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101
المؤلفون: John C. Zolper, J. Han, James Robert Lothian, C. R. Abernathy, Randy J. Shul, A. Zeitouny, Moshe Eizenberg, Fan Ren, Xian-An Cao, S. J. Pearton
المصدر: Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films. 17:1221-1225
مصطلحات موضوعية: Materials science, Condensed matter physics, Annealing (metallurgy), Contact resistance, Doping, Wide-bandgap semiconductor, Schottky diode, chemistry.chemical_element, Surfaces and Interfaces, Tungsten, Condensed Matter Physics, Surfaces, Coatings and Films, chemistry, Electrical resistivity and conductivity, Ohmic contact
الوصول الحر: https://explore.openaire.eu/search/publication?articleId=doi_________::09fe9348d9a42512606cf978e120ea58Test
https://doi.org/10.1116/1.581799Test -
102
المؤلفون: Stephen J. Pearton, Fan Ren, D. Johnson, J. W. Lee, David C. Hays, Randy J. Shul, K. D. Mackenzie, C. R. Abernathy, Y. B. Hahn
المصدر: Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films. 17:2183-2187
مصطلحات موضوعية: Electron mobility, Materials science, Bipolar junction transistor, Analytical chemistry, Field-effect transistor, Heterojunction, Surfaces and Interfaces, Chemical vapor deposition, Thin film, Condensed Matter Physics, Sheet resistance, Electron cyclotron resonance, Surfaces, Coatings and Films
الوصول الحر: https://explore.openaire.eu/search/publication?articleId=doi_________::0df62aec67989a650da987a87188c882Test
https://doi.org/10.1116/1.582109Test -
103
المؤلفون: C. R. Abernathy, Y. B. Hahn, Sharon M. Donovan, Stephen J. Pearton, J. D. MacKenzie, J. Han, Randy J. Shul, David C. Hays, Hyun Cho
المصدر: Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films. 17:2202-2208
مصطلحات موضوعية: Materials science, Bond strength, Analytical chemistry, Wide-bandgap semiconductor, chemistry.chemical_element, Surfaces and Interfaces, Nitride, Condensed Matter Physics, Surfaces, Coatings and Films, chemistry, Dry etching, Thin film, Inductively coupled plasma, Boron, Interhalogen
الوصول الحر: https://explore.openaire.eu/search/publication?articleId=doi_________::a9ba2bf8bbe7284a6ef8b0a2b31304d2Test
https://doi.org/10.1116/1.582037Test -
104
المؤلفون: K. B. Jung, C. R. Abernathy, S. M. Donovan, Y. B. Hahn, Stephen J. Pearton, Randy J. Shul, D. C. Hays, J. Han, Hyun Cho
المصدر: Materials Science and Engineering: B. 60:95-100
مصطلحات موضوعية: Plasma etching, Materials science, Mechanical Engineering, fungi, technology, industry, and agriculture, Analytical chemistry, macromolecular substances, Plasma, Condensed Matter Physics, Ion bombardment, stomatognathic system, Mechanics of Materials, Sputtering, Etching (microfabrication), General Materials Science, Inductively coupled plasma, Surface states, Interhalogen
الوصول الحر: https://explore.openaire.eu/search/publication?articleId=doi_________::31b646fff5af60ea8063068c2d309212Test
https://doi.org/10.1016/s0921-5107Test(99)00036-7 -
105
المؤلفون: Fan Ren, S. M. Donovan, Randy J. Shul, Albert G. Baca, Melanie W. Cole, Xian-An Cao, C. R. Abernathy, Steve Pearton, J. C. Zolper, A. Zeitouny, Moshe Eizenberg
المصدر: Materials Science and Engineering: B. 59:362-365
مصطلحات موضوعية: Materials science, Annealing (metallurgy), Mechanical Engineering, Doping, Contact resistance, Analytical chemistry, Schottky diode, Condensed Matter Physics, Ion implantation, Mechanics of Materials, General Materials Science, Thermal stability, Metalorganic vapour phase epitaxy, Ohmic contact
الوصول الحر: https://explore.openaire.eu/search/publication?articleId=doi_________::295506edf8ee4d830fc2c321c5366a8fTest
https://doi.org/10.1016/s0921-5107Test(98)00351-1 -
106
