAXY, *MULTIPLICATION

المؤلفون: Xu, Qin¹ (AUTHOR), Cheung, Hil Fung Harry¹ (AUTHOR), Cormode, Donley S.² (AUTHOR), Puel, Tharnier O.³ (AUTHOR), Pal, Srishti⁴ (AUTHOR), Yusuf, Huma² (AUTHOR), Chilcote, Michael⁴ (AUTHOR), Flatté, Michael E.³ (AUTHOR), Johnston‐Halperin, Ezekiel² (AUTHOR), Fuchs, Gregory D.⁴ (AUTHOR) gdf9@cornell.edu

المصدر: Advanced Science. 4/10/2024, Vol. 11 Issue 14, p1-8. 8p.

مصطلحات موضوعية: *ELECTRON beam lithography, *SUPERCONDUCTING resonators, *SUPERCONDUCTING circuits, *TETRACYANOETHYLENE

المؤلفون: Wang, Xiaoni^1,2 (AUTHOR), Xu, Zulei^1,2 (AUTHOR), Liu, Xiaoyu¹ (AUTHOR), Xu, Fei¹ (AUTHOR), Liu, Yixin^1,2 (AUTHOR), Gao, Wanpeng^1,2 (AUTHOR), Wu, Yu¹ (AUTHOR), Yang, Ming^1,3 (AUTHOR), Peng, Wei^1,2 (AUTHOR), Wang, Zhen^1,2 (AUTHOR), Mu, Gang^1,2 (AUTHOR) mugang@mail.sim.ac.cn, Lin, Zhi-Rong^1,2 (AUTHOR) zrlin@mail.sim.ac.cn, Xie, Xiaoming^1,2 (AUTHOR)

المصدر: Superconductor Science & Technology. Apr2024, Vol. 37 Issue 4, p1-8. 8p.

مصطلحات موضوعية: *NANOWIRES, *ELECTRON beam lithography, *PLASMA etching, *ELECTRON beams, *PHASE diagrams

المؤلفون: McClung, Andrew¹ (AUTHOR), Torfeh, Mahsa¹ (AUTHOR), Einck, Vincent J.² (AUTHOR), Watkins, James J.² (AUTHOR), Arbabi, Amir¹ (AUTHOR) arbabi@umass.edu

المصدر: Advanced Optical Materials. 3/22/2024, Vol. 12 Issue 9, p1-8. 8p.

مصطلحات موضوعية: *NANOIMPRINT lithography, *ELECTRON beam lithography, *SILICON nitride, *NUMERICAL apertures, *IMAGING systems, *ELECTRON beams

المؤلفون: Corkery, Peter¹ (AUTHOR), Waltz, Kayley E.¹ (AUTHOR), Eckhert, Patrick M.² (AUTHOR), Ahmad, Mueed^3,4 (AUTHOR), Kraetz, Andrea¹ (AUTHOR), Miao, Yurun¹ (AUTHOR), Lee, Dennis T.^1,4 (AUTHOR), Abdel‐Rahman, Mohammed K.² (AUTHOR), Lan, Yucheng⁵ (AUTHOR), Haghi‐Ashtiani, Paul⁵ (AUTHOR), Stein, Aaron³ (AUTHOR), Boscoboinik, J. Anibal^3,4 (AUTHOR), Tsapatsis, Michael^1,6 (AUTHOR) tsapatsis@jhu.edu, Fairbrother, D. Howard² (AUTHOR) howardf@jhu.edu

المصدر: Advanced Functional Materials. 3/18/2024, Vol. 34 Issue 12, p1-13. 13p.

مصطلحات موضوعية: *ELECTRON beam lithography, *ELECTRON beams, *SEMICONDUCTOR manufacturing, *CHEMICAL structure, *PLASMA etching, *LOW temperatures