المؤلفون: Ku, Yi-Sha, Lo, Chun-Wei, Lee, Cheng-Kang, Cho, Chia-Hung, Cheah, Wen-Qii, Chou, Po-Wen

المصدر: Metrology; Dec2023, Vol. 3 Issue 4, p365-376, 12p

مصطلحات موضوعية: SPECTROMETRY, GAIN measurement, SILICON, ARTIFICIAL neural networks, REFLECTOMETER

المؤلفون: Ku, Yi-Sha, Wang, Wei-Ting, Chen, Yi-Chang, Chen, Ming-Chang, Yeh, Chia-Liang, Lo, Chun-Wei

المساهمون: Adan, Ofer, Robinson, John C.

المصدر: Metrology, Inspection, and Process Control for Microlithography XXXIV

الإتاحة: https://doi.org/10.1117/12.2552218Test

المؤلفون: Starikov, Alexander, Ku, Yi-sha

المصدر: Journal of Micro/Nanolithography, MEMS, and MOEMS ; volume 13, issue 1, page 011201 ; ISSN 1932-5150

الإتاحة: https://doi.org/10.1117/1.jmm.13.1.011201Test
http://nanolithography.spiedigitallibrary.org/article.aspx?articleid=1853322Test

المؤلفون: Ku, Yi-Sha

المصدر: Journal of Micro/Nanolithography, MEMS, and MOEMS ; volume 13, issue 1, page 011209 ; ISSN 1932-5150

الإتاحة: https://doi.org/10.1117/1.jmm.13.1.011209Test
http://nanolithography.spiedigitallibrary.org/article.aspx?articleid=1842299Test

المؤلفون: Cho, Chia-Hung, Ku, Yi-Sha, Chang, Po-Yi, Lee, Han-Wen, Lo, Chun-Wei, Chen, Yi-Chang

المصدر: 2019 International Wafer Level Packaging Conference (IWLPC)

الإتاحة: https://doi.org/10.23919/iwlpc.2019.8914147Test
http://xplorestaging.ieee.org/ielx7/8902179/8913841/08914147.pdf?arnumber=8914147Test