-
1
المؤلفون: Cheng-Li Lin, Mu-Chun Wang, Haoshuang Gu, Bin Zhou, Deshi Li, Xuecheng Zou, Wen-Shiang Liao, Yue-Gie Liaw
المصدر: Solid-State Electronics. 126:46-50
مصطلحات موضوعية: 010302 applied physics, Materials science, Silicon, business.industry, Transistor, Electrical engineering, Silicon on insulator, chemistry.chemical_element, Condensed Matter Physics, 01 natural sciences, Aspect ratio (image), 010305 fluids & plasmas, Electronic, Optical and Magnetic Materials, Threshold voltage, law.invention, CMOS, chemistry, law, Gate oxide, 0103 physical sciences, Materials Chemistry, Optoelectronics, Wafer, Electrical and Electronic Engineering, business
الوصول الحر: https://explore.openaire.eu/search/publication?articleId=doi_________::edf7aa154495e678aba562e452530fbfTest
https://doi.org/10.1016/j.sse.2016.09.017Test -
2
المؤلفون: Mu-Chun Wang, Wen-How Lan, De-Huang Jhuang, Shea-Jue Wang, Jian-Liang Lin, Wen-Shiang Liao, Yi-De Lai
المصدر: 2015 International Symposium on Next-Generation Electronics (ISNE).
مصطلحات موضوعية: Materials science, Silicon, chemistry, business.industry, Fin height, Electrical engineering, Electrical performance, chemistry.chemical_element, Composite material, business, Fin (extended surface)
الوصول الحر: https://explore.openaire.eu/search/publication?articleId=doi_________::8b2997c595bd92055dc88fa2cb06476eTest
https://doi.org/10.1109/isne.2015.7131985Test -
3
المؤلفون: Si-Chen Lee, Wen‐Shiang Liao
المصدر: Journal of Applied Physics. 81:7793-7797
مصطلحات موضوعية: Amorphous silicon, Auger electron spectroscopy, Materials science, Silicon, Annealing (metallurgy), Analytical chemistry, General Physics and Astronomy, chemistry.chemical_element, engineering.material, Amorphous solid, chemistry.chemical_compound, Crystallography, Polycrystalline silicon, chemistry, Electron diffraction, engineering, Crystallite
الوصول الحر: https://explore.openaire.eu/search/publication?articleId=doi_________::93658d31573f951180a42ae64ac9271bTest
https://doi.org/10.1063/1.365389Test -
4
المؤلفون: Ming-Feng Lu, Guo-Wei Wu, Mu-Chun Wang, Hsin-Chia Yang, Shea-Jue Wang, Chuan-Hsi Liu, Wen-Shiang Liao, Jing-Zong Jhang
المصدر: 2013 International Symposium on Next-Generation Electronics.
مصطلحات موضوعية: Materials science, Silicon, business.industry, fungi, Gate dielectric, chemistry.chemical_element, Strained silicon, Thermal conduction, chemistry.chemical_compound, chemistry, Silicon nitride, MOSFET, Nano, Electronic engineering, Optoelectronics, business, Electrical conductor
الوصول الحر: https://explore.openaire.eu/search/publication?articleId=doi_________::6329369524a5f117f5ad672ff6bd8829Test
https://doi.org/10.1109/isne.2013.6512372Test -
5
المؤلفون: Sung-Ching Chi, Jing-Zong Jhang, Hsin-Chia Yang, Wen-Shiang Liao, Shea-Jue Wang, Yi-Hong Lee, Mu-Chun Wang, Chong-Kuan Du
المصدر: 2013 IEEE 5th International Nanoelectronics Conference (INEC).
