المؤلفون: de la Huerta, Cesar Arturo Masse, Nguyen, Viet H., Sekkat, Abderrahime, Crivello, Chiara, Toldra-Reig, Fidel, Veiga, Pedro, Jimenez, Carmen, Quessada, Serge, Muñoz-Rojas, David

مصطلحات موضوعية: Condensed Matter - Materials Science, Physics - Applied Physics, Physics - Instrumentation and Detectors

الوصول الحر: http://arxiv.org/abs/2006.05235Test

المؤلفون: Aslam, Sana, Sekkat, Abderrahime, Vergnes, Hugues, Esvan, Jérôme, Pugliara, Alessandro, Samélor, Diane, Eshraghi, Nicolas, Vahlas, Constantin, Auvergniot, Jérémie, Caussat, Brigitte

المساهمون: Laboratoire de Génie Chimique (LGC), Université Toulouse III - Paul Sabatier (UT3), Université de Toulouse (UT)-Université de Toulouse (UT)-Centre National de la Recherche Scientifique (CNRS)-Institut National Polytechnique (Toulouse) (Toulouse INP), Université de Toulouse (UT), Centre interuniversitaire de recherche et d'ingenierie des matériaux (CIRIMAT), Université de Toulouse (UT)-Université de Toulouse (UT)-Institut de Chimie - CNRS Chimie (INC-CNRS)-Centre National de la Recherche Scientifique (CNRS)-Institut National Polytechnique (Toulouse) (Toulouse INP), Centre de microcaractérisation Raimond Castaing (Centre Castaing), Institut National des Sciences Appliquées - Toulouse (INSA Toulouse), Institut National des Sciences Appliquées (INSA)-Université de Toulouse (UT)-Institut National des Sciences Appliquées (INSA)-Université de Toulouse (UT)-Université Toulouse III - Paul Sabatier (UT3), Université de Toulouse (UT)-Institut de Chimie - CNRS Chimie (INC-CNRS)-Centre National de la Recherche Scientifique (CNRS)-Institut National Polytechnique (Toulouse) (Toulouse INP), Corporate R&D-Umicore Olen BELGIUM

المصدر: ISSN: 2666-8211 ; Chemical Engineering Journal Advances ; https://cnrs.hal.science/hal-04261424Test ; Chemical Engineering Journal Advances, 2023, 16, pp.100554. ⟨10.1016/J.CEJA.2023.100554⟩.

مصطلحات موضوعية: Chemical vapor deposition, Fluidized bed, Alumina thin films, Silica powder, Nanometric layers, [CHIM.MATE]Chemical Sciences/Material chemistry

العلاقة: hal-04261424; https://cnrs.hal.science/hal-04261424Test; https://cnrs.hal.science/hal-04261424/documentTest; https://cnrs.hal.science/hal-04261424/file/Aslam.pdfTest

الإتاحة: https://doi.org/10.1016/J.CEJA.2023.100554Test
https://cnrs.hal.science/hal-04261424Test
https://cnrs.hal.science/hal-04261424/documentTest
https://cnrs.hal.science/hal-04261424/file/Aslam.pdfTest

المؤلفون: Vale, João, Pedro, Sekkat, Abderrahime, Gheorghin, Thomas, Sevim, Semih, Mavromanolaki, Eirini, Flouris, Andreas, D, Pané, Salvador, Muñoz-Rojas, David, Puigmartí-Luis, Josep, Sotto Mayor, Tiago

المساهمون: Universidade do Porto = University of Porto, Laboratoire des matériaux et du génie physique (LMGP ), Institut de Chimie - CNRS Chimie (INC-CNRS)-Centre National de la Recherche Scientifique (CNRS)-Institut polytechnique de Grenoble - Grenoble Institute of Technology (Grenoble INP ), Université Grenoble Alpes (UGA)-Université Grenoble Alpes (UGA), Laboratoire de Génie Chimique (LGC), Université Toulouse III - Paul Sabatier (UT3), Université de Toulouse (UT)-Université de Toulouse (UT)-Centre National de la Recherche Scientifique (CNRS)-Institut National Polytechnique (Toulouse) (Toulouse INP), Université de Toulouse (UT), Eidgenössische Technische Hochschule - Swiss Federal Institute of Technology Zürich (ETH Zürich), Creative Nano PC, University of Thessaly Volos (UTH), University of Barcelona

المصدر: ISSN: 1932-7447.

