المؤلفون: Anirudh, Rushil, Archibald, Rick, Asif, M. Salman, Becker, Markus M., Benkadda, Sadruddin, Bremer, Peer-Timo, Budé, Rick H. S., Chang, C. S., Chen, Lei, Churchill, R. M., Citrin, Jonathan, Gaffney, Jim A, Gainaru, Ana, Gekelman, Walter, Gibbs, Tom, Hamaguchi, Satoshi, Hill, Christian, Humbird, Kelli, Jalas, Sören, Kawaguchi, Satoru, Kim, Gon-Ho, Kirchen, Manuel, Klasky, Scott, Kline, John L., Krushelnick, Karl, Kustowski, Bogdan, Lapenta, Giovanni, Li, Wenting, Ma, Tammy, Mason, Nigel J., Mesbah, Ali, Michoski, Craig, Munson, Todd, Murakami, Izumi, Najm, Habib N., Olofsson, K. Erik J., Park, Seolhye, Peterson, J. Luc, Probst, Michael, Pugmire, Dave, Sammuli, Brian, Sawlani, Kapil, Scheinker, Alexander, Schissel, David P., Shalloo, Rob J., Shinagawa, Jun, Seong, Jaegu, Spears, Brian K., Tennyson, Jonathan, Thiagarajan, Jayaraman, Ticoş, Catalin M., Trieschmann, Jan, van Dijk, Jan, Van Essen, Brian, Ventzek, Peter, Wang, Haimin, Wang, Jason T. L., Wang, Zhehui, Wende, Kristian, Xu, Xueqiao, Yamada, Hiroshi, Yokoyama, Tatsuya, Zhang, Xinhua

المصدر: IEEE Transactions on Plasma Science 51, 1750 - 1838 (2023)

مصطلحات موضوعية: Physics - Plasma Physics

الوصول الحر: http://arxiv.org/abs/2205.15832Test

المؤلفون: Anirudh, Rushil, Archibald, Rick, Asif, M. Salman, Becker, Markus M., Benkadda, Sadruddin, Bremer, Peer Timo, Bude, Rick H.S., Chang, C. S., Chen, Lei, Churchill, R. M., Citrin, Jonathan, Gaffney, Jim A., Gainaru, Ana, Gekelman, Walter, Gibbs, Tom, Hamaguchi, Satoshi, Hill, Christian, Humbird, Kelli, Jalas, Soren, Kawaguchi, Satoru, Kim, Gon Ho, Kirchen, Manuel, Klasky, Scott, Kline, John L., Krushelnick, Karl, Kustowski, Bogdan, Lapenta, Giovanni, Li, Wenting, Ma, Tammy, Mason, Nigel J., Mesbah, Ali, Michoski, Craig, Munson, Todd, Murakami, Izumi, Najm, Habib N., Olofsson, K. Erik J., Park, Seolhye, Peterson, J. Luc, Probst, Michael, Pugmire, David, Sammuli, Brian, Sawlani, Kapil, Scheinker, Alexander, Schissel, David P., Shalloo, Rob J., Shinagawa, Jun, Seong, Jaegu, Spears, Brian K., Tennyson, Jonathan, Trieschmann, Jan, van Dijk, Jan

المصدر: Anirudh , R , Archibald , R , Asif , M S , Becker , M M , Benkadda , S , Bremer , P T , Bude , R H S , Chang , C S , Chen , L , Churchill , R M , Citrin , J , Gaffney , J A , Gainaru , A , Gekelman , W , Gibbs , T , Hamaguchi , S , Hill , C , Humbird , K , Jalas , S , Kawaguchi , S , Kim , G H , Kirchen , M , Klasky , ....

