المؤلفون: Hassaan, Muhammad¹ (AUTHOR) muhammadhassaan@ieee.org, Saleem, Umama¹ (AUTHOR), Singh, Akash¹ (AUTHOR), Haque, Abrar Jawad¹ (AUTHOR), Wang, Kaiying¹ (AUTHOR) kaiying.wang@usn.no

المصدر: Materials (1996-1944). Jun2024, Vol. 17 Issue 11, p2552. 18p.

مصطلحات موضوعية: *PHOTORESISTS, *EXTREME ultraviolet lithography, *PHOTOLITHOGRAPHY, *ULTRAVIOLET lithography, *LITHOGRAPHY, *ELECTRON beam lithography

المؤلفون: Knappett, Jerome B. M.¹ j.knappett@latrobe.edu.au, Haydon, Blair¹, Cowie, Bruce C. C.², Kewish, Cameron M.^1,2, van Riessen, Grant A.¹ g.vanriessen@latrobe.edu.au

المصدر: Journal of Synchrotron Radiation. May2024, Vol. 31 Issue 3, p485-492. 8p.

مصطلحات موضوعية: *SOFT X rays, *EXTREME ultraviolet lithography, *NANOLITHOGRAPHY, *PHYSICAL optics, *LIGHT sources, *IMAGE converters

المؤلفون: Laffert, V., Sajjadian, F. S., Richter, R., van Setten, M. J., Holzmeier, F.

المصدر: Journal of Chemical Physics; 4/7/2024, Vol. 160 Issue 13, p1-8, 8p

مصطلحات موضوعية: PHOTOLITHOGRAPHY, PHOTOIONIZATION, COINCIDENCE circuits, EXTREME ultraviolet lithography, SYNCHROTRON radiation, INTEGRATED circuits

المؤلفون: Wen, Zaoxia¹ (AUTHOR), Liu, Xingyu¹ (AUTHOR), Chen, Wenxiu¹ (AUTHOR) 2021111017017@stu.hznu.edu.cn, Zhou, Ruolin¹ (AUTHOR), Wu, Hao¹ (AUTHOR), Xia, Yongmei¹ (AUTHOR), Wu, Lianbin¹ (AUTHOR) wulianbin@hznu.edu.cn

المصدر: Polymers (20734360). Mar2024, Vol. 16 Issue 6, p846. 24p.

مصطلحات موضوعية: *EXTREME ultraviolet lithography, *NANOIMPRINT lithography, *ULTRAVIOLET lithography, *PHOTORESISTS, *LITHOGRAPHY, *DIGITAL subtraction angiography

المؤلفون: Greengard, Samuel

المصدر: Communications of the ACM; Jul2024, Vol. 67 Issue 7, p14-16, 3p

مصطلحات موضوعية: LITHOGRAPHY, NANOIMPRINT lithography, INTEGRATED circuits, EXTREME ultraviolet lithography, SEMICONDUCTORS, MOORE'S law

الشركة/الكيان: ASML Holding NV, CANON Inc.

المؤلفون: Mostafa, Y.^1,2 (AUTHOR), Behnke, L.^1,2 (AUTHOR), Engels, D. J.^1,2 (AUTHOR), Bouza, Z.^1,2 (AUTHOR), Sheil, J.^1,2 (AUTHOR), Ubachs, W.^1,2 (AUTHOR), Versolato, O. O.^1,2 (AUTHOR) o.versolato@arcnl.nl

المصدر: Applied Physics Letters. 12/4/2023, Vol. 123 Issue 23, p1-6. 6p.

مصطلحات موضوعية: *LASER plasmas, *EXTREME ultraviolet lithography, *TIN, *SEMICONDUCTOR devices, *SEMICONDUCTOR manufacturing

المؤلفون: Tae Wan Park^1,2, Young Lim Kang², Eun Bin Kang², Hyunsung Jung³, Seoung-Ki Lee⁴, Geon-Tae Hwang², Jung Woo Lee⁴, Si-Young Choi⁵, Sahn Nahm⁵, Se-Hun Kwon⁴ sehun@pusan.ac.kr, Kwang Ho kim^4,6 kwhokim@pusan.ac.kr, Woon Ik Park² thane0428@pknu.ac.kr

المصدر: Advanced Science. 10/17/2023, Vol. 10 Issue 29, p1-9. 9p.

مصطلحات موضوعية: *EXTREME ultraviolet lithography, *PHYSICAL vapor deposition

المؤلفون: Yang, Fang-Ling¹ (AUTHOR) gfujun@scu.edu.cn, Ye, Zong-Biao¹ (AUTHOR), Chen, Yu-Qi¹ (AUTHOR), Wang, Ming-Hui² (AUTHOR), Zhou, Pan-Pan³ (AUTHOR), Gou, Fu-Jun¹ (AUTHOR)

المصدر: New Journal of Chemistry. 10/7/2023, Vol. 47 Issue 37, p17244-17251. 8p.

مصطلحات موضوعية: *PHOTORESISTS, *EXTREME ultraviolet lithography, *ATOMIC charges, *ELECTRON affinity, *ELECTRON impact ionization, *PHOTOIONIZATION

المؤلفون: Zuev, S. Yu.¹ (AUTHOR), Lopatin, A. Ya.¹ (AUTHOR), Luchin, V. I.¹ (AUTHOR), Salashchenko, N. N.¹ (AUTHOR), Tsybin, N. N.¹ (AUTHOR) tsybin@ipmras.ru, Chkhalo, N. I.¹ (AUTHOR)

المصدر: Russian Microelectronics. Oct2023, Vol. 52 Issue 5, p344-355. 12p.

مصطلحات موضوعية: *LITHOGRAPHY, *EXTREME ultraviolet lithography, *LITERATURE reviews, *THIN films, *WAVELENGTHS

المؤلفون: Colbeck Kirby, Lauren, Lodha, Jayant K., Astley, Simon, Skelton, Dave, Armini, Silvia, Evans, Andrew, Brady-Boyd, Anita

المصدر: Nanomaterials (2079-4991); Jun2024, Vol. 14 Issue 11, p982, 15p

مصطلحات موضوعية: X-ray photoelectron spectroscopy, SUBSTRATES (Materials science), EXTREME ultraviolet lithography, BIOCHEMICAL substrates, SURFACE energy, BLUE light, BAND gaps