المؤلفون: Anirudh, Rushil, Archibald, Rick, Asif, M. Salman, Becker, Markus M., Benkadda, Sadruddin, Bremer, Peer-Timo, Budé, Rick H. S., Chang, C. S., Chen, Lei, Churchill, R. M., Citrin, Jonathan, Gaffney, Jim A, Gainaru, Ana, Gekelman, Walter, Gibbs, Tom, Hamaguchi, Satoshi, Hill, Christian, Humbird, Kelli, Jalas, Sören, Kawaguchi, Satoru, Kim, Gon-Ho, Kirchen, Manuel, Klasky, Scott, Kline, John L., Krushelnick, Karl, Kustowski, Bogdan, Lapenta, Giovanni, Li, Wenting, Ma, Tammy, Mason, Nigel J., Mesbah, Ali, Michoski, Craig, Munson, Todd, Murakami, Izumi, Najm, Habib N., Olofsson, K. Erik J., Park, Seolhye, Peterson, J. Luc, Probst, Michael, Pugmire, Dave, Sammuli, Brian, Sawlani, Kapil, Scheinker, Alexander, Schissel, David P., Shalloo, Rob J., Shinagawa, Jun, Seong, Jaegu, Spears, Brian K., Tennyson, Jonathan, Thiagarajan, Jayaraman, Ticoş, Catalin M., Trieschmann, Jan, van Dijk, Jan, Van Essen, Brian, Ventzek, Peter, Wang, Haimin, Wang, Jason T. L., Wang, Zhehui, Wende, Kristian, Xu, Xueqiao, Yamada, Hiroshi, Yokoyama, Tatsuya, Zhang, Xinhua

المصدر: IEEE Transactions on Plasma Science 51, 1750 - 1838 (2023)

مصطلحات موضوعية: Physics - Plasma Physics

الوصول الحر: http://arxiv.org/abs/2205.15832Test

المؤلفون: Cheng, Erik S.¹ (AUTHOR), Ventzek, Peter L. G.² (AUTHOR), Hwang, Gyeong S.^1,3 (AUTHOR) gshwang@che.utexas.edu

المصدر: Journal of Applied Physics. 3/7/2024, Vol. 135 Issue 9, p1-11. 11p.

مصطلحات موضوعية: *SILICON nitride, *BOMBARDMENT, *ION bombardment, *ION energy, *SURFACE defects, *DENSITY

المؤلفون: Anirudh, Rushil, Archibald, Rick, Citrin, Jonathan, Gaffney, Jim A., Gainaru, Ana, Gekelman, Walter, Gibbs, Tom, Hamaguchi, Satoshi, Hill, Christian, Humbird, Kelli, Jalas, Sören, Kawaguchi, Satoru, Asif, M. Salman, Kim, Gon-Ho, Kirchen, Manuel, Klasky, Scott, Kline, John L., Krushelnick, Karl, Kustowski, Bogdan, Lapenta, Giovanni, Li, Wenting, Ma, Tammy, Mason, Nigel J., Becker, Markus M., Mesbah, Ali, Michoski, Craig, Munson, Todd, Murakami, Izumi, Najm, Habib N., Olofsson, K. Erik J., Park, Seolhye, Peterson, J. Luc, Probst, Michael, Pugmire, Dave, Benkadda, Sadruddin, Sammuli, Brian, Sawlani, Kapil, Scheinker, Alexander, Schissel, David P., Shalloo, Rob J., Shinagawa, Jun, Seong, Jaegu, Spears, Brian K., Tennyson, Jonathan, Thiagarajan, Jayaraman, Bremer, Peer-Timo, Ticoş, Catalin M., Trieschmann, Jan, van Dijk, Jan, Van Essen, Brian, Ventzek, Peter, Wang, Haimin, Wang, Jason T. L., Wang, Zhehui, Wende, Kristian, Xu, Xueqiao, Budé, Rick H. S., Yamada, Hiroshi, Yokoyama, Tatsuya, Zhang, Xinhua, Chang, C. S., Chen, Lei, Churchill, R. M.