مصطلحات موضوعية: Atomic layer deposition, Byproducts, Chemical vapor deposition, Deposition, Precursors, [SPI.GPROC]Engineering Sciences [physics]/Chemical and Process Engineering, [SDV]Life Sciences [q-bio]

العلاقة: hal-04316499; https://ut3-toulouseinp.hal.science/hal-04316499Test; https://ut3-toulouseinp.hal.science/hal-04316499/documentTest; https://ut3-toulouseinp.hal.science/hal-04316499/file/vale.pdfTest

الإتاحة: https://doi.org/10.1021/acs.jpcc.3c02262Test
https://ut3-toulouseinp.hal.science/hal-04316499Test
https://ut3-toulouseinp.hal.science/hal-04316499/documentTest
https://ut3-toulouseinp.hal.science/hal-04316499/file/vale.pdfTest

المؤلفون: Sekkat, Abderrahime, Papanastasiou, Dorina, Ghani, Maheera Abdul, Roussel, Hervé, Weber, Matthieu, Rapenne, Laetitia, Jiménez, Carmen, Muñoz-Rojas, David, Bellet, Daniel

المساهمون: Laboratoire de Génie Chimique (LGC), Université Toulouse III - Paul Sabatier (UT3), Université de Toulouse (UT)-Université de Toulouse (UT)-Centre National de la Recherche Scientifique (CNRS)-Institut National Polytechnique (Toulouse) (Toulouse INP), Université de Toulouse (UT), Laboratoire des matériaux et du génie physique (LMGP ), Institut de Chimie - CNRS Chimie (INC-CNRS)-Centre National de la Recherche Scientifique (CNRS)-Institut polytechnique de Grenoble - Grenoble Institute of Technology (Grenoble INP ), Université Grenoble Alpes (UGA)-Université Grenoble Alpes (UGA), University of Tokio

المصدر: ISSN: 2365-709X ; Advanced Materials Technologies ; https://hal.science/hal-04504471Test ; Advanced Materials Technologies, 2023, 8 (24), pp.100869. ⟨10.1002/admt.202301143⟩.

مصطلحات موضوعية: [SPI.MAT]Engineering Sciences [physics]/Materials

العلاقة: hal-04504471; https://hal.science/hal-04504471Test; https://hal.science/hal-04504471/documentTest; https://hal.science/hal-04504471/fileTest/Sekkat.pdf

الإتاحة: https://doi.org/10.1002/admt.202301143Test
https://hal.science/hal-04504471Test
https://hal.science/hal-04504471/documentTest
https://hal.science/hal-04504471/fileTest/Sekkat.pdf

المؤلفون: Weber, Matthieu, Boysen, Nils, Graniel, Octavio, Sekkat, Abderrahime, Dussarrat, Christian, Wiff, Juan Paulo, Devi, Anjana, Munõz-Rojas, David

مصطلحات موضوعية: atomic layer deposition, green chemistry, spatial ALD, precursors, synthesis

وصف الملف: application/pdf

العلاقة: ACS materials Au; Atomic Layer Deposition for novel hydrogen separation membranes; New Spatial Atomic layer deposition precursors and plasma processes towards functional materials for advanced applications; Neuartige Vorstufen für die räumlich getrennte Atomlagenabscheidung und Plasmaprozesse zur Herstellung von funktionellen Materialien in der fortgeschrittenen Anwendung; ANR-20-CE09-0008; ANR-21-CE08-0047; 490773082; https://publica.fraunhofer.de/handle/publica/442097Test; https://doi.org/10.24406/publica-1375Test

الإتاحة: https://doi.org/10.1021/acsmaterialsau.3c00002Test
https://doi.org/10.24406/publica-1375Test
https://publica.fraunhofer.de/handle/publica/442097Test

