المؤلفون: Peuker, M., Lim, M.H., Smith, Henry I., Morton, R., van Langen-Suurling, A.K., Romijn, J., van der Drift, E.W.J.M., van Delft, F.C.M.J.M. falco.van.delft@philips.com

المصدر: Microelectronic Engineering. Jul2002, Vol. 61/62, p803. 7p.

مصطلحات موضوعية: *PHOTORESISTS, *ELECTRON beam lithography

المؤلفون: Xiaoli Zhu, Hailiang Li, Leifeng Cao, Shenye Liu, Peixiong Shi, Changqing Xie

المصدر: Journal of Micro/Nanolithography, MEMS & MOEMS; Jul2017, Vol. 16 Issue 3, p1-9, 9p

مصطلحات موضوعية: NANOFABRICATION, OPTICAL gratings, ELECTRON beams, ELECTRON beam lithography, X-ray spectroscopy

المؤلفون: Tsunghsueh Wu, Yang-Wei Lin

المصدر: Applied Surface Science. 435:1143-1149

مصطلحات موضوعية: Materials science, General Physics and Astronomy, Nanoparticle, 02 engineering and technology, 010402 general chemistry, 01 natural sciences, law.invention, symbols.namesake, law, Surface plasmon resonance, business.industry, Surfaces and Interfaces, General Chemistry, 021001 nanoscience & nanotechnology, Condensed Matter Physics, Laser, 0104 chemical sciences, Surfaces, Coatings and Films, symbols, Optoelectronics, X-ray lithography, Photonics, 0210 nano-technology, business, Raman spectroscopy, Raman scattering, Electron-beam lithography

الوصول الحر: https://explore.openaire.eu/search/publication?articleId=doi_________::7779bdf3ef6d80cf189d24e4078c28e4Test
https://doi.org/10.1016/j.apsusc.2017.11.213Test

المؤلفون: Changqing Xie, Xiaoli Zhu, Hailiang Li, Jiebin Niu, Yilei Hua, Lina Shi

المصدر: Optical Engineering; Mar2013, Vol. 52 Issue 3, p1-8, 8p

مصطلحات موضوعية: X-ray diffraction, DIFFRACTIVE optical elements, ELECTRON beams, ELECTRON beam lithography, SILICON carbide

المؤلفون: Yana Krivoshapkina, Steve Lenk, Marcus Kaestner, Ivo W. Rangelow, Claudia Lenk

المصدر: Microelectronic Engineering. 177:78-86

مصطلحات موضوعية: 010302 applied physics, Materials science, Nanotechnology, Context (language use), 02 engineering and technology, 021001 nanoscience & nanotechnology, Condensed Matter Physics, 01 natural sciences, Atomic and Molecular Physics, and Optics, Surfaces, Coatings and Films, Electronic, Optical and Magnetic Materials, law.invention, Nanolithography, Resist, law, 0103 physical sciences, X-ray lithography, Electrical and Electronic Engineering, Photolithography, 0210 nano-technology, Scanning probe lithography, Next-generation lithography, Electron-beam lithography

الوصول الحر: https://explore.openaire.eu/search/publication?articleId=doi_________::b24d4b3e9b0a343f5c1e8da2b7a15013Test
https://doi.org/10.1016/j.mee.2017.02.021Test

المؤلفون: Tomasz Wojtowicz, Jerzy Wróbel, Maciej Wiater, E. Bobko, D. Płoch

المصدر: Opto-Electronics Review. 25:65-68

مصطلحات موضوعية: Radiation, Materials science, Fabrication, business.industry, Quantum point contact, Nanotechnology, 02 engineering and technology, Substrate (electronics), 021001 nanoscience & nanotechnology, 01 natural sciences, Etching (microfabrication), 0103 physical sciences, Optoelectronics, General Materials Science, X-ray lithography, Electrical and Electronic Engineering, 010306 general physics, 0210 nano-technology, business, Lithography, Next-generation lithography, Electron-beam lithography

