المؤلفون: Kurt Ronse

المصدر: Micro and Nano Engineering, Vol 23, Iss , Pp 100263- (2024)

مصطلحات موضوعية: Optical lithography, Extreme ultra-violet lithography (EUV), Immersion lithography (ArFi), Resist, Scaling, Moore's law, Electronics, TK7800-8360, Technology (General), T1-995

وصف الملف: electronic resource

العلاقة: http://www.sciencedirect.com/science/article/pii/S2590007224000261Test; https://doaj.org/toc/2590-0072Test

الوصول الحر: https://doaj.org/article/fc691179b70643f6adf827dd6659b684Test

المؤلفون: Kut King Kan, Warren, Guerber, Sylvain, Garcia, Stéphanie, Fowler, Daivid, Alonso-Ramos, Carlos

المساهمون: Commissariat à l'énergie atomique et aux énergies alternatives - Laboratoire d'Electronique et de Technologie de l'Information (CEA-LETI), Direction de Recherche Technologique (CEA) (DRT (CEA)), Commissariat à l'énergie atomique et aux énergies alternatives (CEA)-Commissariat à l'énergie atomique et aux énergies alternatives (CEA), Centre de Nanosciences et de Nanotechnologies (C2N), Université Paris-Saclay-Centre National de la Recherche Scientifique (CNRS), European Project

المصدر: Optical Wireless Communication Conference ; https://hal.science/hal-04598641Test ; Optical Wireless Communication Conference, Dec 2023, Eindhoven, Netherlands

مصطلحات موضوعية: Silicon photonics, Optical phased array (OPA), Optical antenna, Free space communications, Immersion lithography, [PHYS]Physics [physics]

جغرافية الموضوع: Eindhoven, Netherlands

العلاقة: hal-04598641; https://hal.science/hal-04598641Test; https://hal.science/hal-04598641/documentTest; https://hal.science/hal-04598641/file/KutKingKan_Antenna_for_a_two-dimensional_integrated_Optical_Phased_Array.pdfTest

الإتاحة: https://hal.science/hal-04598641Test
https://hal.science/hal-04598641/documentTest
https://hal.science/hal-04598641/file/KutKingKan_Antenna_for_a_two-dimensional_integrated_Optical_Phased_Array.pdfTest

المؤلفون: Kan, Warren Kut King, Toxqui-Rodriguez, Sara, Medina-Quiroz, David, Nuño-Ruano, Paula, Melati, Daniele, Cassan, Eric, Marris-Morini, Delphine, Vivien, Laurent, Cheben, Pavel, Adelmini, Laeticia, Fowler, Daivid, Alonso-Ramos, Carlos

المساهمون: Commissariat à l'énergie atomique et aux énergies alternatives - Laboratoire d'Electronique et de Technologie de l'Information (CEA-LETI), Direction de Recherche Technologique (CEA) (DRT (CEA)), Commissariat à l'énergie atomique et aux énergies alternatives (CEA)-Commissariat à l'énergie atomique et aux énergies alternatives (CEA), Centre de Nanosciences et de Nanotechnologies (C2N), Université Paris-Saclay-Centre National de la Recherche Scientifique (CNRS), National Research Council of Canada (NRC), European Project

المصدر: 2023 Photonics North (PN)
https://hal.science/hal-04598612Test
2023 Photonics North (PN), Jun 2023, Montreal, Canada. pp.1-1, ⟨10.1109/PN58661.2023.10222958⟩

مصطلحات موضوعية: Silicon photonics, subwavelength grating nanostructures, ultra-broadband MMI, immersion lithography, [PHYS]Physics [physics]

جغرافية الموضوع: Montreal

الوقت: Montreal, Canada

العلاقة: hal-04598612; https://hal.science/hal-04598612Test; https://hal.science/hal-04598612/documentTest; https://hal.science/hal-04598612/file/Published_Paper_MMI_SWG_imm_litho_2023_06.pdfTest