المؤلفون: Fan Ren, Y. B. Hahn, C. R. Abernathy, Hyun Cho, Stephen J. Pearton, William Scott Hobson, K. B. Jung, David C. Hays
المصدر: Applied Surface Science. 147:125-133
مصطلحات موضوعية: business.industry, Chemistry, Inorganic chemistry, General Physics and Astronomy, BCL3, Heterojunction, Surfaces and Interfaces, General Chemistry, Plasma, Condensed Matter Physics, Surfaces, Coatings and Films, Etching (microfabrication), Desorption, Optoelectronics, Dry etching, Inductively coupled plasma, business, Gaas algaas
الوصول الحر: https://explore.openaire.eu/search/publication?articleId=doi_________::c79b61e0ffbd01f282d69c094f3e31f8Test
https://doi.org/10.1016/s0169-4332Test(99)00103-8 -
107
المؤلفون: Randy J. Shul, K. B. Jung, Stephen J. Pearton, Fan Ren, Hyun Cho, C. R. Abernathy, J Hun, Y. B. Hahn, David C. Hays
المصدر: Applied Surface Science. 147:134-139
مصطلحات موضوعية: Fabrication, Bond strength, Chemistry, Semiconductor materials, Analytical chemistry, General Physics and Astronomy, Mineralogy, Surfaces and Interfaces, General Chemistry, Plasma, Nitride, Condensed Matter Physics, Surfaces, Coatings and Films, Dry etching, Inductively coupled plasma, Interhalogen
الوصول الحر: https://explore.openaire.eu/search/publication?articleId=doi_________::05ee49473a0d80212f3a48bb67865415Test
https://doi.org/10.1016/s0169-4332Test(99)00104-x -
108
المؤلفون: Sharon M. Donovan, David C. Hays, C. R. Abernathy, Y. B. Hahn, Randy J. Shul, J. Han, Stephen J. Pearton, K. B. Jung, Hyun Cho
المصدر: Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films. 17:768-773
مصطلحات موضوعية: fungi, technology, industry, and agriculture, Wide-bandgap semiconductor, Analytical chemistry, chemistry.chemical_element, macromolecular substances, Surfaces and Interfaces, Plasma, Condensed Matter Physics, Surfaces, Coatings and Films, stomatognathic system, chemistry, Sputtering, Etching (microfabrication), Chlorine, Inductively coupled plasma, Selectivity
الوصول الحر: https://explore.openaire.eu/search/publication?articleId=doi_________::c1122f3b19fc8518c82e89e9d31d142bTest
https://doi.org/10.1116/1.581647Test -
109
المؤلفون: Y. B. Hahn, David C. Hays, Stephen J. Pearton, C. R. Abernathy, Hyun Cho, Randy J. Shul, K. B. Jung
المصدر: Applied Surface Science. 147:207-214
مصطلحات موضوعية: Inorganic chemistry, Analytical chemistry, General Physics and Astronomy, macromolecular substances, stomatognathic system, Etch pit density, Etching (microfabrication), Surface roughness, Inert gas, Plasma etching, business.industry, Chemistry, RF power amplifier, fungi, technology, industry, and agriculture, Plasma, Surfaces and Interfaces, General Chemistry, Condensed Matter Physics, Surfaces, Coatings and Films, Semiconductor, Torr, lipids (amino acids, peptides, and proteins), Dry etching, Inductively coupled plasma, business, Stoichiometry
الوصول الحر: https://explore.openaire.eu/search/publication?articleId=doi_dedup___::3d658965edc1412e01633c6f68ad0902Test
https://doi.org/10.1016/s0169-4332Test(99)00114-2 -
110
المؤلفون: J. Hong, T. Maeda, C. R. Abernathy, Randy J. Shul, S. M. Donovan, S. J. Pearton, Hyun Cho
المصدر: Materials Science and Engineering: B. 59:340-344
مصطلحات موضوعية: Materials science, business.industry, Mechanical Engineering, High selectivity, Analytical chemistry, Surface finish, Plasma, Nitride, Condensed Matter Physics, Highly selective, Mechanics of Materials, Optoelectronics, General Materials Science, Dry etching, Inductively coupled plasma, business, Volatility (chemistry)
الوصول الحر: https://explore.openaire.eu/search/publication?articleId=doi_________::a0157337fdeb3f0f37aa78eb8295d399Test
https://doi.org/10.1016/s0921-5107Test(98)00379-1