دورية أكاديمية

Investigation of Static Performances of 1.2kV 4H-SiC MOSFETs Fabricated Using All ‘Room Temperature’ Ion Implantations

التفاصيل البيبلوغرافية
العنوان: Investigation of Static Performances of 1.2kV 4H-SiC MOSFETs Fabricated Using All ‘Room Temperature’ Ion Implantations
المؤلفون: Mancini, Stephen A., Jang, Seung Yup, Chen, Zeyu, Kim, Dongyoung, Bialy, Alex, Raghotamacher, Balaji, Dudley, Michael, Mahadik, Nadeemullah, Stahlbush, Robert, Al-Jassim, Mowafak, Sung, Woongje
المساهمون: National Renewable Energy Laboratory (“NREL”), U.S. Department of Energy, the Advanced Manufacturing Office
المصدر: IEEE Journal of the Electron Devices Society ; volume 12, page 150-158 ; ISSN 2168-6734
بيانات النشر: Institute of Electrical and Electronics Engineers (IEEE)
سنة النشر: 2024
مصطلحات موضوعية: Electrical and Electronic Engineering, Electronic, Optical and Magnetic Materials, Biotechnology
نوع الوثيقة: article in journal/newspaper
اللغة: unknown
DOI: 10.1109/jeds.2024.3359974
الإتاحة: https://doi.org/10.1109/jeds.2024.3359974Test
https://ieeexplore.ieee.org/ielam/6245494/10416702/10416803-aam.pdfTest
http://xplorestaging.ieee.org/ielx7/6245494/10416702/10416803.pdf?arnumber=10416803Test
حقوق: https://creativecommons.org/licenses/by-nc-nd/4.0Test/ ; https://creativecommons.org/licenses/by-nc-nd/4.0Test/
رقم الانضمام: edsbas.22D266CE
قاعدة البيانات: BASE