المؤلفون: Koo, Jayoung, Kim, YunJi, Shin, You Rim, Yoon, HyunHo, Kang, Philjae, Han, Ye Ri, Park, Jong Keun, Petrillo, Karen E., Sim, Jae Hwan

المساهمون: Guerrero, Douglas, Amblard, Gilles R.

المصدر: Advances in Patterning Materials and Processes XLI

الإتاحة: https://doi.org/10.1117/12.3010977Test

المؤلفون: Guerrero, Douglas, Amblard, Gilles R., Koo, Jayoung, Kim, YunJi, Shin, You Rim, Yoon, HyunHo, Kang, Philjae, Han, Ye Ri, Park, Jong Keun, Petrillo, Karen, Sim, Jae Hwan

المصدر: Proceedings of SPIE; April 2024, Vol. 12957 Issue: 1 p129571C-129571C-10, 12827540p

المؤلفون: Park, Jong Keun, Aqad, Emad, Cen, Yinjie, Coley, Suzanne, Cui, Li, Hoelzel, Conner, Naab, Benjamin, Lee, Choong Bong, Rena, Rochelle, Kang, Philjae, Shin, You Rim, Limberg, David, Zhang, Lei

المساهمون: Altamirano-Sánchez, Efrain, Mohanty, Nihar

المصدر: Advanced Etch Technology and Process Integration for Nanopatterning XII

الإتاحة: https://doi.org/10.1117/12.2659178Test

المؤلفون: Mohanty, Nihar, Altamirano-Sánchez, Efrain, Park, Jong Keun, Aqad, Emad, Cen, Yinjie, Coley, Suzanne M., Cui, Li, Hoelzel, Conner, Naab, Benjamin D., Lee, Choongbong, Rena, Rochelle, Kang, Philjae, Shin, You Rim, Limberg, David, Zhang, Lei

المصدر: Proceedings of SPIE; May 2023, Vol. 12499 Issue: 1 p124990I-124990I-9, 1124920p