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1
المصدر: IEEE Transactions on Nuclear Science. 55:3202-3205
مصطلحات موضوعية: Nuclear and High Energy Physics, Materials science, business.industry, Transistor, Read only storage, Silicon on insulator, law.invention, Non-volatile memory, Nuclear Energy and Engineering, law, Total dose, Optoelectronics, Irradiation, Electrical and Electronic Engineering, business, Radiation hardening, Radiation response
الوصول الحر: https://explore.openaire.eu/search/publication?articleId=doi_________::295c7a2eb27b73fdc4e2f410d1239101Test
https://doi.org/10.1109/tns.2008.2007566Test -
2
المؤلفون: S. Habermehl
المصدر: Journal of Applied Physics. 83:4672-4677
مصطلحات موضوعية: Amorphous silicon, Materials science, Silicon, Nanocrystalline silicon, Analytical chemistry, General Physics and Astronomy, chemistry.chemical_element, Dichlorosilane, Chemical vapor deposition, chemistry.chemical_compound, Carbon film, chemistry, Silicon nitride, Thin film
الوصول الحر: https://explore.openaire.eu/search/publication?articleId=doi_________::e346e58b1496d7a1ff7d27639b2d50e2Test
https://doi.org/10.1063/1.367253Test -
3
المؤلفون: S. Habermehl, G. Lucovsky
المصدر: Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films. 14:3024-3032
مصطلحات موضوعية: Silicon, Chemistry, Analytical chemistry, chemistry.chemical_element, Surfaces and Interfaces, Plasma afterglow, Chemical vapor deposition, Condensed Matter Physics, Epitaxy, Surfaces, Coatings and Films, Chemisorption, Remote plasma, Deposition (phase transition), Thin film
الوصول الحر: https://explore.openaire.eu/search/publication?articleId=doi_________::6e1be0eb564f284c61938d2d89c4d42bTest
https://doi.org/10.1116/1.580166Test -
4
المؤلفون: S. Habermehl, R. T. Apodaca
المصدر: Applied Physics Letters. 84:215-217
مصطلحات موضوعية: Materials science, Silicon oxynitride, Physics and Astronomy (miscellaneous), Silicon, Condensed matter physics, chemistry.chemical_element, Nitride, Poole–Frenkel effect, chemistry.chemical_compound, chemistry, Silicon nitride, Thin film, Elasticity (economics), Stoichiometry
الوصول الحر: https://explore.openaire.eu/search/publication?articleId=doi_________::0f27dbfc2f7559e3671835cec13b1f5cTest
https://doi.org/10.1063/1.1639132Test -
5
المؤلفون: S. Habermehl, Z. Lu, J.T. Kelliher, Nikolaus Dietz, Y.L. Chen, Amy E. Miller, Klaus J. Bachmann, G. Lucovsky
المصدر: Applied Surface Science. 86:453-456
مصطلحات موضوعية: Auger electron spectroscopy, Silicon, Chemistry, Scanning electron microscope, Analytical chemistry, General Physics and Astronomy, chemistry.chemical_element, Surfaces and Interfaces, General Chemistry, Condensed Matter Physics, Epitaxy, Chemical beam epitaxy, Surfaces, Coatings and Films, chemistry.chemical_compound, Gallium phosphide, Triethylgallium, High-resolution transmission electron microscopy
الوصول الحر: https://explore.openaire.eu/search/publication?articleId=doi_________::81993b502642bdb21fd209dff1e21b79Test
https://doi.org/10.1016/0169-4332Test(94)00432-3 -
6
المؤلفون: J. R. Serrano, S. Habermehl
المصدر: Applied Physics Letters. 107:201904
مصطلحات موضوعية: Materials science, Thermal conductivity, Physics and Astronomy (miscellaneous), Phonon scattering, Phonon, Superlattice, Nanotechnology, Sputter deposition, Thin film, Composite material, Grain size, Nanocrystalline material
الوصول الحر: https://explore.openaire.eu/search/publication?articleId=doi_________::cd417a1bdb35006e08f40da85014a3f0Test
https://doi.org/10.1063/1.4936094Test -
7
المؤلفون: G. Lucovsky, Z. Lu, Klaus J. Bachmann, Nikolaus Dietz, S. Habermehl
المصدر: Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films. 12:990-994
مصطلحات موضوعية: Materials science, Passivation, Low-energy electron diffraction, Silicon, Analytical chemistry, chemistry.chemical_element, Nanotechnology, Surfaces and Interfaces, Chemical vapor deposition, Condensed Matter Physics, Epitaxy, Surfaces, Coatings and Films, chemistry, Remote plasma, Thin film, Vicinal
الوصول الحر: https://explore.openaire.eu/search/publication?articleId=doi_________::18c0ec350c28e1c178f97da16dc97236Test
https://doi.org/10.1116/1.579077Test -
8
المؤلفون: G. Lucovsky, S.S. He, D.J. Stephens, T. Yasuda, S. Habermehl, Y. Ma
المصدر: Thin Solid Films. 220:38-44
مصطلحات موضوعية: Thermal oxidation, Materials science, Silicon, Composite number, Metals and Alloys, Oxide, chemistry.chemical_element, Heterojunction, Surfaces and Interfaces, Dielectric, Nitride, Surfaces, Coatings and Films, Electronic, Optical and Magnetic Materials, chemistry.chemical_compound, Chemical engineering, chemistry, Materials Chemistry, Thin film
الوصول الحر: https://explore.openaire.eu/search/publication?articleId=doi_________::9e03c552ea095f36119bebf79712da67Test
https://doi.org/10.1016/0040-6090Test(92)90545-m -
9
المؤلفون: G. Lucovsky, T. Yasuda, S. Habermehl, Y. Ma
المصدر: Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films. 10:781-787
مصطلحات موضوعية: Materials science, Passivation, Silicon, Analytical chemistry, chemistry.chemical_element, Heterojunction, Surfaces and Interfaces, Plasma, Chemical vapor deposition, Condensed Matter Physics, Surfaces, Coatings and Films, chemistry, Transmission electron microscopy, Remote plasma, Thin film
الوصول الحر: https://explore.openaire.eu/search/publication?articleId=doi_________::1811a609c4145688331dbca04e080fb2Test
https://doi.org/10.1116/1.578163Test -
10
المؤلفون: S. Habermehl, M. J. Rightley, R. D. Nasby
المصدر: Applied Physics Letters. 75:1122-1124
مصطلحات موضوعية: Materials science, Physics and Astronomy (miscellaneous), Silicon, business.industry, Oxide, chemistry.chemical_element, Nitride, equipment and supplies, complex mixtures, Non-volatile memory, chemistry.chemical_compound, Tunnel effect, chemistry, MOSFET, Optoelectronics, Field-effect transistor, Silicon oxide, business
الوصول الحر: https://explore.openaire.eu/search/publication?articleId=doi_________::c54461975d74c443d76f160d6e62a0c9Test
https://doi.org/10.1063/1.124616Test