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1دورية أكاديمية
المؤلفون: C. A. Bollinger, D. Grube, S. A. Lytle, E. P. Martin, J A. Shimer, H. R. Siddiqui,
In "proc Th Int, J. J. Hsieh, D. E. Ibbotson, J A. Mucha, N. Selamoglu, S. J. Pearton, U. K. Chakrabarti, E. Lane, A. P. Perley, C. R. Abernathy, W. S. Hobson, K. S. Jones المساهمون: The Pennsylvania State University CiteSeerX Archives
وصف الملف: application/pdf
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المؤلفون: J. A. Mucha, A. D. Johnson, J. Perrin, D. E. Ibbotson
المصدر: The Journal of Physical Chemistry. 97:12937-12948
مصطلحات موضوعية: Stereochemistry, Kinetics, Thermal decomposition, General Engineering, Analytical chemistry, Partial pressure, Atmospheric temperature range, Decomposition, chemistry.chemical_compound, chemistry, Silicon carbide, Physical and Theoretical Chemistry, Thin film, Methylsilane
الوصول الحر: https://explore.openaire.eu/search/publication?articleId=doi_________::328a97448c404ddd463fdaea8b82f072Test
https://doi.org/10.1021/j100151a049Test -
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المؤلفون: D. E. Ibbotson, C.‐P. Chang, V. M. Donnelly
المصدر: Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films. 10:1060-1064
مصطلحات موضوعية: Materials science, Silicon, business.industry, Analytical chemistry, chemistry.chemical_element, Surfaces and Interfaces, Plasma, Condensed Matter Physics, Temperature measurement, Surfaces, Coatings and Films, chemistry, Etching (microfabrication), Torr, Optoelectronics, Wafer, business, Plasma processing, Helium
الوصول الحر: https://explore.openaire.eu/search/publication?articleId=doi_________::23a055250cfa1593fac51f746358f099Test
https://doi.org/10.1116/1.578202Test -
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المؤلفون: C. P. Chang, F.P. Klemens, T. C. Lee, D. E. Ibbotson, Helen L. Maynard, Avinoam Kornblit
المصدر: Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures. 15:646
مصطلحات موضوعية: Materials science, Silicon, business.industry, General Engineering, Analytical chemistry, Gate stack, chemistry.chemical_element, Plasma, chemistry, Etching (microfabrication), Torr, Optoelectronics, Polycide, business, Helical resonator
الوصول الحر: https://explore.openaire.eu/search/publication?articleId=doi_________::e3739fbb66aaa3335c883eadb74365f1Test
https://doi.org/10.1116/1.589307Test -
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المؤلفون: D. E. Ibbotson, I. Tepermeister, F.P. Klemens, William M. Mansfield, Jaesik Lee, N. Blayo
المصدر: Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures. 14:3283
مصطلحات موضوعية: Plasma etching, Materials science, business.industry, General Engineering, Analytical chemistry, Titanium nitride, chemistry.chemical_compound, Helicon, chemistry, Gate oxide, Ellipsometry, Etching (microfabrication), Optoelectronics, Plasma diagnostics, Reactive-ion etching, business
الوصول الحر: https://explore.openaire.eu/search/publication?articleId=doi_________::d2ee20e513064b6431be26b6fc27acb0Test
https://doi.org/10.1116/1.588821Test -
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المؤلفون: N. Layadi, D. E. Ibbotson, R. A. Richardson, I. Tepermeister, Helen L. Maynard, Jaesik Lee, K. V. Guinn, F.P. Klemens, P. O. Egan
المصدر: Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures. 14:2510
مصطلحات موضوعية: Silicon, Chemistry, business.industry, General Engineering, Analytical chemistry, chemistry.chemical_element, Plasma, Etching (microfabrication), Electron temperature, Optoelectronics, Wafer, Plasma diagnostics, Reactive-ion etching, business, Helical resonator
الوصول الحر: https://explore.openaire.eu/search/publication?articleId=doi_________::3fb91d6a9de4ac9a45dcb9fcfe7cea74Test
https://doi.org/10.1116/1.588761Test -
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المؤلفون: D. E. Ibbotson, I. Tepermeister, J. T. C. Lee, H. H. Sawin
المصدر: Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures. 12:2322
مصطلحات موضوعية: Electron density, Chemistry, General Engineering, Electron, Electron cyclotron resonance, Ion, symbols.namesake, Helicon, Physics::Plasma Physics, symbols, Langmuir probe, Electron temperature, Atomic physics, Current density
الوصول الحر: https://explore.openaire.eu/search/publication?articleId=doi_________::8971f6391277a04b699cc977d99511c3Test
https://doi.org/10.1116/1.587759Test -
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المؤلفون: J. T. C. Lee, D. E. Ibbotson, N. Blayo, H. H. Sawin, R. A. Gottscho, I. Tepermeister, F. P. Klemens
المصدر: Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures. 12:2310
مصطلحات موضوعية: Silicon, Chemistry, business.industry, General Engineering, Analytical chemistry, chemistry.chemical_element, Plasma, Electron cyclotron resonance, Helicon, Etching (microfabrication), Optoelectronics, Inductively coupled plasma, Reactive-ion etching, business, Plasma stability
الوصول الحر: https://explore.openaire.eu/search/publication?articleId=doi_________::3c9200f9773ce00db82d1649f6687228Test
https://doi.org/10.1116/1.587758Test -
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المؤلفون: D. E. Ibbotson, G. W. Gibson, I. Tepermeister, H. H. Sawin, J. T. C. Lee
المصدر: Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures. 12:2333
مصطلحات موضوعية: Chemistry, Cyclotron, General Engineering, Flux, Plasma, Electron cyclotron resonance, Ion, law.invention, Helicon, Physics::Plasma Physics, Etching (microfabrication), law, Wafer, Atomic physics
الوصول الحر: https://explore.openaire.eu/search/publication?articleId=doi_________::4f785722c01bfa54d2094934a5fdb01fTest
https://doi.org/10.1116/1.587760Test -
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المؤلفون: T. Boone, A. Onuoha, N. Blayo, G. S. Higashi, F.P. Klemens, J. T. C. Lee, H. H. Sawin, I. Tepermeister, D. E. Ibbotson, J. L. Benton
المصدر: Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures. 12:1340
مصطلحات موضوعية: Materials science, business.industry, General Engineering, Analytical chemistry, Carrier lifetime, Plasma, Electron cyclotron resonance, Helicon, Gate oxide, Etching (microfabrication), Optoelectronics, Wafer, Reactive-ion etching, business
الوصول الحر: https://explore.openaire.eu/search/publication?articleId=doi_________::115baf7f4d2ed1a2a20f5e3b0c57109dTest
https://doi.org/10.1116/1.587297Test