دورية أكاديمية

The Numerical Simulations and Experimental Study of an 8-Inch SiC Single Crystal with Reduced BPD Density

التفاصيل البيبلوغرافية
العنوان: The Numerical Simulations and Experimental Study of an 8-Inch SiC Single Crystal with Reduced BPD Density
المؤلفون: Chengyuan Sun, Yunfei Shang, Zuotao Lei, Yujian Wang, Hao Xue, Chunhui Yang, Yingmin Wang
المصدر: Materials, Vol 17, Iss 10, p 2192 (2024)
بيانات النشر: MDPI AG, 2024.
سنة النشر: 2024
المجموعة: LCC:Technology
LCC:Electrical engineering. Electronics. Nuclear engineering
LCC:Engineering (General). Civil engineering (General)
LCC:Microscopy
LCC:Descriptive and experimental mechanics
مصطلحات موضوعية: physical vapor transport, SiC single crystal, BPD density, numerical simulation, Technology, Electrical engineering. Electronics. Nuclear engineering, TK1-9971, Engineering (General). Civil engineering (General), TA1-2040, Microscopy, QH201-278.5, Descriptive and experimental mechanics, QC120-168.85
الوصف: The basal plane dislocation (BPD) density is one of the most important defects affecting the application of SiC wafers. In this study, numerical simulations and corresponding experiments were conducted to investigate the influence of cooling processes, seed-bonding methods, and graphite crucible materials on the BPD density in an 8-inch N-type 4H-SiC single crystal grown by the physical vapor transport (PVT) method. The results showed that the BPD density could be effectively reduced by increasing the cooling rate, optimizing the seed-bonding method, and adopting a graphite crucible with a similar coefficient of thermal expansion as the SiC single crystal. The BPD density in the experiments showed that a high cooling rate reduced the BPD density from 4689 cm−2 to 2925 cm−2; optimization of the seed-bonding method decreased the BPD density to 1560 cm−2. The BPD density was further reduced to 704 cm−2 through the adoption of a graphite crucible with a smaller thermal expansion coefficient.
نوع الوثيقة: article
وصف الملف: electronic resource
اللغة: English
تدمد: 1996-1944
العلاقة: https://www.mdpi.com/1996-1944/17/10/2192Test; https://doaj.org/toc/1996-1944Test
DOI: 10.3390/ma17102192
الوصول الحر: https://doaj.org/article/e858d686ab354670850ccd2b0a14c861Test
رقم الانضمام: edsdoj.858d686ab354670850ccd2b0a14c861
قاعدة البيانات: Directory of Open Access Journals
الوصف
تدمد:19961944
DOI:10.3390/ma17102192