المؤلفون: Ekström, Mattias, Zetterling, Carl-Mikael, 1966

المصدر: Materials Science in Semiconductor Processing. 168

مصطلحات موضوعية: Ion implantation, Salicide, SiC, Simultaneous contacts

وصف الملف: print

الوصول الحر: https://urn.kb.se/resolve?urn=urn:nbn:se:kth:diva-338074Test
https://doi.org/10.1016/j.mssp.2023.107849Test

المؤلفون: Yaozu Guo, Haolan Ma, Ke Wang, Li Zhang, Feng Yan, Ping Han, Xiaoli Ji

المصدر: IEEE Photonics Journal, Vol 15, Iss 3, Pp 1-7 (2023)

مصطلحات موضوعية: Al grating, CMOS process, microbolometer, resonant cavity, salicide poly-Si thermistors, Applied optics. Photonics, TA1501-1820, Optics. Light, QC350-467

وصف الملف: electronic resource

العلاقة: https://ieeexplore.ieee.org/document/10044965Test/; https://doaj.org/toc/1943-0655Test

الوصول الحر: https://doaj.org/article/16c82d859ed04bd382a74a57439fd5e7Test

المؤلفون: Yaozu Guo, Haolan Ma, Jiang Lan, Yiming Liao, Xiaoli Ji

المصدر: Micromachines; Volume 13; Issue 11; Pages: 1869

مصطلحات موضوعية: salicide polysilicon thermistor, microbolometers, standard CMOS process, uncooled infrared detector

وصف الملف: application/pdf

العلاقة: E：Engineering and Technology; https://dx.doi.org/10.3390/mi13111869Test

الإتاحة: https://doi.org/10.3390/mi13111869Test

المؤلفون: Jayakumar, Ganesh, 1987

المساهمون: Hellström, Per-Erik, 1970, Östling, Mikael, Selmi, Luca, Professor

المصدر: TRITA-EECS-AVL.

مصطلحات موضوعية: silicon nanowire, biosensor, CMOS, sequential integration, lab-on-chip, LOC, high-K, high-K integration on SiNW biosensor, ALD, fluid gate, back gate, SiNW, SiNW pixel matrix, FEOL, pattern transfer lithography, sidewall transfer lithography, STL, multi-target bio detection, BEOL, nanonets, silicon nanonets, SiNN-FET, SiNW-FET, CMOS integration of nanowires, CMOS integration of nanonets, monolithic 3D integration of nanowires, above-IC integration of nanowires, DNA detection using SiNW, SiNW biosensor, dry environment DNA detection, DNA hybridization detection using SiNW, SiNW functionalization, SiNW silanization, SiNW grafting, FEOL integration of SiNW, BEOL integration of SiNW, sequential multiplexed biodetection, biodetection efficiency of SiNW, front end of line integration of SiNW, back end of line integration of SiNW, SiNW dry environment functionalization, APTES cross-linker, accessing SiNW test site, fluorescence microscopy of SiNW, geometry of SiNW, SiNW biosensor variability, top-down fabrication of SiNW, bottom-up fabrication of SiNW, VLS method, ams foundry CMOS process, adding functionality in BEOL process, sensor integration in BEOL process, hafnium oxide, HfO2, aluminium oxide, Al2O3, TiN backgate, Nickel source/drain, ISFET, ion sensitive field effect transistor, Overcoming Nernst limit of detection using SiNW, SiNW sub-threshold region operation, ASIC, SOC, SiGe selective epitaxy, epitaxial growth of SiNW, epitaxial growth of nanowires, epitaxial growth of nanonets, nickel silicide contacts, salicide process, high yield SiNW fabrication, high volume SiNW fabrication, silicon ribbon, SiRi pixel, SiRi biosensor, SiRi DNA detection, monolithic 3D integration of nanonets, above-IC integration of nanonets, impact of back gate voltage on silicon nanowire, impact of back gate voltage on SiNW, FDSOI, fully depleted silicon on insulator technology, metal backgate, wafer scale integration of SiNW, wafer scale integration of nanonets, impact of backgate voltage on CMOS inverter circuit, frequency divider, D flip-flop, Informations- och kommunikationsteknik, Information and Communication Technology

وصف الملف: electronic

الوصول الحر: https://urn.kb.se/resolve?urn=urn:nbn:se:kth:diva-234918Test
https://scholar.google.se/citations?user=uu6UyEIAAAAJ&hl=en&oi=sraTest
https://kth.diva-portal.org/smash/get/diva2:1252014/FULLTEXT01.pdfTest
https://kth.diva-portal.org/smash/get/diva2:1252014/COVER01.tiffTest
https://kth.diva-portal.org/smash/get/diva2:1252014/FULLTEXT02.pdfTest
https://kth.diva-portal.org/smash/get/diva2:1252014/FULLTEXT03.mp4Test

المؤلفون: Elahipanah, Hossein, 1982

المساهمون: Östling, Mikael, Professor, Zetterling, Carl-Mikael, Professor, Hallèn, Anders, Professor, Schöner, Adolf, Dr., Kimoto, Tsunenobu, Professor

المصدر: TRITA-ICT.

