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1مؤتمر
المؤلفون: Nitti, MA, Colasuonno, M, Nappi, E, Valentini, A, Fanizza, E, Benedic, F, Cicala, G, Prestopino, G., MILANI, ENRICO
المساهمون: Nitti, M, Colasuonno, M, Nappi, E, Valentini, A, Fanizza, E, Benedic, F, Cicala, G, Milani, E, Prestopino, G
مصطلحات موضوعية: Cathode, Crude petroleum, Crystalline material, Diamond cutting tool, Diamond, Electromagnetic wave, Electron affinity, Field emission cathode, Hydrogenation, Hydrogenolysi, Ketone, Microcomputer, Microwave, Photocathode, Photoelectricity, Plasma deposition, Plasma enhanced chemical vapor deposition, Plasma stability, Testing, Microwave Plasma Assisted Chemical Vapour Deposition, Morphology of film, Photoemission, Raman spectra, Diamond films, Settore FIS/01 - FISICA SPERIMENTALE
العلاقة: info:eu-repo/semantics/altIdentifier/wos/WOS:000260646800032; ispartofbook:Nuclear Instruments and Methods in Physics Research, Section A: Accelerators, Spectrometers, Detectors and Associated Equipment; 6th International Workshop on Ring Image Cherenkov Counters (RICH 2007); volume:595; issue:1; firstpage:131; lastpage:135; http://hdl.handle.net/2108/47170Test; info:eu-repo/semantics/altIdentifier/scopus/http://www.scopus.com/inward/record.url?eid=2-s2.0-51649117037&partnerID=40&md5=43c2eec32e9bb3ec9f6519e5008cabd5Test
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2دورية أكاديمية
المؤلفون: Bulou, S., Le Brizoual, L., Miska, P., de Poucques, L., Hugon, R., Belmahi, M., Bougdira, J.
المساهمون: Institut Jean Lamour (IJL), Institut de Chimie - CNRS Chimie (INC-CNRS)-Université de Lorraine (UL)-Centre National de la Recherche Scientifique (CNRS), Institut des Matériaux Jean Rouxel (IMN), Université de Nantes - UFR des Sciences et des Techniques (UN UFR ST), Université de Nantes (UN)-Université de Nantes (UN)-Ecole Polytechnique de l'Université de Nantes (EPUN), Université de Nantes (UN)-Université de Nantes (UN)-Institut de Chimie - CNRS Chimie (INC-CNRS)-Centre National de la Recherche Scientifique (CNRS), Laboratoire de physique des milieux ionisés et applications (LPMIA), Université Henri Poincaré - Nancy 1 (UHP)-Centre National de la Recherche Scientifique (CNRS)
المصدر: ISSN: 0257-8972.
مصطلحات موضوعية: Microwave plasma assisted chemical vapour deposition, SiCN, Chemical composition, Optical properties, Hexamethyldisilazane, [PHYS.COND.CM-MS]Physics [physics]/Condensed Matter [cond-mat]/Materials Science [cond-mat.mtrl-sci], [SPI.PLASMA]Engineering Sciences [physics]/Plasmas
العلاقة: hal-00849699; https://hal.science/hal-00849699Test
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3
المؤلفون: Jamal Bougdira, L. de Poucques, Patrice Miska, L. Le Brizoual, M. Belmahi, Simon Bulou, R. Hugon
المساهمون: Institut Jean Lamour (IJL), Université de Lorraine (UL)-Centre National de la Recherche Scientifique (CNRS), Institut d'Électronique et des Technologies du numéRique (IETR), Université de Nantes (UN)-Université de Rennes 1 (UR1), Université de Rennes (UNIV-RENNES)-Université de Rennes (UNIV-RENNES)-Institut National des Sciences Appliquées - Rennes (INSA Rennes), Institut National des Sciences Appliquées (INSA)-Université de Rennes (UNIV-RENNES)-Institut National des Sciences Appliquées (INSA)-CentraleSupélec-Centre National de la Recherche Scientifique (CNRS), Institut de Chimie du CNRS (INC)-Université de Lorraine (UL)-Centre National de la Recherche Scientifique (CNRS), Institut des Matériaux Jean Rouxel (IMN), Université de Nantes - UFR des Sciences et des Techniques (UN UFR ST), Université de Nantes (UN)-Université de Nantes (UN)-Centre National de la Recherche Scientifique (CNRS)-Institut de Chimie du CNRS (INC)-Ecole Polytechnique de l'Université de Nantes (EPUN), Université de Nantes (UN)-Université de Nantes (UN), Laboratoire de physique des milieux ionisés et applications (LPMIA), Université Henri Poincaré - Nancy 1 (UHP)-Centre National de la Recherche Scientifique (CNRS)
المصدر: Surface and Coatings Technology
Surface and Coatings Technology, Elsevier, 2011, 205, pp.S214-S217. ⟨10.1016/j.surfcoat.2011.02.014⟩مصطلحات موضوعية: Materials science, Analytical chemistry, Chemical composition, 02 engineering and technology, Chemical vapor deposition, 01 natural sciences, chemistry.chemical_compound, SiCN, 0103 physical sciences, Materials Chemistry, Thin film, ComputingMilieux_MISCELLANEOUS, 010302 applied physics, Microwave plasma assisted chemical vapour deposition, Thin layers, Optical properties, [SPI.PLASMA]Engineering Sciences [physics]/Plasmas, Surfaces and Interfaces, General Chemistry, 021001 nanoscience & nanotechnology, Condensed Matter Physics, Ion source, Surfaces, Coatings and Films, Amorphous solid, Silicon nitride, chemistry, [PHYS.COND.CM-MS]Physics [physics]/Condensed Matter [cond-mat]/Materials Science [cond-mat.mtrl-sci], 0210 nano-technology, Refractive index, Hexamethyldisilazane
الوصول الحر: https://explore.openaire.eu/search/publication?articleId=doi_dedup___::c61776b1f31105eada590e1fae73a7a0Test
https://hal.archives-ouvertes.fr/hal-02317606Test -
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المؤلفون: E. Milani, Elisabetta Fanizza, M.A. Nitti, Antonio Valentini, Giuseppe Prestopino, F. Bénédic, G. Cicala, E. Nappi, M. Colasuonno
مصطلحات موضوعية: Nuclear and High Energy Physics, Cathodes, Testing, Diamond films, Nanotechnology, Chemical vapor deposition, engineering.material, symbols.namesake, Plasma enhanced chemical vapor deposition, Photoelectricity, Microcomputers, Microwave Plasma Assisted Chemical Vapour Deposition, Diamond cutting tools, Nano, Photocathodes, Graphite, Crude petroleum, Crystalline materials, Diamonds, Electromagnetic waves, Electron affinity, Field emission cathodes, Hydrogenation, Hydrogenolysis, Ketones, Microwaves, Plasma deposition, Plasma stability, Diamond, Morphology of films, Photoemission, Raman spectra, Instrumentation, Physics, business.industry, Settore FIS/01 - Fisica Sperimentale, Surface coating, Electrode, engineering, symbols, Optoelectronics, Quantum efficiency, Raman spectroscopy, business
الوصول الحر: https://explore.openaire.eu/search/publication?articleId=doi_dedup___::76d3ff2235371f034620ef40af420dc4Test
http://hdl.handle.net/2108/47170Test -
5دورية أكاديمية
المؤلفون: Lamara, T., Belmahi, M., Hugon, R., Bougdira, J., Fabry, M., Rémy, M., Henrion, G.
المساهمون: Laboratoire de physique des milieux ionisés et applications (LPMIA), Université Henri Poincaré - Nancy 1 (UHP)-Centre National de la Recherche Scientifique (CNRS), Laboratoire de science et génie des surfaces (LSGS), Institut National Polytechnique de Lorraine (INPL)-Centre National de la Recherche Scientifique (CNRS)
المصدر: ISSN: 0257-8972.
