المؤلفون: Chuang HC, Tsai MH, Lin YT, Chou MH, Huang TL, Chiu TJ, Lu H, Fang FM, Chien CY

المصدر: Cancer Management and Research, Vol Volume 12, Pp 9013-9021 (2020)

مصطلحات موضوعية: head and neck squamous cell carcinoma, hypopharyngeal cancer, laryngeal cancer, systemic inflammation response index, neutrophil–lymphocyte ratio, lymphocyte–monocyte ratio, Neoplasms. Tumors. Oncology. Including cancer and carcinogens, RC254-282

وصف الملف: electronic resource

العلاقة: https://www.dovepress.com/the-clinical-impacts-of-pretreatment-peripheral-blood-ratio-on-lymphoc-peer-reviewed-article-CMARTest; https://doaj.org/toc/1179-1322Test

الوصول الحر: https://doaj.org/article/2bcd9dd282c24382b3128cf4bd1be238Test

المؤلفون: 邱泰榮, Chiu, TJ

المساهمون: 科技學院:電機工程學系, Cheng, YL (Cheng, Yi-Lung), Wu, J (Wu, Jiung), Chiu, TJ (Chiu, Tai-Jung), Chen, SA(Chen, Shiuan-An), Wang, YL (Wang, Ying-Lang)

مصطلحات موضوعية: CHEMICAL-VAPOR-DEPOSITION, LOW-K, DIFFUSION-BARRIER, H FILMS, INTERCONNECTS, HEXAMETHYLDISILOXANE, ELECTROMIGRATION, DIELECTRICS, DAMAGE, WIDTH

وصف الملف: 99 bytes; text/html

العلاقة: JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B,29(5): MAY 2012; http://ir.ncnu.edu.tw:8080/handle/310010000/12546Test; http://ir.ncnu.edu.tw:8080/bitstream/310010000/12546/1/index.htmlTest

الإتاحة: http://ir.ncnu.edu.tw:8080/handle/310010000/12546Test
http://ir.ncnu.edu.tw:8080/bitstream/310010000/12546/1/index.htmlTest

المؤلفون: 邱泰榮, Chiu, TJ

المساهمون: 科技學院:電機工程學系, Wei, BJ (Wei, Bor-Jou), Cheng, YL (Cheng, Yi-Lung), Lu, FH (Lu, Fu-Hsing), Chiu, TJ (Chiu, Tai-Jung), Shih, HC (Shih, Han-Chang)

مصطلحات موضوعية: CHEMICAL-VAPOR-DEPOSITION, OXIDE-FILMS, RELIABILITY, BARRIER, HEXAMETHYLDISILOXANE, INTERCONNECTS

وصف الملف: 99 bytes; text/html

العلاقة: JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A,29(4): JUL 2011; http://ir.ncnu.edu.tw:8080/handle/310010000/12547Test; http://ir.ncnu.edu.tw:8080/bitstream/310010000/12547/1/index.htmlTest

الإتاحة: http://ir.ncnu.edu.tw:8080/handle/310010000/12547Test
http://ir.ncnu.edu.tw:8080/bitstream/310010000/12547/1/index.htmlTest

المؤلفون: 邱泰榮, Chiu, TJ

المساهمون: 科技學院:電機工程學系, Cheng, YL (Cheng, Yi-Lung), Chen, SA(Chen, Shiuan-An), Chiu, TJ (Chiu, Tai-Jung), Wu, J (Wu, Jiung), Wei, BJ (Wei, Bor-Jou), Chang, HJ (Chang, Hung-Jui)

مصطلحات موضوعية: BARRIER, HEXAMETHYLDISILOXANE, FILMS

وصف الملف: 99 bytes; text/html

العلاقة: JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B,28(3): 573-576 MAY 2011; http://ir.ncnu.edu.tw:8080/handle/310010000/12545Test; http://ir.ncnu.edu.tw:8080/bitstream/310010000/12545/1/index.htmlTest

الإتاحة: http://ir.ncnu.edu.tw:8080/handle/310010000/12545Test
http://ir.ncnu.edu.tw:8080/bitstream/310010000/12545/1/index.htmlTest

المؤلفون: 邱泰榮, Chiu, TJ

المساهمون: 科技學院:電機工程學系, Cheng, YL (Cheng, Yi-Lung), Chiu, TJ (Chiu, Tai-Jung), Wei, BJ (Wei, Bor-Jou), Wang, HJ(Wang, Huan-Jung), Wu, J (Wu, Jiung), Wang, YL (Wang, Ying-Lang)

مصطلحات موضوعية: SILICON-NITRIDE, DIFFUSION-BARRIER, HYDROGEN PLASMA, FILMS, OXIDATION

وصف الملف: 99 bytes; text/html

العلاقة: JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B,28(3): 567-572 MAY 2013; http://ir.ncnu.edu.tw:8080/handle/310010000/12543Test; http://ir.ncnu.edu.tw:8080/bitstream/310010000/12543/1/index.htmlTest

الإتاحة: http://ir.ncnu.edu.tw:8080/handle/310010000/12543Test
http://ir.ncnu.edu.tw:8080/bitstream/310010000/12543/1/index.htmlTest