مصطلحات موضوعية: Fin, Materials science, Silicon, chemistry, business.industry, MOSFET, Optoelectronics, chemistry.chemical_element, Cobalt silicide, business, Communication channel, Threshold voltage, Leakage (electronics)
الوصول الحر: https://explore.openaire.eu/search/publication?articleId=doi_________::f07be791d17efd14d1cb0123975e21a3Test
https://doi.org/10.1109/inec.2013.6466013Test -
6
المؤلفون: Chuan-Hsi Liu, Mu-Chun Wang, Chao-Wang Li, Hsin-Chia Yang, Chong-Kuan Du, Wen-Shiang Liao, Chun-Wei Lian, Jie-Min Yang
المصدر: 2013 IEEE 5th International Nanoelectronics Conference (INEC).
مصطلحات موضوعية: Lattice constant, Strain engineering, Materials science, Silicon, chemistry, Strain (chemistry), business.industry, MOSFET, Optoelectronics, chemistry.chemical_element, business, Global strain, Voltage
الوصول الحر: https://explore.openaire.eu/search/publication?articleId=doi_________::9fe18511ad3d586e6466c6415788eb94Test
https://doi.org/10.1109/inec.2013.6466014Test -
7
المؤلفون: Liang-Ru Ji, Mu-Chun Wang, Shea-Jue Wang, Heng-Sheng Huang, Wen-Shiang Liao, Min-Ru Peng, Shuang-Yuan Chen, Hong-Wen Hsu
المصدر: 2013 IEEE 5th International Nanoelectronics Conference (INEC).
مصطلحات موضوعية: Biaxial strain, Electron mobility, Materials science, Silicon, business.industry, fungi, technology, industry, and agriculture, chemistry.chemical_element, Germanium, Compressive strength, chemistry, Etching (microfabrication), MOSFET, Optoelectronics, business, Communication channel
الوصول الحر: https://explore.openaire.eu/search/publication?articleId=doi_________::4061a700dc1a6f1f0b672871d10a0bbcTest
https://doi.org/10.1109/inec.2013.6466020Test -
8
المؤلفون: Wen‐Shiang Liao, Si-Chen Lee
المصدر: Journal of Applied Physics. 80:1171-1176
مصطلحات موضوعية: Amorphous silicon, Materials science, Silicon, Hydrogen, Oxide, Analytical chemistry, General Physics and Astronomy, chemistry.chemical_element, Chemical vapor deposition, chemistry.chemical_compound, chemistry, Chemical bond, Molecule, Silicon oxide
الوصول الحر: https://explore.openaire.eu/search/publication?articleId=doi_________::c0321f37019be77a9d320140ec3b0574Test
https://doi.org/10.1063/1.362915Test -
9
المؤلفون: Jhe-Chuan Yeh, Huei-Jyun Peng, Mu-Chun Wang, Hsin-Chia Yang, Wen-Shiang Liao
المصدر: The 4th IEEE International NanoElectronics Conference.
مصطلحات موضوعية: Materials science, Silicon, business.industry, chemistry.chemical_element, Electrical contacts, Silicon-germanium, PMOS logic, chemistry.chemical_compound, chemistry, Silicon nitride, Etching (microfabrication), MOSFET, Optoelectronics, Wafer, business
الوصول الحر: https://explore.openaire.eu/search/publication?articleId=doi_________::3990f27d712499b90cd55b4a08ef4360Test
https://doi.org/10.1109/inec.2011.5991777Test -
10
المؤلفون: Wen-Shiang Liao, Heng-Sheng Huang, Yi-Jhen Li, Ren-Hau Yang, Hsin-Chia Yang, Mu-Chun Wang
المصدر: The 4th IEEE International NanoElectronics Conference.
مصطلحات موضوعية: Materials science, Silicon, business.industry, Gate dielectric, chemistry.chemical_element, Dielectric, chemistry, Gate oxide, Saturation current, MOSFET, Optoelectronics, business, Layer (electronics), High-κ dielectric
الوصول الحر: https://explore.openaire.eu/search/publication?articleId=doi_________::cd7338a31741fb621ac24311263952f1Test
https://doi.org/10.1109/inec.2011.5991637Test