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1رسالة جامعية
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2
المؤلفون: Mu-Chun Wang, Shun-Ping Sung, Heng-Sheng Huang, Shou-Kong Fan, Shuang-Yuan Chen, Shea-Jue Wang
المصدر: Vacuum. 153:117-121
مصطلحات موضوعية: 010302 applied physics, Materials science, Annealing (metallurgy), business.industry, Gate dielectric, chemistry.chemical_element, 02 engineering and technology, Dielectric, 021001 nanoscience & nanotechnology, Condensed Matter Physics, 01 natural sciences, Nitrogen, Surfaces, Coatings and Films, Threshold voltage, Plasma nitridation, chemistry, 0103 physical sciences, Optoelectronics, 0210 nano-technology, business, Instrumentation, Voltage, Leakage (electronics)
الوصول الحر: https://explore.openaire.eu/search/publication?articleId=doi_________::459239f428d1c4f5cc0d1e1070446944Test
https://doi.org/10.1016/j.vacuum.2018.04.003Test -
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المؤلفون: Mu-Chun Wang, Chih-Chieh Chang, Heng-Sheng Huang, Shea-Jue Wang, Chih-Cheng Lu, Shuang-Yuan Chen
المصدر: 2019 8th International Symposium on Next Generation Electronics (ISNE).
مصطلحات موضوعية: 010302 applied physics, Materials science, business.industry, Annealing (metallurgy), Gate dielectric, 02 engineering and technology, 021001 nanoscience & nanotechnology, 01 natural sciences, Capacitance, Atomic layer deposition, Gate oxide, 0103 physical sciences, Nano, Optoelectronics, Wafer, 0210 nano-technology, business, High-κ dielectric
الوصول الحر: https://explore.openaire.eu/search/publication?articleId=doi_________::d5860a0aa95f1a8429f580327f84e0acTest
https://doi.org/10.1109/isne.2019.8896626Test -
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المؤلفون: Ching-Chuan Chou, Mu-Chun Wang, Heng-Sheng Huang, L S Huang, Wei-Lun Wang, Ping-Ray Huang, Shuang-Yuan Chen, Shea-Jue Wang
مصطلحات موضوعية: Materials science, Horizontal and vertical, Electric field, electrical_electronic_engineering, Nano, Drift current, Diffusion current, Current (fluid), Engineering physics
وصف الملف: application/pdf
الوصول الحر: https://explore.openaire.eu/search/publication?articleId=doi_dedup___::8570f5eeaae686a36536cc020d3a11c3Test
https://doi.org/10.20944/preprints201902.0093.v1Test -
5مؤتمر
المؤلفون: Mu-Chun Wang, Ko-Chin Hsu, Jin-Wei Guo, Heng-Sheng Huang, Shuang-Yuan Chen, Shea-Jue Wang
المصدر: 2017 6th International Symposium on Next Generation Electronics (ISNE)
الإتاحة: https://doi.org/10.1109/isne.2017.7968706Test
http://xplorestaging.ieee.org/ielx7/7959757/7968699/07968706.pdf?arnumber=7968706Test -
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المؤلفون: Mu-Chun Wang, Shuang-Yuan Chen, L S Huang, Chuan-Hsi Liu, Wen-How Lan, Bor-Wen Yang, Shea Jue Wang
المصدر: Microelectronics Reliability. 55:2203-2207
مصطلحات موضوعية: Materials science, Annealing (metallurgy), business.industry, Gate dielectric, Electrical engineering, Dielectric, Condensed Matter Physics, Temperature stress, Atomic and Molecular Physics, and Optics, Surfaces, Coatings and Films, Electronic, Optical and Magnetic Materials, Heat stress, Nano, MOSFET, Electrical and Electronic Engineering, Composite material, Safety, Risk, Reliability and Quality, business, High-κ dielectric
الوصول الحر: https://explore.openaire.eu/search/publication?articleId=doi_________::f9e21d9b37887e2f741abcb17f66e44bTest
https://doi.org/10.1016/j.microrel.2015.05.016Test -
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المؤلفون: Shea-Jue Wang, Yan-Ting Chen, Mu-Chun Wang, Heng-Sheng Huang, Shuang-Yuan Chen, Ko-Chin Hsu
المصدر: 2018 7th International Symposium on Next Generation Electronics (ISNE).
مصطلحات موضوعية: Materials science, Logic gate, MOSFET, Drain current, Engineering physics, Leakage (electronics)
الوصول الحر: https://explore.openaire.eu/search/publication?articleId=doi_________::33c57e6405b4ecee5562ccd59f123b81Test
https://doi.org/10.1109/isne.2018.8394643Test -
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المؤلفون: Shuang-Yuan Chen, Shun-Ping Sung, Heng-Sheng Huang, Chih-Chieh Chang, Shea-Jue Wang, Mu-Chun Wang
المصدر: 2018 7th International Symposium on Next Generation Electronics (ISNE).
مصطلحات موضوعية: 010302 applied physics, Materials science, Dielectric strength, business.industry, Annealing (metallurgy), Gate dielectric, chemistry.chemical_element, 02 engineering and technology, Dielectric, 021001 nanoscience & nanotechnology, 01 natural sciences, Hafnium, Atomic layer deposition, chemistry, Logic gate, 0103 physical sciences, Optoelectronics, SILC, 0210 nano-technology, business
الوصول الحر: https://explore.openaire.eu/search/publication?articleId=doi_________::9ca655b6c67f2b77533db8801319ea04Test
https://doi.org/10.1109/isne.2018.8394625Test -
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المؤلفون: Shea-Jue Wang, Ping-Ray Huang, Wei-Lun Wang, L S Huang, Heng-Sheng Huang, Shuang-Yuan Chen, Mu-Chun Wang
المصدر: 2018 7th International Symposium on Next Generation Electronics (ISNE).
مصطلحات موضوعية: 010302 applied physics, Physics, Field (physics), Reverse short-channel effect, Semiconductor device modeling, Short-channel effect, 02 engineering and technology, 021001 nanoscience & nanotechnology, 01 natural sciences, Computational physics, Modulation, Electric field, 0103 physical sciences, MOSFET, 0210 nano-technology, Communication channel
الوصول الحر: https://explore.openaire.eu/search/publication?articleId=doi_________::1f9b8972cd25d1234f6dd9be6d4514bcTest
https://doi.org/10.1109/isne.2018.8394644Test -
10دورية أكاديمية
المؤلفون: Piyas Samanta, Heng-Sheng Huang, Shuang-Yuan Chen, Chuan-Hsi Liu, Li-Wei Cheng
المصدر: Journal of Applied Physics; 2014, Vol. 115 Issue 7, p1-8, 8p, 1 Chart, 14 Graphs
مصطلحات موضوعية: HAFNIUM compounds, SILICA, TEMPERATURE, CHEMICAL decomposition, METAL oxide semiconductors, ELECTRON traps, STRAY currents, THRESHOLD voltage