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1
المؤلفون: F. J. (Fieke) van den Bruele, Fred Roozeboom, P. Poodt, Ylm Yves Creyghton, Wmm Erwin Kessels
المساهمون: Plasma & Materials Processing, Atomic scale processing, Processing of low-dimensional nanomaterials
المصدر: ECS Transactions, 7, 69, 243-258
Atomic Layer Deposition Applications 11, 69(7), 243-258مصطلحات موضوعية: Microelectromechanical systems, TS - Technical Sciences, Industrial Innovation, Materials science, Plasma etching, Passivation, Silicon, business.industry, Atomic layer deposition, chemistry.chemical_element, Nanotechnology, Die (integrated circuit), Oxide passivation, chemistry, TFT - Thin Film Technology, Etching (microfabrication), Nano Technology, Optoelectronics, Atmospheric pressure, Wafer dicing, business, Materials
الوصول الحر: https://explore.openaire.eu/search/publication?articleId=doi_dedup___::d67deb723e2960d449c71a27f0ffed07Test
https://doi.org/10.1149/06907.0243ecstTest -
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المساهمون: Plasma & Materials Processing, Atomic scale processing, Processing of low-dimensional nanomaterials
المصدر: ECS Journal of Solid State Science and Technology, 4(6), N5067-5076. Electrochemical Society, Inc.
مصطلحات موضوعية: Materials science, Plasma etching, Passivation, business.industry, Nanotechnology, Isotropic etching, Electronic, Optical and Magnetic Materials, Atomic layer deposition, Etching (microfabrication), Optoelectronics, Dry etching, Reactive-ion etching, business, Layer (electronics)
وصف الملف: application/pdf
الوصول الحر: https://explore.openaire.eu/search/publication?articleId=doi_dedup___::ad137b0a8086618264e7234477d4dea4Test
https://research.tue.nl/nl/publications/c93513ed-05d6-4809-8cd9-df25730dd0f9Test -
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المؤلفون: F. J. (Fieke) van den Bruele, Pascal Buskens, Fred Roozeboom, Andrea Illiberi, Ylm Yves Creyghton, P. Poodt, Mireille M. H. Smets
المساهمون: Plasma & Materials Processing
المصدر: Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films, 1, 33
Journal of Vacuum Science and Technology A: Vacuum, Surfaces, and Films, 33:01A131. AVS Science and Technology Societyمصطلحات موضوعية: Materials science, Silver, Nucleation, Analytical chemistry, HOL - Holst, Atmospheric-pressure plasma, Dielectric, Plasma sources, Atomic layer deposition, Electrical resistivity and conductivity, Deposition (phase transition), Atmospheric process, Metallic films, Surface diffusion, Chemistry Industry, Industrial Innovation, Atmospheric pressure, TS- Technical Sciences, Surfaces and Interfaces, Condensed Matter Physics, Surfaces, Coatings and Films, Plasma applications, Thin silver films, Mechanics, Materials and Structures Triskelion
وصف الملف: application/pdf
الوصول الحر: https://explore.openaire.eu/search/publication?articleId=doi_dedup___::11737ffeeb70c2397e905c1c728b7e53Test
http://resolver.tudelft.nl/uuid:12005ef0-07bd-4e3f-9d3e-baf02d4232d9Test -
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المساهمون: Applied Physics, Electrical Energy Systems, Elementary Processes in Gas Discharges
المصدر: IEE Proceedings-Science, Measurement and Technology, 141, 141-147. Institute of Electrical Engineers
مصطلحات موضوعية: Optics, Atmospheric pressure, Chemistry, business.industry, Schlieren, Electrode, Plasma diagnostics, High voltage, Electrical measurements, Emission spectrum, Electrical and Electronic Engineering, business, Anode
وصف الملف: application/pdf
الوصول الحر: https://explore.openaire.eu/search/publication?articleId=doi_dedup___::13b77b3bd98fc5d38cf8d2b6828c6762Test
https://doi.org/10.1049/ip-smt:19941017Test -
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المؤلفون: Ylm Yves Creyghton, de Cjh Zeeuw, Thj Bisschops, de Fj Frits Hoog, M Marco Haverlag, Gmw Gerrit Kroesen
المصدر: Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures. 7:529
مصطلحات موضوعية: Plasma etching, Materials science, Silicon, chemistry, Etching (microfabrication), Ellipsometry, General Engineering, Analytical chemistry, chemistry.chemical_element, Plasma, Reactive-ion etching, Layer (electronics), Refractive index
الوصول الحر: https://explore.openaire.eu/search/publication?articleId=doi_________::7885c62aef64d04c9a19d2b9ea09a98bTest
https://doi.org/10.1116/1.584779Test
