المؤلفون: Lin, Burn J.¹ burnlin@tsmc.com

المصدر: Microelectronic Engineering. Apr2009, Vol. 86 Issue 4-6, p442-447. 6p.

مصطلحات موضوعية: *ELECTRON beam lithography, *IMMERSION lithography, *MICROLITHOGRAPHY, *ENERGY consumption, *ELECTRIC discharges, *MANUFACTURING processes, *INDUSTRIAL contamination, *COMPARATIVE studies

المؤلفون: Kenneth E. Gonsalves, Subrata Ghosh, Manvendra Chauhan, Satinder K. Sharma, Nagarjuna Ravi Kiran

المصدر: ACS Applied Electronic Materials. 2:3805-3817

مصطلحات موضوعية: Materials science, Fabrication, Proximity effect (electron beam lithography), chemistry.chemical_element, Nanotechnology, Ion beam lithography, Electronic, Optical and Magnetic Materials, chemistry, Resist, Materials Chemistry, Electrochemistry, Node (circuits), Helium, Electron-beam lithography, Next-generation lithography

الوصول الحر: https://explore.openaire.eu/search/publication?articleId=doi_________::d39314b39b5dd67c7078bb2668122897Test
https://doi.org/10.1021/acsaelm.0c00627Test

المؤلفون: Jerome Peter, Subrata Ghosh, Satinder K. Sharma, Kenneth E. Gonsalves, Mohamad G. Moinuddin

المصدر: ACS Applied Polymer Materials. 2:1790-1799

مصطلحات موضوعية: Materials science, Polymers and Plastics, Process Chemistry and Technology, Organic Chemistry, Resolution (electron density), Nanotechnology, Integrated circuit, law.invention, Resist, law, Hardware_INTEGRATEDCIRCUITS, Node (circuits), Sensitivity (control systems), Electron-beam lithography, Next-generation lithography

الوصول الحر: https://explore.openaire.eu/search/publication?articleId=doi_________::dd5020a41dd20264f36cd42843d7b017Test
https://doi.org/10.1021/acsapm.0c00005Test

المؤلفون: Chih-Hsiang Hsu, Shao-Yun Fang

المصدر: VLSI-DAT

مصطلحات موضوعية: Router, Computer science, 02 engineering and technology, 021001 nanoscience & nanotechnology, 01 natural sciences, Design for manufacturability, 010309 optics, Image stitching, 0103 physical sciences, Hardware_INTEGRATEDCIRCUITS, Electronic engineering, Routing (electronic design automation), 0210 nano-technology, Lithography, Next-generation lithography, Maskless lithography, Electron-beam lithography

الوصول الحر: https://explore.openaire.eu/search/publication?articleId=doi_________::deb8ad773988280c838203f7705caed3Test
https://doi.org/10.1109/vlsi-dat49148.2020.9196298Test

المؤلفون: Anjam Khursheed, Sarfraz Qureshi, Jeroen A. van Kan, P. Santhana Raman, Rudy Pang, Nannan Liu, Xinxin Xu

المصدر: Nuclear Instruments and Methods in Physics Research Section B: Beam Interactions with Materials and Atoms. 404:243-249

مصطلحات موضوعية: 010302 applied physics, Nuclear and High Energy Physics, Materials science, business.industry, 02 engineering and technology, 021001 nanoscience & nanotechnology, 01 natural sciences, Proton beam writing, law.invention, Lens (optics), Optics, law, 0103 physical sciences, Optoelectronics, Laser beam quality, 0210 nano-technology, business, Instrumentation, Lithography, Electron-beam lithography, Next-generation lithography, Beam (structure), Maskless lithography

الوصول الحر: https://explore.openaire.eu/search/publication?articleId=doi_________::6aa141961d9b22381e35311c77a409f1Test
https://doi.org/10.1016/j.nimb.2016.12.031Test

المؤلفون: Yana Krivoshapkina, Steve Lenk, Marcus Kaestner, Ivo W. Rangelow, Claudia Lenk

المصدر: Microelectronic Engineering. 177:78-86

مصطلحات موضوعية: 010302 applied physics, Materials science, Nanotechnology, Context (language use), 02 engineering and technology, 021001 nanoscience & nanotechnology, Condensed Matter Physics, 01 natural sciences, Atomic and Molecular Physics, and Optics, Surfaces, Coatings and Films, Electronic, Optical and Magnetic Materials, law.invention, Nanolithography, Resist, law, 0103 physical sciences, X-ray lithography, Electrical and Electronic Engineering, Photolithography, 0210 nano-technology, Scanning probe lithography, Next-generation lithography, Electron-beam lithography

