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1
المؤلفون: Philippe Hurat, Denis L. Goinard, Michel L. Cote, Michael L. Rieger, Alexander Miloslavsky
المصدر: Design and Process Integration for Microelectronic Manufacturing III.
مصطلحات موضوعية: Engineering, Resolution enhancement technologies, business.industry, Yield (finance), Design flow, Design for manufacturability, Reliability engineering, Cost reduction, Design intent, Hardware_INTEGRATEDCIRCUITS, Node (circuits), business, Lithography, Simulation
الوصول الحر: https://explore.openaire.eu/search/publication?articleId=doi_________::c1b54a4ece789440da9064f51ab340e0Test
https://doi.org/10.1117/12.600086Test -
2
المصدر: SPIE Proceedings.
مصطلحات موضوعية: Engineering, Fabrication, business.industry, Bandwidth (signal processing), Hardware_INTEGRATEDCIRCUITS, Electronic engineering, Wafer, Hardware_PERFORMANCEANDRELIABILITY, Lithography process, business, Lithography
الوصول الحر: https://explore.openaire.eu/search/publication?articleId=doi_________::189a34fc234b3d06613afa11158e6650Test
https://doi.org/10.1117/12.568550Test -
3
المؤلفون: Michael L. Rieger, Lawrence S. Melvin
المصدر: SPIE Proceedings.
مصطلحات موضوعية: Engineering, business.industry, Computation, Process (computing), Process variation, Feature (computer vision), Line (geometry), Hardware_INTEGRATEDCIRCUITS, Reticle, Segmentation, Process simulation, business, Algorithm, Simulation
الوصول الحر: https://explore.openaire.eu/search/publication?articleId=doi_________::49625c01cf88f1e2c0bdc1a066174e97Test
https://doi.org/10.1117/12.518331Test -
4
المصدر: SPIE Proceedings.
مصطلحات موضوعية: Masking (art), Interconnection, Engineering, business.industry, Circuit design, Integrated circuit, Integrated circuit layout, law.invention, Mask set, law, Hardware_INTEGRATEDCIRCUITS, Electronic engineering, Node (circuits), Physical design, business, Computer hardware
الوصول الحر: https://explore.openaire.eu/search/publication?articleId=doi_________::d1448ed1aa893204126581daa78c4aa5Test
https://doi.org/10.1117/12.504270Test -
5
المؤلفون: Zongwu Tang, Michael L. Rieger, Jeffrey P. Mayhew, Daniel F. Beale
المصدر: SPIE Proceedings.
مصطلحات موضوعية: Engineering drawing, Engineering, Resolution enhancement technologies, Physical verification, business.industry, media_common.quotation_subject, Facsimile, Process (computing), Optical proximity correction, Hardware_INTEGRATEDCIRCUITS, Quality (business), Layer (object-oriented design), Physical design, business, Computer hardware, media_common
الوصول الحر: https://explore.openaire.eu/search/publication?articleId=doi_________::dd54bc5a4694e5a116e2de305976a3ceTest
https://doi.org/10.1117/12.471299Test -
6
المصدر: SPIE Proceedings.
مصطلحات موضوعية: Interconnection, Engineering, business.industry, Circuit design, Transistor, Integrated circuit, Integrated circuit layout, law.invention, Optical proximity correction, law, Hardware_INTEGRATEDCIRCUITS, Electronic engineering, Node (circuits), Photomask, business
الوصول الحر: https://explore.openaire.eu/search/publication?articleId=doi_________::070179d03affb55696f0661d657e482eTest
https://doi.org/10.1117/12.476939Test -
7
المؤلفون: Robert Lugg, Daniel F. Beale, Michael L. Rieger, Jason Huang
المصدر: SPIE Proceedings.
مصطلحات موضوعية: Engineering, business.industry, Stochastic process, Rounding, Process variation, Reduction (complexity), Optical proximity correction, Line (geometry), Hardware_INTEGRATEDCIRCUITS, Process window, Process optimization, business, Algorithm, Simulation
الوصول الحر: https://explore.openaire.eu/search/publication?articleId=doi_________::f5f8cda2bd9d9f1205298030ba0cac18Test
https://doi.org/10.1117/12.474488Test -
8
المؤلفون: James P. Shiely, Michael L. Rieger, Jeffrey P. Mayhew, Lin Zhang, Jiangwei Li, Zongwu Tang
المصدر: SPIE Proceedings.
مصطلحات موضوعية: Flexibility (engineering), Engineering drawing, Engineering, Resolution enhancement technologies, business.industry, Data flow diagram, Optical proximity correction, Model-based design, Hardware_INTEGRATEDCIRCUITS, Reticle, Phase-shift mask, Physical design, business, Computer hardware
الوصول الحر: https://explore.openaire.eu/search/publication?articleId=doi_________::7c94f10a3549ae76db398825bb8827d2Test
https://doi.org/10.1117/12.475670Test -
9
المؤلفون: James P. Shiely, Michael L. Rieger, Jiangwei Li, Jeffrey P. Mayhew
المصدر: 21st Annual BACUS Symposium on Photomask Technology.
مصطلحات موضوعية: Engineering, Application-specific integrated circuit, Optical proximity correction, business.industry, Real-time computing, Hardware_INTEGRATEDCIRCUITS, Process (computing), Chip, business, Lithography, Reliability engineering
الوصول الحر: https://explore.openaire.eu/search/publication?articleId=doi_________::85b310b1db31801f2df97a615870010cTest
https://doi.org/10.1117/12.458287Test -
10
المؤلفون: Michael L. Rieger, John P. Stirniman, John N. Randall, James Burdorf, Mark E. Mason, T.J. Aton, Keeho Kim, Alexander Tritchkov, Shane R. Palmer
المصدر: SPIE Proceedings.
مصطلحات موضوعية: Engineering, CMOS, Optical proximity correction, business.industry, Hardware_INTEGRATEDCIRCUITS, Electronic engineering, Phase-shift mask, Binary number, Biasing, Overlay, business, Lithography, AND gate
الوصول الحر: https://explore.openaire.eu/search/publication?articleId=doi_________::2fefa27126a2d54a51064ae7a3705d8dTest
https://doi.org/10.1117/12.410679Test