الإتاحة: https://doi.org/10.1109/PN58661.2023.10222958Test
https://hal.science/hal-04598612Test
https://hal.science/hal-04598612/documentTest
https://hal.science/hal-04598612/file/Published_Paper_MMI_SWG_imm_litho_2023_06.pdfTest

المؤلفون: Hu, Liang¹, Wu, Min¹, Chen, Wenyu¹, Xie, Haibo¹ hbxie@zju.edu.cn, Fu, Xin¹

المصدر: Experimental Thermal & Fluid Science. Oct2017, Vol. 87, p50-59. 10p.

مصطلحات موضوعية: *GAS-liquid interfaces, *IMMERSION lithography, *IMMERSION in liquids, *INTERFACES (Physical sciences), *SEA surface microlayer

المؤلفون: Boogaard, Arjen¹, Smith, Ian², Mouraille, Orion¹, Knaapen, Thijs¹, Stegen, Raf¹

المصدر: IEEE Transactions on Semiconductor Manufacturing. Aug2013, Vol. 26 Issue 3, p423-429. 7p.

مصطلحات موضوعية: IMMERSION lithography, SEMICONDUCTOR equipment, ACQUISITION of data, PHOTOLITHOGRAPHY, PREDICTION models

المؤلفون: Li, Xiaoping¹, Zhao, Yiwen¹, Lei, Min¹ leimin2521@hotmail.com

المصدر: Flow Measurement & Instrumentation. Mar2017 Part B, Vol. 53 Issue Part B, p317-325. 9p.

مصطلحات موضوعية: *AUTOMATIC control systems, *IMMERSION lithography, *TIME delay systems, *ROBUST control, *TEMPERATURE control

المؤلفون: Fu, Xin¹, Huang, Yao¹, Hu, Liang¹ cmeehuli@zju.edu.cn, Xie, Haibo¹, Chen, Wenyu¹

المصدر: Flow Measurement & Instrumentation. Mar2017 Part B, Vol. 53 Issue Part B, p190-203. 14p.

مصطلحات موضوعية: *ELECTRONIC behavior control, *IMMERSION lithography, *SEMICONDUCTORS, *INDUSTRIAL contamination, *MENISCUS (Liquids)

المؤلفون: Liang Hu¹, Mingbo Li¹, Wenyu Chen¹, Haibo Xie¹ hbxie@zju.edu.cn, Xin Fu¹

المصدر: Physics of Fluids. 2016, Vol. 28 Issue 8, p1-20. 20p. 1 Color Photograph, 4 Diagrams, 1 Chart, 10 Graphs.

مصطلحات موضوعية: *IMMERSION lithography, *POROUS materials, *PERMEABILITY, *FLUID flow, *BUBBLES, *FLUID mechanics

المؤلفون: French, Roger H.¹ roger.h.french@usa.dupont.com, Tran, Hoang V.¹

المصدر: Annual Review of Materials Research. 2009, Vol. 39 Issue 1, p93-126. 24p.

مصطلحات موضوعية: IMMERSION lithography, REFRACTIVE index, LIQUIDS, PHOTORESISTS, MATERIALS testing, LITHOGRAPHY

المؤلفون: Khorram, Hamid R.¹, Nakano, Katsushi², Sagawa, Natsuko², Fujiwara, Tomoharu², Iriuchijima, Yasuhiro², Sei, Toshihiko², Takahiro, Tomioka², Nakamura, Keichi², Shiraishi, Kenichi², Hayashi, Tsunehito²

المصدر: IEEE Transactions on Semiconductor Manufacturing. Feb2012, Vol. 25 Issue 1, p63-71. 9p.

مصطلحات موضوعية: IMMERSION lithography, SWITCHING circuits, PHOTORESISTS, POINT defects, LITHOGRAPHY, CONTACT angle, SILICON, WATER pollution