المؤلفون: Huang, Xiaohu¹ (AUTHOR), Yong, Anna Marie¹ (AUTHOR), Lin, Ming¹ (AUTHOR), Teo, Siew Lang¹ (AUTHOR), Cao, Jing¹ (AUTHOR), Meng, Tzee Luai¹ (AUTHOR), Ng, Yee¹ (AUTHOR), Karyappa, Rahul¹ (AUTHOR), Liu, Hailong¹ (AUTHOR), Tan, Chee Kiang Ivan¹ (AUTHOR), Suwardi, Ady¹ (AUTHOR), Zhu, Qiang¹ (AUTHOR), Liu, Hongfei¹ (AUTHOR)

المصدر: Journal of Applied Physics. 3/7/2024, Vol. 135 Issue 9, p1-8. 8p.

مصطلحات موضوعية: *RAPID thermal processing, *MAGNETRON sputtering, *REACTIVE sputtering, *THIN films, *INTERFACE structures, *PHASE separation, *NITRIDES

المؤلفون: Lin, Y. H. G.¹ (AUTHOR) f01222018@ntu.edu.tw, Wan, H. W.¹ (AUTHOR), Young, L. B.¹ (AUTHOR), Lai, K. H.¹ (AUTHOR), Liu, J.² (AUTHOR), Cheng, Y. T.¹ (AUTHOR), Kwo, J.³ (AUTHOR) raynien@phys.nthu.edu.tw, Hong, M.^1,2 (AUTHOR) mhong@phys.ntu.edu.tw

المصدر: Journal of Applied Physics. 1/7/2024, Vol. 135 Issue 1, p1-7. 7p.

مصطلحات موضوعية: *STRAY currents, *RAPID thermal processing, *HETEROJUNCTIONS, *PASSIVATION, *METALLIC oxides

المؤلفون: Young Lee, Il¹ (AUTHOR), Yu, Jaejun¹ (AUTHOR) jyu@snu.ac.kr

المصدر: Journal of Applied Physics. 8/21/2023, Vol. 134 Issue 7, p1-9. 9p.

مصطلحات موضوعية: *MORPHOTROPIC phase boundaries, *RAPID thermal processing, *TITANIUM nitride, *ELECTRODES, *TIN, *THIN films, *LEAD-free ceramics

المؤلفون: Khatoon, Najma¹ (AUTHOR) nkhatoon@tulane.edu, Subedi, Binod¹ (AUTHOR), Chrisey, Douglas B.¹ (AUTHOR)

المصدر: ChemistryOpen. Jul2024, Vol. 13 Issue 7, p1-10. 10p.

مصطلحات موضوعية: *SILICON oxide, *RAPID thermal processing, *NANOSTRUCTURES, *NANOSTRUCTURED materials, *METASTABLE states

المؤلفون: Usha, K.S.^1,2 (AUTHOR), Lee, Sang Yeol^1,2 (AUTHOR) sylee2020@gachon.ac.kr

المصدر: Ceramics International. Jul2024:Part A, Vol. 50 Issue 13, p23244-23255. 12p.

مصطلحات موضوعية: *RAPID thermal processing, *ELECTROCHROMIC windows, *THIN films, *ELECTROCHROMIC devices, *OXIDE coating, *TUNGSTEN trioxide

المؤلفون: You, Daoming^1,2 (AUTHOR), Jiang, Yu^1,2 (AUTHOR), Li, Wenqing^1,2 (AUTHOR), Zhao, Yali¹ (AUTHOR), Wan, Lili¹ (AUTHOR), Tan, Manqing^1,2 (AUTHOR) mqtan@semi.ac.cn

المصدر: Ceramics International. Jul2024:Part A, Vol. 50 Issue 13, p22553-22564. 12p.

مصطلحات موضوعية: *RAPID thermal processing, *X-ray photoelectron spectroscopy, *STRAINS & stresses (Mechanics), *SILICON nitride, *GRAZING incidence, *DIFFRACTION patterns

المؤلفون: Mondal, S.^1,2 (AUTHOR), Jayalekshmi, U. J.^1,2 (AUTHOR), Singh, S.¹ (AUTHOR), Mukherjee, R. K.^1,2 (AUTHOR), Shukla, A. K.^1,2 (AUTHOR) shuklaak@nplindia.org

المصدر: Review of Scientific Instruments. Jun2024, Vol. 95 Issue 6, p1-15. 15p.

مصطلحات موضوعية: *EPITAXY, *RAPID thermal processing, *GRAPHENE, *ATOMIC force microscopy, *ANNEALING of metals, *DEBYE temperatures

المؤلفون: Blasco, M.¹ (AUTHOR), Dacunha, S.¹ (AUTHOR), Dominguez, C.¹ (AUTHOR), Faneca, J.¹ (AUTHOR) joaquin.faneca@imb-cnm.csic.es

المصدر: Applied Physics Letters. 5/27/2024, Vol. 124 Issue 22, p1-7. 7p.

مصطلحات موضوعية: *RAPID thermal processing, *ATMOSPHERIC nitrogen, *SILICON nitride, *DIRECTIONAL couplers, *REFRACTIVE index, *STOICHIOMETRY, *WAVEGUIDES, *VISIBLE spectra

المؤلفون: Maher, Olivier^1,2 (AUTHOR) OGM@zurich.ibm.com, Bernini, Roy¹ (AUTHOR), Harnack, Nele¹ (AUTHOR), Gotsmann, Bernd¹ (AUTHOR), Sousa, Marilyne¹ (AUTHOR), Bragaglia, Valeria¹ (AUTHOR), Karg, Siegfried¹ (AUTHOR) SFK@zurich.ibm.com

المصدر: Scientific Reports. 5/21/2024, Vol. 11 Issue 1, p1-15. 15p.

مصطلحات موضوعية: *RAPID thermal processing, *PATTERN recognition systems, *ATOMIC layer deposition, *PHASE change materials, *VANADIUM oxide

People: VON Neumann, John, 1903-1957

المؤلفون: Wang, Sheng-Min¹ (AUTHOR), Liu, Cheng-Rui¹ (AUTHOR), Chen, Yu-Ting¹ (AUTHOR), Lee, Shao-Chen¹ (AUTHOR), Tang, Ying-Tsan¹ (AUTHOR) yttang@ee.ncu.edu.tw

المصدر: Nanotechnology. 5/13/2024, Vol. 35 Issue 20, p1-7. 7p.

مصطلحات موضوعية: *FERROELECTRIC capacitors, *RAPID thermal processing, *OXIDE electrodes, *HIGH temperatures, *RECORDS management, *SUPERCAPACITOR electrodes, *SUPERCAPACITORS