المؤلفون: Diego Gerardo Roldán, Claudia Redenbach, Katja Schladitz, Christian Kübel, Sabine Schlabach

مصطلحات موضوعية: Failure Analysis of Integrated Circuits, Electrical and Electronic Engineering, FOS Electrical engineering, electronic engineering, information engineering, Engineering, Physical Sciences, Fabric Defect Detection in Industrial Applications, Industrial and Manufacturing Engineering, Electron Beam Lithography Resolution and Applications, Fabric Defect Detection, Surface Defect Detection, K-Edge Imaging, Material Separation, Spectral Imaging, Focused ion beam, Slicing, Scanning electron microscope, Materials science, Image quality, Sample material, Microscopy, Stack abstract data type, Focus optics, Sample preparation, Noise video, Artificial intelligence, Computer science, Computer vision, Optics, Image mathematics, Computer graphics images

العلاقة: https://dx.doi.org/10.60692/7njs0-txb94Test

الإتاحة: https://doi.org/10.60692/dc8r7-wqp8910.60692/7njs0-txb94Test

المؤلفون: Hannah Bardolaza, Neil Irvin Cabello, John Paul Ferrolino, Ivan Cedrick Verona, Miguel Bacaoco, Armando Somintac, Arnel Salvador, Alexander De Los Reyes, Elmer Estacio

مصطلحات موضوعية: Plasmonics and Nanophotonics Research, Biomedical Engineering, FOS Medical engineering, Engineering, Physical Sciences, Terahertz Technology and Applications, Electrical and Electronic Engineering, FOS Electrical engineering, electronic engineering, information engineering, Silicon Photonics Technology, Terahertz, Terahertz Technology, Integrated Circuits, Optical Modulators, On-chip Interconnects, Terahertz radiation, Materials science, Optoelectronics, Plasmon, Electron-beam lithography, Photolithography, Photoconductivity, Optics, Metamaterial, Antenna radio, Lithography, Surface plasmon polariton, Surface plasmon, Resist, Nanotechnology, FOS Nanotechnology

العلاقة: https://dx.doi.org/10.60692/hqd6m-xft06Test

الإتاحة: https://doi.org/10.60692/swnv7-zk34410.60692/hqd6m-xft06Test

المؤلفون: Jin‐Su Choi, Geehong Kim, Won-Sup Lee, Won Seok Chang, Hongki Yoo

مصطلحات موضوعية: Nanoscale Lithographic Patterning Techniques, Biomedical Engineering, FOS Medical engineering, Engineering, Physical Sciences, Electron Beam Lithography Resolution and Applications, Electrical and Electronic Engineering, FOS Electrical engineering, electronic engineering, information engineering, Chemical Mechanical Polishing in Microelectronics Manufacturing, High-Resolution Patterning, Patterning Techniques, Nanolithography Techniques, Patterning Materials, Nanoscale Patterning, Maskless lithography, Digital micromirror device, Photomask, Lithography, Microfabrication, Optics, Materials science, Photolithography, Duty cycle, Microelectromechanical systems, Computer science, Quality philosophy, Image quality, Fabrication, Optoelectronics, Nanotechnology

العلاقة: https://dx.doi.org/10.60692/59rtn-61m24Test

الإتاحة: https://doi.org/10.60692/ey15a-8c73910.60692/59rtn-61m24Test

المؤلفون: Li, Nanxi, Xu, Zhengji, Dong, Yuan, Hu, Ting, Zhong, Qize, Fu, Yuan Hsing, Zhu, Shiyang, Singh, Navab

المصدر: Nanophotonics (21928606); Sep2020, Vol. 9 Issue 10, p3071-3087, 17p

مصطلحات موضوعية: ELECTRON beam lithography, OPTICS, OPTICAL devices, OPTICAL flow, MASS production, ELECTRON beams

المؤلفون: Aminzadeh, Alaleh, Bose, Manjith, Smith, Dan, Uddin, Md Hemayet, Peele, Andrew G., van Riessen, Grant

المصدر: Journal of Vacuum Science & Technology: Part B-Nanotechnology & Microelectronics; Nov2019, Vol. 37 Issue 6, p1-6, 6p

مصطلحات موضوعية: ELECTRON beam lithography, OPTICS, SOFT X rays, X-ray optics, GAS flow, NANOFABRICATION, DIFFRACTIVE scattering, INDUCTIVELY coupled plasma mass spectrometry

المؤلفون: Sergey N. Koreshev, Sergei O. Starovoitov, Denis S. Smorodinov

المصدر: Naučno-tehničeskij Vestnik Informacionnyh Tehnologij, Mehaniki i Optiki, Vol 21, Iss 3, Pp 352-360 (2021)

مصطلحات موضوعية: Materials science, business.industry, display of the hologram structure on solid media, electron-beam lithography, permissible errors of pixel positioning, Mechanical Engineering, QC350-467, QA75.5-76.95, Optics. Light, quality of the reconstructed image, image thresholding, Atomic and Molecular Physics, and Optics, Computer Science Applications, Electronic, Optical and Magnetic Materials, law.invention, Optics, law, Electronic computers. Computer science, computer-generated holograms, Photolithography, photolithography, business, Electron-beam lithography, Information Systems

الوصول الحر: https://explore.openaire.eu/search/publication?articleId=doi_dedup___::91c852e3c6d8eb0efba180d094b7bf62Test
https://doi.org/10.17586/2226-1494-2021-21-3-352-360Test

المؤلفون: Hoshino, Takayuki takayuki_hoshino@ipc.i.u-tokyo.ac.jp, Mabuchi, Kunihiko¹

المصدر: Biochemical & Biophysical Research Communications. Mar2013, Vol. 432 Issue 2, p345-349. 5p.

مصطلحات موضوعية: *ELECTRON beam lithography, *NANOSTRUCTURED materials, *SEMICONDUCTORS, *CLOSED loop systems, *PHYSICS, *OPTICS

المصدر: Fiber Optic Sensors & Systems; Aug2021, Vol. 35 Issue 8, p8-10, 3p

مصطلحات موضوعية: OPTICS, CORPORATE vice-presidents, OPTICAL fiber detectors, ELECTRON beam lithography

مصطلحات جغرافية: JENA (Germany)

المؤلفون: Kirchner, Robert, Guzenko, Vitaliy A., Schift, Helmut

المصدر: Advanced Optical Technologies; Jun2019, Vol. 8 Issue 3/4, p175-180, 6p

مصطلحات موضوعية: ELECTRON beam lithography, ELECTRON beams, METHYL methacrylate, MOLECULAR weights, THIN films

المؤلفون: Chen, Yifang¹ y.chen@rl.ac.uk, Peng, Kaiwu^1,2, Cui, Zheng¹

المصدر: Microelectronic Engineering. Jun2004, Vol. 73/74, p662-665. 4p.

مصطلحات موضوعية: *ELECTRON beam lithography, *MONTE Carlo method, *OPTICS, *COMPUTER simulation