الوصول الحر: https://explore.openaire.eu/search/publication?articleId=doi_________::b24d4b3e9b0a343f5c1e8da2b7a15013Test
https://doi.org/10.1016/j.mee.2017.02.021Test

المؤلفون: Tomasz Wojtowicz, Jerzy Wróbel, Maciej Wiater, E. Bobko, D. Płoch

المصدر: Opto-Electronics Review. 25:65-68

مصطلحات موضوعية: Radiation, Materials science, Fabrication, business.industry, Quantum point contact, Nanotechnology, 02 engineering and technology, Substrate (electronics), 021001 nanoscience & nanotechnology, 01 natural sciences, Etching (microfabrication), 0103 physical sciences, Optoelectronics, General Materials Science, X-ray lithography, Electrical and Electronic Engineering, 010306 general physics, 0210 nano-technology, business, Lithography, Next-generation lithography, Electron-beam lithography

الوصول الحر: https://explore.openaire.eu/search/publication?articleId=doi_________::8d9acc2034f361ecb418551fb2749ab3Test
https://doi.org/10.1016/j.opelre.2017.04.005Test

المؤلفون: Chang-Yong Nam, Vitor R. Manfrinato, Kevin G. Yager, Aaron Stein, Eric A. Stach, Charles T. Black, Lihua Zhang

المصدر: Nano Letters. 17:4562-4567

مصطلحات موضوعية: Length scale, Materials science, business.industry, Mechanical Engineering, Bioengineering, 02 engineering and technology, General Chemistry, 010402 general chemistry, 021001 nanoscience & nanotechnology, Condensed Matter Physics, 01 natural sciences, 0104 chemical sciences, Optics, Nanolithography, Resist, Scanning transmission electron microscopy, Multiple patterning, General Materials Science, 0210 nano-technology, business, Lithography, Next-generation lithography, Electron-beam lithography

الوصول الحر: https://explore.openaire.eu/search/publication?articleId=doi_dedup___::d0a7029c76b318c8bab2320e52a9af66Test
https://doi.org/10.1021/acs.nanolett.7b00514Test

المؤلفون: Kenneth E. Gonsalves, Subrata Ghosh, Midathala Yogesh, Chullikkattil P. Pradeep, Pulikanti Guruprasad Reddy, Satinder K. Sharma, Santu Nandi

المصدر: Materials Chemistry Frontiers. 1:1895-1899

مصطلحات موضوعية: Materials science, business.industry, Nanotechnology, 02 engineering and technology, Photoresist, 010402 general chemistry, 021001 nanoscience & nanotechnology, 01 natural sciences, 0104 chemical sciences, law.invention, Semiconductor, Resist, law, Materials Chemistry, Optoelectronics, General Materials Science, X-ray lithography, Photolithography, 0210 nano-technology, business, Lithography, Next-generation lithography, Electron-beam lithography

الوصول الحر: https://explore.openaire.eu/search/publication?articleId=doi_________::0d9785b41a9b412fb522332f5312f9bfTest
https://doi.org/10.1039/c7qm00140aTest

المؤلفون: Yonghui Zhang, Wengang Bi, Zi-Hui Zhang, Tongbo Wei, Chong Geng, Shu Xu

المصدر: Chinese Optics Letters. 15:062201-62205

مصطلحات موضوعية: 010302 applied physics, Materials science, business.industry, Nanotechnology, 02 engineering and technology, 021001 nanoscience & nanotechnology, 01 natural sciences, Atomic and Molecular Physics, and Optics, Electronic, Optical and Magnetic Materials, law.invention, Lens (optics), Optics, law, 0103 physical sciences, Monolayer, Nanosphere lithography, Dry etching, Electrical and Electronic Engineering, 0210 nano-technology, business, Lithography, Nanoring, Next-generation lithography, Electron-beam lithography

الوصول الحر: https://explore.openaire.eu/search/publication?articleId=doi_________::cef892addc36ba37e610364096eea7cbTest
https://doi.org/10.3788/col201715.062201Test