المؤلفون: Vale, João Pedro, Sekkat, Abderrahime, Gheorghin, Thomas, Sevim, Semih, Mavromanolaki, Eirini, Flouris, Andreas D., Pané, Salvador, Muñoz-Rojas, David, Puigmartí-Luis, Josep, Sotto Mayor, Tiago

المصدر: The Journal of Physical Chemistry C, 127 (19)

وصف الملف: application/application/pdf

العلاقة: info:eu-repo/semantics/altIdentifier/wos/000984392700001; info:eu-repo/grantAgreement/EC/H2020/801464; http://hdl.handle.net/20.500.11850/613940Test

الإتاحة: https://doi.org/20.500.11850/613940Test
https://doi.org/10.3929/ethz-b-000613940Test
https://doi.org/10.1021/acs.jpcc.3c02262Test
https://hdl.handle.net/20.500.11850/613940Test

المؤلفون: Jaud, Alexandre, Ponton, Simon, Sekkat, Abderrahime, Aal, Alsayed Abdel, Sauvage, Thierry, Samelor, Diane, Vergnes, Hugues, Diallo, Babacar, Etzkorn, Johannes, Caussat, Brigitte, Vahlas, Constantin

المساهمون: Bpifrance

المصدر: Surface and Coatings Technology ; volume 462, page 129476 ; ISSN 0257-8972

مصطلحات موضوعية: Materials Chemistry, Surfaces, Coatings and Films, Surfaces and Interfaces, Condensed Matter Physics, General Chemistry

الإتاحة: https://doi.org/10.1016/j.surfcoat.2023.129476Test
https://api.elsevier.com/content/article/PII:S0257897223002517?httpAccept=text/xmlTest
https://api.elsevier.com/content/article/PII:S0257897223002517?httpAccept=text/plainTest

المؤلفون: Papanastasiou, Dorina T., Mantoux, Arnaud, Crisci, Alexandre, Ribeiro, Hugo, Sekkat, Abderrahime, Roussel, Hervé, Weber, Matthieu, Rapenne, Laetitia, Jiménez, Carmen, Fivel, Marc, Bellet, Daniel, Blanquet, Elisabeth, Muñoz-Rojas, David

المصدر: ACS Applied Nano Materials; 6/14/2024, Vol. 7 Issue 11, p12312-12322, 11p

المؤلفون: des Ligneris, Elise, Samélor, Diane, Sekkat, Abderrahime, Josse, Claudie, Hungria, Teresa, Pugliara, Alessandro, Vahlas, Constantin, Caussat, Brigitte

المصدر: Journal of Vacuum Science & Technology: Part A-Vacuums, Surfaces & Films; May2024, Vol. 42 Issue 3, p1-13, 13p

مصطلحات موضوعية: ATOMIC layer deposition, CARBON films, MICROFIBERS, THIN films, THIN film deposition, SILICA films

المؤلفون: Bellet, Daniel, Castro, M. Landa, Chu, Thi-Xuan, Estrada, E.M. Arce, Aldana González, J., Hernández, A. Blanco, López, J.M. Hallen, Manh, Tu Le, Mostany, J., Muñoz-Rojas, David, Nguyen, Viet Huong, Ortiz, W. Sánchez, Palomar-Pardavé, Manuel Eduardo, Pariyar, Abhishek, Benítez, José Alberto Pérez, Pham, Anh Hoang, Pérez, D. Hernández, Ramírez-López, A., Romero-Romo, M., Scharifker, B.R., Sekkat, Abderrahime, Teodocio, B. Maldonado, Van Bui, Hao, Vu, Viet Q., de Oca Yemha,, M.G. Montes

المصدر: Nucleation and Growth in Applied Materials ; page ix-x ; ISBN 9780323995375

الإتاحة: https://doi.org/10.1016/b978-0-323-99537-5.50005-1Test
https://api.elsevier.com/content/article/PII:B9780323995375500051?httpAccept=text/xmlTest
https://api.elsevier.com/content/article/PII:B9780323995375500051?httpAccept=text/plainTest