الوصول الحر: https://explore.openaire.eu/search/publication?articleId=doi_________::8d9acc2034f361ecb418551fb2749ab3Test
https://doi.org/10.1016/j.opelre.2017.04.005Test

المؤلفون: Hsiao-Wen Zan, Hung Chuan Liu, Chun Cheng Yeh, Wajdi Heni, Olivier Soppera, Dominique Berling

المصدر: Journal of Materials Chemistry C. 5:2611-2619

مصطلحات موضوعية: Nanostructure, Materials science, Oxide, Nanotechnology, 02 engineering and technology, Photoresist, 010402 general chemistry, medicine.disease_cause, 01 natural sciences, law.invention, chemistry.chemical_compound, law, Materials Chemistry, medicine, Lithography, business.industry, General Chemistry, 021001 nanoscience & nanotechnology, 0104 chemical sciences, chemistry, Optoelectronics, X-ray lithography, Photolithography, 0210 nano-technology, business, Electron-beam lithography, Ultraviolet

الوصول الحر: https://explore.openaire.eu/search/publication?articleId=doi_________::5377a1e32ff46d71c2c772c5b201f90dTest
https://doi.org/10.1039/c6tc05201kTest

المؤلفون: Dmitriy Nasimov, Alexander V. Latyshev, D. E. Utkin, Andrey Tsarev, Alexander Shklyev

المصدر: Physics Procedia. 86:127-130

مصطلحات موضوعية: Materials science, Scanning electron microscope, business.industry, Physics::Optics, 02 engineering and technology, Substrate (electronics), Physics and Astronomy(all), 020210 optoelectronics & photonics, Optics, Etching (microfabrication), 0202 electrical engineering, electronic engineering, information engineering, Nanometre, X-ray lithography, business, Lithography, Electron-beam lithography, Photonic crystal

الوصول الحر: https://explore.openaire.eu/search/publication?articleId=doi_dedup___::a0be071d32b2c55671c39e73c54bfd6cTest

المؤلفون: Kenneth E. Gonsalves, Subrata Ghosh, Midathala Yogesh, Chullikkattil P. Pradeep, Pulikanti Guruprasad Reddy, Satinder K. Sharma, Santu Nandi

المصدر: Materials Chemistry Frontiers. 1:1895-1899

مصطلحات موضوعية: Materials science, business.industry, Nanotechnology, 02 engineering and technology, Photoresist, 010402 general chemistry, 021001 nanoscience & nanotechnology, 01 natural sciences, 0104 chemical sciences, law.invention, Semiconductor, Resist, law, Materials Chemistry, Optoelectronics, General Materials Science, X-ray lithography, Photolithography, 0210 nano-technology, business, Lithography, Next-generation lithography, Electron-beam lithography

الوصول الحر: https://explore.openaire.eu/search/publication?articleId=doi_________::0d9785b41a9b412fb522332f5312f9bfTest
https://doi.org/10.1039/c7qm00140aTest

المؤلفون: A. L. Dolgiy, Matteo Salvato, C. Cirillo, Vitaly Bondarenko, Serghej L. Prischepa, Reza Baghdadi, Carmine Attanasio, Floriana Lombardi

المصدر: Nanotechnology. 28(46)

مصطلحات موضوعية: Fabrication, Materials science, Nanowire, Bioengineering, Nanotechnology, 02 engineering and technology, Porous silicon, 01 natural sciences, Settore FIS/03 - Fisica della Materia, electron beam lithography, 0103 physical sciences, General Materials Science, one-dimensional superconductivity, Electrical and Electronic Engineering, 010306 general physics, Superconductivity, quantum phase slips, Mechanical Engineering, Chemistry (all), General Chemistry, Nanonetwork, 021001 nanoscience & nanotechnology, porous silicon, Materials Science (all), Mechanics of Materials, X-ray lithography, 0210 nano-technology, Next-generation lithography, Electron-beam lithography

الوصول الحر: https://explore.openaire.eu/search/publication?articleId=doi_dedup___::ee84b692634fb59b5aa5f9afb8a8a811Test
https://pubmed.ncbi.nlm.nih.gov/29053470Test