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1دورية أكاديمية
المؤلفون: George Machado Jr., Ph.D.
المصدر: Carbon Trends, Vol 7, Iss , Pp 100155- (2022)
مصطلحات موضوعية: Carbon nanotube growth, Cold-wall CVD, Low pressure CVD, Iron catalyst, CNT growth with acetylene, Two-phase growth step, Chemistry, QD1-999
وصف الملف: electronic resource
العلاقة: http://www.sciencedirect.com/science/article/pii/S2667056922000116Test; https://doaj.org/toc/2667-0569Test
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2دورية أكاديمية
المؤلفون: G. Machado, Jr., C. Coelho
المصدر: Carbon Trends, Vol 5, Iss , Pp 100087- (2021)
مصطلحات موضوعية: Carbon nanotube growth, Cold-wall CVD, Low pressure CVD, Iron catalyst, CNT growth with acetylene, Two-phase growth step, Chemistry, QD1-999
وصف الملف: electronic resource
العلاقة: http://www.sciencedirect.com/science/article/pii/S266705692100064XTest; https://doaj.org/toc/2667-0569Test
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3دورية أكاديمية
المؤلفون: Liu, Xia, Cao, Lianzhen, Guo, Zhen, Li, Yingde, Gao, Weibo, Zhou, Lianqun
المساهمون: School of Physical and Mathematical Sciences
مصطلحات موضوعية: Science::Physics, Atmospheric Pressure CVD, Low Pressure CVD
وصف الملف: application/pdf
العلاقة: Materials; Liu, X., Cao, L., Guo, Z., Li, Y., Gao, W., & Zhou, L. (2019). A review of perovskite photovoltaic materials’ synthesis and applications via chemical vapor deposition method. Materials, 12(20), 3304-. doi:10.3390/ma12203304; https://hdl.handle.net/10356/142232Test; 2-s2.0-85074259636; 20; 12
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4دورية أكاديمية
المؤلفون: Xia Liu, Lianzhen Cao, Zhen Guo, Yingde Li, Weibo Gao, Lianqun Zhou
المصدر: Materials; Volume 12; Issue 20; Pages: 3304
مصطلحات موضوعية: atmospheric pressure CVD, low pressure CVD, hybrid CVD, aerosol assisted CVD, pulsed CVD, perovskite photovoltaic nanomaterials, stabilization, structural design, performance optimization, solar cells
وصف الملف: application/pdf
العلاقة: Manufacturing Processes and Systems; https://dx.doi.org/10.3390/ma12203304Test
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5
المؤلفون: Lim, Taehoon
مصطلحات موضوعية: Materials Science, Chemistry, Chemical engineering, low-pressure CVD, Zinc oxide synthesis
وصف الملف: application/pdf
الوصول الحر: https://escholarship.org/uc/item/9s12n1kfTest
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6دورية أكاديمية
المؤلفون: Katsuhisa Sugimoto, Nobuyoshi Hara, Takeo Kubota
المصدر: Zairyo-to-Kankyo. 1999, 48(10):639
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7تقرير
المؤلفون: Sun GS, Luo MC, Wang L, Zhu SR, Li JM, Zeng YP, Lin LY, Sun GS,Chinese Acad Sci,Inst Semicond,Beijing 100083,Peoples R China.
مصطلحات موضوعية: 3c-sic, In-situ Doping, Low-pressure Cvd, Sapphire Substrate, Chemical-vapor-deposition, Competition Epitaxy, 半导体材料, chemical vapor deposition, atomic layer deposition, vapor-plating, cvd (chemical vapor deposition), deposition, chemical vapor, vapor deposition, chemical, chemische beschichtung aus dampfphase, revetement chimique en phase vapeur, atomic layer epitaxial growth, ale, mle growth, molecular layer epitaxial growth, chemical beam epitaxial growth, cbe, gas source mbe, gsmbe, metalorganic molecular beam epitaxy, mombe, ommbe, chemical vapour deposition, apcvd
العلاقة: SILICON CARBIDE AND RELATED MATERIALS 2001 PTS 1 AND 2 PROCEEDINGS; Sun GS; Luo MC; Wang L; Zhu SR; Li JM; Zeng YP; Lin LY .In situ doping of 3C-SiC grown on (0001) sapphire substrates by LPCVD ,SILICON CARBIDE AND RELATED MATERIALS 2001 PTS 1 AND 2 PROCEEDINGS,2002,389-3(0):339-342; http://ir.semi.ac.cn/handle/172111/11816Test
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8دورية أكاديمية
المؤلفون: Fumihiko Tamura, Katsuhisa Sugimoto, Noboru Akao, Nobuyoshi Hara
المصدر: Zairyo-to-Kankyo. 1997, 46(4):243
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9مؤتمر
المؤلفون: Wu, D., Mao, H. Y., Wu, W. G.
المساهمون: Wu, WG (reprint author), Peking Univ, Natl Key Lab Micro Nano Fabricat Technol, Inst Microelect, Beijing, Peoples R China., Peking Univ, Natl Key Lab Micro Nano Fabricat Technol, Inst Microelect, Beijing, Peoples R China.
المصدر: EI ; SCI
مصطلحات موضوعية: nanofabrication, nanowire, Low Pressure CVD, spacer technology, LITHOGRAPHY, TECHNOLOGY, ARRAYS
العلاقة: 2009 4TH IEEE INTERNATIONAL CONFERENCE ON NANO/MICRO ENGINEERED AND MOLECULAR SYSTEMS, VOLS 1 AND 2.; 1057245; http://hdl.handle.net/20.500.11897/153273Test; WOS:000273161500140
الإتاحة: https://doi.org/20.500.11897/153273Test
https://doi.org/10.1109/NEMS.2009.5068652Test
https://hdl.handle.net/20.500.11897/153273Test -
10دورية أكاديمية
المساهمون: Hu, SW (reprint author), Peking Univ, Coll Chem & Mol Engn, Dept Appl Chem, Beijing 100871, Peoples R China., Peking Univ, Coll Chem & Mol Engn, Dept Appl Chem, Beijing 100871, Peoples R China.
المصدر: SCI ; EI
مصطلحات موضوعية: CHEMICAL-VAPOR-DEPOSITION, TEMPERATURE SILICON-NITRIDE, LOW-PRESSURE CVD, MATRIX-ISOLATION, N-H, SILYLENE INSERTION, MECHANISM, RADICALS, HYDROGEN, FILMS
العلاقة: JOURNAL OF PHYSICAL CHEMISTRY A.2003,107,(43),9189-9196.; 1007743; http://hdl.handle.net/20.500.11897/151620Test; WOS:000186156000017
الإتاحة: https://doi.org/20.500.11897/151620Test
https://doi.org/10.1021/jp035684mTest
https://hdl.handle.net/20.500.11897/151620Test