المؤلفون: 邱泰榮, Chiu, TJ

المساهمون: 科技學院:電機工程學系, Cheng, YL (Cheng, Yi-Lung), Wu, J (Wu, Jiung), Chiu, TJ (Chiu, Tai-Jung)

مصطلحات موضوعية: CHEMICAL-VAPOR-DEPOSITION, SILICON-OXIDE FILMS, THERMAL-STABILITY, HYDROGEN SILSESQUIOXANE, THIN-FILMS, ABSORPTION, DIOXIDE, GLASS

وصف الملف: 99 bytes; text/html

العلاقة: JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A,28(3): 456-461 MAY 2011; http://ir.ncnu.edu.tw:8080/handle/310010000/12544Test; http://ir.ncnu.edu.tw:8080/bitstream/310010000/12544/1/index.htmlTest

الإتاحة: http://ir.ncnu.edu.tw:8080/handle/310010000/12544Test
http://ir.ncnu.edu.tw:8080/bitstream/310010000/12544/1/index.htmlTest

المؤلفون: Wei, BJ (Wei, Bor-Jou), Cheng, YL (Cheng, Yi-Lung), Lu, FH (Lu, Fu-Hsing), Chiu, TJ (Chiu, Tai-Jung), Shih, HC (Shih, Han-Chang)

المساهمون: Inst Mat Sci & Nanotechnol

مصطلحات موضوعية: CHEMICAL-VAPOR-DEPOSITION, OXIDE-FILMS, RELIABILITY, BARRIER, HEXAMETHYLDISILOXANE, INTERCONNECTS

وصف الملف: 99 bytes; text/html

العلاقة: JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A Volume: 29 Issue: 4 Article Number: 041507; http://ir.lib.pccu.edu.tw//handle/987654321/24018Test; http://ir.lib.pccu.edu.tw/bitstream/987654321/24018/2/index.htmlTest

الإتاحة: http://ir.lib.pccu.edu.tw//handle/987654321/24018Test
http://ir.lib.pccu.edu.tw/bitstream/987654321/24018/2/index.htmlTest

المؤلفون: Wu, J

المساهمون: 科技學院:電機工程學系, Cheng, YL (Cheng, Yi-Lung), Wu, J (Wu, Jiung), Chiu, TJ (Chiu, Tai-Jung), Chen, SA(Chen, Shiuan-An), Wang, YL (Wang, Ying-Lang)

مصطلحات موضوعية: CHEMICAL-VAPOR-DEPOSITION, LOW-K, DIFFUSION-BARRIER, H FILMS, INTERCONNECTS, HEXAMETHYLDISILOXANE, ELECTROMIGRATION, DIELECTRICS, DAMAGE, WIDTH

وصف الملف: 99 bytes; text/html

العلاقة: JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B,29(5): MAY 2015; http://ir.ncnu.edu.tw:8080/handle/310010000/13078Test; http://ir.ncnu.edu.tw:8080/bitstream/310010000/13078/1/index.htmlTest

الإتاحة: http://ir.ncnu.edu.tw:8080/handle/310010000/13078Test
http://ir.ncnu.edu.tw:8080/bitstream/310010000/13078/1/index.htmlTest

المؤلفون: 王英郎, Wang, YL

المساهمون: 科技學院:電機工程學系, Cheng, YL (Cheng, Yi-Lung), Wu, J (Wu, Jiung), Chiu, TJ (Chiu, Tai-Jung), Chen, SA(Chen, Shiuan-An), Wang, YL (Wang, Ying-Lang)

مصطلحات موضوعية: CHEMICAL-VAPOR-DEPOSITION, LOW-K, DIFFUSION-BARRIER, H FILMS, INTERCONNECTS, HEXAMETHYLDISILOXANE, ELECTROMIGRATION, DIELECTRICS, DAMAGE, WIDTH

وصف الملف: 99 bytes; text/html

العلاقة: JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B,29(5): MAY 2011; http://ir.ncnu.edu.tw:8080/handle/310010000/13046Test; http://ir.ncnu.edu.tw:8080/bitstream/310010000/13046/1/index.htmlTest

الإتاحة: http://ir.ncnu.edu.tw:8080/handle/310010000/13046Test
http://ir.ncnu.edu.tw:8080/bitstream/310010000/13046/1/index.htmlTest

المؤلفون: 鄭義榮, Cheng, YL

المساهمون: 科技學院:電機工程學系, Wei, BJ (Wei, Bor-Jou), Cheng, YL (Cheng, Yi-Lung), Lu, FH (Lu, Fu-Hsing), Chiu, TJ (Chiu, Tai-Jung), Shih, HC (Shih, Han-Chang)

مصطلحات موضوعية: CHEMICAL-VAPOR-DEPOSITION, OXIDE-FILMS, RELIABILITY, BARRIER, HEXAMETHYLDISILOXANE, INTERCONNECTS

وصف الملف: 99 bytes; text/html

العلاقة: JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A,29(4): JUL 2012; http://ir.ncnu.edu.tw:8080/handle/310010000/12523Test; http://ir.ncnu.edu.tw:8080/bitstream/310010000/12523/1/index.htmlTest

الإتاحة: http://ir.ncnu.edu.tw:8080/handle/310010000/12523Test
http://ir.ncnu.edu.tw:8080/bitstream/310010000/12523/1/index.htmlTest