مصطلحات موضوعية: Artificial intelligence, data-driven plasma science, machine learning, nuclear fusion, plasma control, plasma diagnostics, plasma processing, plasma simulation

وصف الملف: application/pdf

العلاقة: https://research.tue.nl/en/publications/32db800c-c063-42a4-bab3-df31d91ed703Test

الإتاحة: https://doi.org/10.1109/TPS.2023.3268170Test
https://research.tue.nl/en/publications/32db800c-c063-42a4-bab3-df31d91ed703Test
https://pure.tue.nl/ws/files/312944628/2022_Review_of_Data-Driven_Plasma_Science.pdfTest
http://www.scopus.com/inward/record.url?scp=85165599092&partnerID=8YFLogxKTest

المؤلفون: Bourque, Alexander J., Braatz, Richard D., Calabria, Anthony, Cinar, Ali, Dion, Geneviève, Diwale, Sanket, Dong, Yining, Du, Di, Gao, Hanyu, Grady, Michael C., Hsu, Yuan-Ming, Jia, Xiaodong, Lee, Jay, Li, Wenzhe, Liu, Yingxiang, McDonald, Denisa Qori, Mesbah, Ali, Parulekar, Satish J., Poerio, Dominic V., Qin, S. Joe, Rangarajan, Srinivas, Rashid, Mudassir M., Rutledge, Gregory C., Salvucci, Dario, Sawlani, Kapil, Schmal, Johannes Pieter, Schwartz, Daniel, Shokoufandeh, Ali, Soroush, Masoud, Vallett, Richard, Volchko, Nathan W.

المصدر: Artificial Intelligence in Manufacturing ; page ix-x ; ISBN 9780323991353

الإتاحة: https://doi.org/10.1016/b978-0-323-99135-3.50005-0Test
https://api.elsevier.com/content/article/PII:B9780323991353500050?httpAccept=text/xmlTest
https://api.elsevier.com/content/article/PII:B9780323991353500050?httpAccept=text/plainTest

المؤلفون: Sawlani, Kapil, Mesbah, Ali

المصدر: Artificial Intelligence in Manufacturing ; page 97-138 ; ISBN 9780323991353

الإتاحة: https://doi.org/10.1016/b978-0-323-99135-3.00010-5Test
https://api.elsevier.com/content/article/PII:B9780323991353000105?httpAccept=text/xmlTest
https://api.elsevier.com/content/article/PII:B9780323991353000105?httpAccept=text/plainTest

المؤلفون: Ali Mesbah, Sawlani Kapil, Jared O'Leary

المصدر: IEEE Transactions on Semiconductor Manufacturing. 33:72-85

مصطلحات موضوعية: 0209 industrial biotechnology, Materials science, business.industry, Semiconductor device fabrication, Deep learning, Pattern recognition, 02 engineering and technology, Condensed Matter Physics, Convolutional neural network, Industrial and Manufacturing Engineering, Electronic, Optical and Magnetic Materials, 020901 industrial engineering & automation, Semiconductor, Particle, Anomaly detection, Wafer, Artificial intelligence, Electrical and Electronic Engineering, Layer (object-oriented design), business

الوصول الحر: https://explore.openaire.eu/search/publication?articleId=doi_________::f2d19191cab21ff7acefc1797c949441Test
https://doi.org/10.1109/tsm.2019.2963656Test

المؤلفون: O'Leary, Jared, Sawlani, Kapil, Mesbah, Ali

المساهمون: Lam Research Corporation

المصدر: IEEE Transactions on Semiconductor Manufacturing ; volume 33, issue 1, page 72-85 ; ISSN 0894-6507 1558-2345

الإتاحة: https://doi.org/10.1109/tsm.2019.2963656Test
http://xplorestaging.ieee.org/ielx7/66/8979208/08948013.pdf?arnumber=8948013Test

المؤلفون: Sawlani, Kapil Umesh

Committee Members: Foster, John Edison; Gallimore, Alec D.; Raitses, Yevgeny; Kushner, Mark; Gilgenbach, Ronald M.

URL: https://hdl.handle.net/2027.42/111614Test

المؤلفون: Sawlani, Kapil Umesh

المساهمون: Foster, John Edison, Gallimore, Alec D., Raitses, Yevgeny, Kushner, Mark, Gilgenbach, Ronald M.

مصطلحات موضوعية: Electron gun, plasma, secondary electron emission, SEE, Aerospace Engineering, Engineering (General), Materials Science and Engineering, Nuclear Engineering and Radiological Sciences, Engineering

وصف الملف: application/pdf

العلاقة: https://hdl.handle.net/2027.42/111614Test

الإتاحة: https://hdl.handle.net/2027.42/111614Test