دورية أكاديمية
Atomic layer deposited HfO2 ultra-thin films on different crystallographic orientation Ge for CMOS applications
| العنوان: | Atomic layer deposited HfO2 ultra-thin films on different crystallographic orientation Ge for CMOS applications |
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| المؤلفون: | Agrawal, Khushabu S., Patil, Vilas S., Mahajan, Ashok M. |
| المساهمون: | University Grants Commission, Council for Scientific and Industrial Research |
| المصدر: | Thin Solid Films ; volume 654, page 30-37 ; ISSN 0040-6090 |
| بيانات النشر: | Elsevier BV |
| سنة النشر: | 2018 |
| المجموعة: | ScienceDirect (Elsevier - Open Access Articles via Crossref) |
| مصطلحات موضوعية: | Materials Chemistry, Metals and Alloys, Surfaces, Coatings and Films, Surfaces and Interfaces, Electronic, Optical and Magnetic Materials |
| نوع الوثيقة: | article in journal/newspaper |
| اللغة: | English |
| DOI: | 10.1016/j.tsf.2018.03.083 |
| الإتاحة: | https://doi.org/10.1016/j.tsf.2018.03.083Test https://api.elsevier.com/content/article/PII:S0040609018302335?httpAccept=text/xmlTest https://api.elsevier.com/content/article/PII:S0040609018302335?httpAccept=text/plainTest |
| حقوق: | https://www.elsevier.com/tdm/userlicense/1.0Test/ |
| رقم الانضمام: | edsbas.5133C337 |
| قاعدة البيانات: | BASE |
| DOI: | 10.1016/j.tsf.2018.03.083 |
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