مصطلحات موضوعية: 4H-SiC, BJT, high-voltage and ultra-high-voltage, high-temperature, self-aligned Ni-silicide (Ni-SALICIDE), lift-off-free, wafer-scale, current gain, Darlington, Electrical Engineering, Elektro- och systemteknik, Informations- och kommunikationsteknik, Information and Communication Technology

وصف الملف: electronic

الوصول الحر: https://urn.kb.se/resolve?urn=urn:nbn:se:kth:diva-211659Test
https://kth.diva-portal.org/smash/get/diva2:1130275/FULLTEXT02.pdfTest

المؤلفون: Chunwei Xie, Xiaojin Zhao, Wei He, Xiaofang Pan, Feng Zhang, Tingting Xu

المصدر: IEEE Transactions on Electron Devices. 68:3702-3705

مصطلحات موضوعية: Materials science, business.industry, Contact resistance, Transistor, Physical unclonable function, Salicide, Electronic, Optical and Magnetic Materials, Resistive random-access memory, law.invention, Operating temperature, law, Bit error rate, Optoelectronics, NIST, Electrical and Electronic Engineering, business

الوصول الحر: https://explore.openaire.eu/search/publication?articleId=doi_________::a9c3cbf19788cb78280e71e235554531Test
https://doi.org/10.1109/ted.2021.3077343Test

المؤلفون: E. Gebreselasie, A. Loiseau, I. McCallum-Cook, Yves Ngu

المصدر: IEEE Transactions on Semiconductor Manufacturing. 33:331-336

مصطلحات موضوعية: 0209 industrial biotechnology, Materials science, business.industry, 02 engineering and technology, BiCMOS, Condensed Matter Physics, Salicide, Industrial and Manufacturing Engineering, Electronic, Optical and Magnetic Materials, Safe operating area, 020901 industrial engineering & automation, CMOS, MOSFET, Fuse (electrical), Optoelectronics, Field-effect transistor, Electrical and Electronic Engineering, business, Transmission-line pulse

الوصول الحر: https://explore.openaire.eu/search/publication?articleId=doi_________::4ca91fed5bd30186247ead73ee9f9364Test
https://doi.org/10.1109/tsm.2020.2991373Test

المؤلفون: Horng-Chih Lin, Guo-Wei Huang, Kun-Ming Chen, C. Y. Liang, Yu-En Huang, Pei-Wen Li, K.-P. Peng

المصدر: IEEE Electron Device Letters. 41:397-400

مصطلحات موضوعية: 010302 applied physics, Materials science, Fabrication, business.industry, Doping, Transistor, technology, industry, and agriculture, Salicide, 01 natural sciences, Electronic, Optical and Magnetic Materials, law.invention, Etching (microfabrication), Thin-film transistor, law, 0103 physical sciences, Optoelectronics, Production (computer science), Electrical and Electronic Engineering, business, Deposition (law)

الوصول الحر: https://explore.openaire.eu/search/publication?articleId=doi_________::85ca276d8963d9c2c653fa4046875103Test
https://doi.org/10.1109/led.2020.2970756Test

المؤلفون: Salehuddin, F., Ahmad, I., Hamid, F.A., Zaharim, A., Elgomati, H.A, Majlis, B.Y.

المصدر: Journal of Telecommunication, Electronic and Computer Engineering (JTEC); Vol 2, No 1; 35-41 ; 2289-8131 ; 2180-1843

مصطلحات موضوعية: 45nm NMOS, S/D Implant, SALICIDE, Taguchi Method

وصف الملف: application/pdf

العلاقة: https://journal.utem.edu.my/index.php/jtec/article/view/404/273Test; https://journal.utem.edu.my/index.php/jtec/article/view/404Test

الإتاحة: https://journal.utem.edu.my/index.php/jtec/article/view/404Test

المؤلفون: Xiao Ping Dai, Tomasz Sledziewski, Tobias Erlbacher, Anton J. Bauer, Yan Li Zhao, Lothar Frey, Cheng Zhan Li, Xi Ming Chen

المصدر: Materials Science Forum. 963:490-493

مصطلحات موضوعية: Fabrication, Materials science, business.industry, Mechanical Engineering, Condensed Matter Physics, Salicide, Lift (force), Nickel silicide, Mechanics of Materials, Self alignment, MOSFET, Optoelectronics, General Materials Science, Power MOSFET, business, Ohmic contact

الوصول الحر: https://explore.openaire.eu/search/publication?articleId=doi_________::6b8b70e77c6f7ed853afb06587d587f7Test
https://doi.org/10.4028/www.scientific.net/msf.963.490Test