المصدر: IEEE transactions on plasma science 51(7), 1750 - 1838 (2023). doi:10.1109/TPS.2023.3268170

مصطلحات موضوعية: info:eu-repo/classification/ddc/530, Plasma Physics (physics.plasm-ph), FOS: Physical sciences

جغرافية الموضوع: DE

العلاقة: info:eu-repo/semantics/altIdentifier/arxiv/arXiv:2205.15832; info:eu-repo/semantics/altIdentifier/issn/0093-3813; info:eu-repo/semantics/altIdentifier/wos/WOS:001048298900001; https://bib-pubdb1.desy.de/record/478314Test; https://bib-pubdb1.desy.de/search?p=id:%22PUBDB-2022-02530%22Test

الإتاحة: https://doi.org/10.1109/TPS.2023.3268170Test
https://doi.org/10.3204/PUBDB-2022-02530Test
https://bib-pubdb1.desy.de/record/478314Test
https://bib-pubdb1.desy.de/search?p=id:%22PUBDB-2022-02530%22Test

المؤلفون: Tennyson, Jonathan, Rahimi, Sara, Hill, Christian, Tse, Lisa, Vibhakar, Anuradha, Akello-Egwel, Dolica, Brown, Daniel B., Dzarasova, Anna, Hamilton, James R., Jaksch, Dagmar, Mohr, Sebastian, Wren-Little, Keir, Bruckmeier, Johannes, Agarwal, Ankur, Bartschat, Klaus, Bogaerts, Annemie, Booth, Jean-Paul, Goeckner, Matthew J., Hassouni, Khaled, Itikawa, Yukikazu, Braams, Bastiaan J, Krishnakumar, E., Laricchiuta, Annarita, Mason, Nigel J., Pandey, Sumeet, Petrovic, Zoran Lj., Pu, Yi-Kang, Ranjan, Alok, Rauf, Shahid, Schulze, Julian, Turner, Miles M., Ventzek, Peter, Whitehead, J. Christopher, Yoon, Jung-Sik

المصدر: Plasma Phys. Sci. Tech., 26, 055014 (2017)

مصطلحات موضوعية: Physics - Plasma Physics

الوصول الحر: http://arxiv.org/abs/1704.04088Test

المؤلفون: Khrabrov, Alexander V., Kaganovich, Igor D., Ventzek, Peter L. G., Ranjan, Alok, Chen, Lee

مصطلحات موضوعية: Physics - Plasma Physics

الوصول الحر: http://arxiv.org/abs/1503.07748Test

المؤلفون: Huang, Shuo, Panneerchelvam, Prem, Huard, Chad M., Sridhar, Shyam, Ventzek, Peter L. G., Smith, Mark D.

المساهمون: Altamirano-Sánchez, Efrain, Mohanty, Nihar

المصدر: Advanced Etch Technology and Process Integration for Nanopatterning XII

الإتاحة: https://doi.org/10.1117/12.2664977Test

المؤلفون: Ventzek, Peter, Ranjan, Alok, Shinagawa, Jun

المساهمون: Labelle, Catherine B., Wise, Richard S.

المصدر: Advanced Etch Technology for Nanopatterning VIII

الإتاحة: https://doi.org/10.1117/12.2513211Test

المؤلفون: Chen, Zhiying, Longo, Roberto C, Hummel, Michael, Carruth, Megan, Blakeney, Joel, Ventzek, Peter, Ranjan, Alok

المصدر: Journal of Physics D: Applied Physics ; volume 53, issue 33, page 335202 ; ISSN 0022-3727 1361-6463

الإتاحة: https://doi.org/10.1088/1361-6463/ab8b08Test

المؤلفون: Yang, Tsung-Hsuan, Cheng, Erik S., Johnson, Samuel M., Iwao, Toshihiko, Zhao, Jianping, Ekerdt, John G., L. G. Ventzek, Peter, Hwang, Gyeong S.

المصدر: Applied Surface Science ; volume 629, page 157432 ; ISSN 0169-4332

مصطلحات موضوعية: Surfaces, Coatings and Films, Condensed Matter Physics, Surfaces and Interfaces, General Physics and Astronomy, General Chemistry

الإتاحة: https://doi.org/10.1016/j.apsusc.2023.157432Test
https://api.elsevier.com/content/article/PII:S0169433223011108?httpAccept=text/xmlTest
https://api.elsevier.com/content/article/PII:S0169433223011108?httpAccept=text/plainTest

المؤلفون: Cheng, Erik S., Ventzek, Peter L. G., Hwang, Gyeong S.

المصدر: Journal of Vacuum Science & Technology: Part A-Vacuums, Surfaces & Films; Jul2023, Vol. 41 Issue 4, p1-8, 8p

مصطلحات موضوعية: AMORPHOUS silicon, SILICON surfaces, THERMAL analysis, SILICON nitride, SURFACE reactions, THERMAL conductivity, ION bombardment