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1دورية أكاديمية
المؤلفون: Prem Pal, Veerla Swarnalatha, Avvaru Venkata Narasimha Rao, Ashok Kumar Pandey, Hiroshi Tanaka, Kazuo Sato
المصدر: Micro and Nano Systems Letters, Vol 9, Iss 1, Pp 1-59 (2021)
مصطلحات موضوعية: Wet anisotropic etching, Silicon, Micromachining, TMAH, KOH, NH2OH, Technology
وصف الملف: electronic resource
العلاقة: https://doaj.org/toc/2213-9621Test
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2دورية أكاديمية
المصدر: Micro and Nano Systems Letters, Vol 6, Iss 1, Pp 1-9 (2018)
مصطلحات موضوعية: Silicon, Wet bulk micromachining, Alignment, Wet anisotropic etching, Si{111}, Technology
وصف الملف: electronic resource
العلاقة: http://link.springer.com/article/10.1186/s40486-018-0066-1Test; https://doaj.org/toc/2213-9621Test
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3دورية أكاديمية
المؤلفون: A. V. Narasimha Rao, V. Swarnalatha, P. Pal
المصدر: Micro and Nano Systems Letters, Vol 5, Iss 1, Pp 1-9 (2017)
مصطلحات موضوعية: Wet anisotropic etching, Bulk micromachining, Silicon, Corner undercutting, KOH, MEMS, Technology
وصف الملف: electronic resource
العلاقة: http://link.springer.com/article/10.1186/s40486-017-0057-7Test; https://doaj.org/toc/2213-9621Test
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4دورية أكاديمية
المؤلفون: Ashok Kumar Pandey, Avvaru Venkata Narasimha Rao, Hiroshi Tanaka, Kanneri Thettiyappath Vismaya, Kazuo Sato, Prem Pal, Veerla Swarnalatha
المصدر: IEEJ Transactions on Sensors and Micromachines. 2020, 140(1):24
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5دورية أكاديمية
المؤلفون: V. Swarnalatha, A. V. Narasimha Rao, P. Pal
مصطلحات موضوعية: KOH, MEMS, micromachining, silicon, TMAH, wet anisotropic etching
العلاقة: https://zenodo.org/communities/wasetTest; https://zenodo.org/record/1132981Test; https://doi.org/10.5281/zenodo.1132981Test; oai:zenodo.org:1132981
الإتاحة: https://doi.org/10.5281/zenodo.1132981Test
https://doi.org/10.5281/zenodo.1132980Test
https://zenodo.org/record/1132981Test -
6كتاب
المؤلفون: Pal, Prem, Singh, Sajal Sagar
مصطلحات موضوعية: Convex and concave corners, MEMS, Silicon, Wet anisotropic etching, KOH, TMAH
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7
المصدر: Micro and Nano Systems Letters, Vol 6, Iss 1, Pp 1-9 (2018)
مصطلحات موضوعية: Bulk micromachining, Silicon, Materials science, Fabrication, Biomedical Engineering, chemistry.chemical_element, Wet bulk micromachining, 02 engineering and technology, Edge (geometry), 01 natural sciences, lcsh:Technology, Biomaterials, Crystal, 0103 physical sciences, Wafer, Alignment, 010302 applied physics, Microelectromechanical systems, lcsh:T, Si{111}, Wet anisotropic etching, 021001 nanoscience & nanotechnology, Crystallography, chemistry, 0210 nano-technology, Microfabrication
الوصول الحر: https://explore.openaire.eu/search/publication?articleId=doi_dedup___::ad4a080fdb2d396a591a70586377f86dTest
http://link.springer.com/article/10.1186/s40486-018-0066-1Test -
8
المؤلفون: Veerla Swarnalatha, A. V. Narasimha Rao, Prem Pal
المصدر: Micro and Nano Systems Letters, Vol 5, Iss 1, Pp 1-9 (2017)
مصطلحات موضوعية: Bulk micromachining, Silicon, Fabrication, Materials science, Biomedical Engineering, chemistry.chemical_element, Nanotechnology, 02 engineering and technology, 01 natural sciences, lcsh:Technology, Corner undercutting, Biomaterials, Etching (microfabrication), 0103 physical sciences, Reactive-ion etching, Composite material, KOH, 010302 applied physics, Microelectromechanical systems, lcsh:T, Wet anisotropic etching, 021001 nanoscience & nanotechnology, Surface micromachining, MEMS, chemistry, Dry etching, 0210 nano-technology
الوصول الحر: https://explore.openaire.eu/search/publication?articleId=doi_dedup___::8756b2c1476ef3586768d9f43ef4d05fTest
http://link.springer.com/article/10.1186/s40486-017-0057-7Test -
9
المؤلفون: M. Borriello, Valeria Mondiali, Monica Bollani, Daniel Chrastina, Mario Lodari
المصدر: Microelectronic engineering 153 (2016): 88–91. doi:10.1016/j.mee.2016.02.015
info:cnr-pdr/source/autori:Mondiali V.; Lodari M.; Borriello M.; Chrastina D.; Bollani M./titolo:Top-down SiGe nanostructures on Ge membranes realized by e-beam lithography and wet etching/doi:10.1016%2Fj.mee.2016.02.015/rivista:Microelectronic engineering/anno:2016/pagina_da:88/pagina_a:91/intervallo_pagine:88–91/volume:153مصطلحات موضوعية: 010302 applied physics, Wet-anisotropic etching, Materials science, Fabrication, Nanostructure, Scanning electron microscope, Nanotechnology, Heterojunction, 02 engineering and technology, 021001 nanoscience & nanotechnology, Condensed Matter Physics, Epitaxy, 01 natural sciences, Atomic and Molecular Physics, and Optics, Surfaces, Coatings and Films, Electronic, Optical and Magnetic Materials, Nanoscale etching, Etching (microfabrication), 0103 physical sciences, Ge membrane, Electron beam lithography, Electrical and Electronic Engineering, 0210 nano-technology, Lithography, Electron-beam lithography
الوصول الحر: https://explore.openaire.eu/search/publication?articleId=doi_dedup___::eb0e879377d2f30739ab76dd708fcc2eTest
https://doi.org/10.1016/j.mee.2016.02.015Test -
10دورية أكاديمية
المؤلفون: Masahiro Higuchi, Syousou Singubara, Takashi Itou, Takashi Sugimoto, Tomomi Yamaguchi, Yusuke Kinoshita, 伊藤 誉, 山口 智実, 新宮原 正三, 木下 祐介, 杉本 隆史, 樋口 誠宏
المصدر: Proceedings of JSPE Semestrial Meeting. 2007, :851