مصطلحات موضوعية: Pulsed microwave plasma assisted chemical vapour deposition, Laser induced fluorescence, Diamond growth, [CHIM.MATE]Chemical Sciences/Material chemistry, [PHYS.PHYS.PHYS-PLASM-PH]Physics [physics]/Physics [physics]/Plasma Physics [physics.plasm-ph]
العلاقة: hal-00123391; https://hal.science/hal-00123391Test
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6دورية أكاديمية
المؤلفون: Kadlečíková Magdaléna, Breza Juraj, Veselý Marián, Frgala Zdeněk, Kudrle Vít, Janča Jan, Janík Ján, Buršík Jiří
المصدر: Microelectronics Journal
مصطلحات موضوعية: Microwave plasma assisted chemical vapour deposition, Diamond, Raman spectroscopy
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المؤلفون: Gérard Henrion, M. Fabry, M. Belmahi, Tarek Lamara, Jamal Bougdira, R. Hugon, M. Remy
المساهمون: Laboratoire de physique des milieux ionisés et applications (LPMIA), Université Henri Poincaré - Nancy 1 (UHP)-Centre National de la Recherche Scientifique (CNRS), Laboratoire de science et génie des surfaces (LSGS), Institut National Polytechnique de Lorraine (INPL)-Centre National de la Recherche Scientifique (CNRS), Centre National de la Recherche Scientifique (CNRS)-Institut National Polytechnique de Lorraine (INPL)
المصدر: Surface and Coatings Technology
Surface and Coatings Technology, Elsevier, 2005, Volume 200, Issues 1-4, pp.1110-1116. ⟨10.1016/j.surfcoat.2005.01.050⟩مصطلحات موضوعية: Materials science, Hydrogen, Analytical chemistry, chemistry.chemical_element, 02 engineering and technology, Chemical vapor deposition, engineering.material, 01 natural sciences, Laser induced fluorescence, [PHYS.PHYS.PHYS-PLASM-PH]Physics [physics]/Physics [physics]/Plasma Physics [physics.plasm-ph], Phase (matter), 0103 physical sciences, Materials Chemistry, Deposition (phase transition), Spectroscopy, Diamond growth, 010302 applied physics, Pulsed microwave plasma assisted chemical vapour deposition, Diamond, Surfaces and Interfaces, General Chemistry, Plasma, [CHIM.MATE]Chemical Sciences/Material chemistry, 021001 nanoscience & nanotechnology, Condensed Matter Physics, Ion source, Surfaces, Coatings and Films, chemistry, engineering, 0210 nano-technology
الوصول الحر: https://explore.openaire.eu/search/publication?articleId=doi_dedup___::835564c9f829e473353c4c3c3cb64b6bTest
https://hal.archives-ouvertes.fr/hal-00123391Test -
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المؤلفون: Eugenio Nappi, G. Cicala, M.A. Nitti, Antonio Valentini, F. Bénédic, P. Bruno
المصدر: NUCLEAR INSTRUMENTS & METHODS IN PHYSICS RESEARCH SECTION A-ACCELERATORS SPECTROMETERS DETECTORS AND ASSOCIATED EQUIPMENT 553 (2005): 157–164. doi:10.1016/j.nima.2005.08.084
info:cnr-pdr/source/autori:M.A.Nitti, E.Nappi,A. Valentini,F. Benedic, P. Bruno, G.Cicala/titolo:Progress in the production of CsI and diamond thin film photocathodes/doi:10.1016%2Fj.nima.2005.08.084/rivista:NUCLEAR INSTRUMENTS & METHODS IN PHYSICS RESEARCH SECTION A-ACCELERATORS SPECTROMETERS DETECTORS AND ASSOCIATED EQUIPMENT/anno:2005/pagina_da:157/pagina_a:164/intervallo_pagine:157–164/volume:553مصطلحات موضوعية: Physics, Nuclear and High Energy Physics, Photomultiplier, RICH detectors, photocathodes, caesium iodide, diamond, thermal evaporation, ion-beam sputtering, microwave plasma-assisted chemical vapour deposition, business.industry, Physics::Instrumentation and Detectors, Diamond, Chemical vapor deposition, Surface finish, engineering.material, Condensed Matter::Materials Science, Optics, Vacuum deposition, Sputtering, Condensed Matter::Superconductivity, Surface roughness, engineering, Optoelectronics, Quantum efficiency, business, Instrumentation
الوصول الحر: https://explore.openaire.eu/search/publication?articleId=doi_dedup___::9233844583d0ae9e4df9d9243a06bf19Test
https://publications.cnr.it/doc/33959Test -
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المؤلفون: Juraj Breza, Ján Janík, Jan Janča, M. Veselý, Magdaléna Kadlečíková, Jiří Buršík, Zdeněk Frgala, Vít Kudrle
المصدر: Microelectronics Journal
مصطلحات موضوعية: Microwave plasma assisted chemical vapour deposition, Diamond, Raman spectroscopy, Materials science, Hydrogen, Scanning electron microscope, Analytical chemistry, chemistry.chemical_element, 02 engineering and technology, Chemical vapor deposition, engineering.material, 010402 general chemistry, 01 natural sciences, Methane, chemistry.chemical_compound, symbols.namesake, Optics, Thin film, business.industry, General Engineering, 021001 nanoscience & nanotechnology, Ion source, 0104 chemical sciences, chemistry, engineering, symbols, 0210 nano-technology, business
الوصول الحر: https://explore.openaire.eu/search/publication?articleId=doi_dedup___::47394dfd50989a5755032d51f8b9c6f8Test
https://is.muni.cz/publication/491133Test