المؤلفون: Xu, Zong-Rui¹, Ye, Yi-Feng¹, Xia, Bin¹, Wu, Lin-Sheng¹ wallish@sjtu.edu.cn, Mao, Jun-Fa¹, Jia, Yue-Yang¹

المصدر: IEEE Transactions on Microwave Theory & Techniques. Jan2022, Vol. 70 Issue 1, p24-34. 11p.

مصطلحات موضوعية: *RANDOM access memory, ELECTRON beam lithography, PHASE shifters, RADIO frequency, PHASE transitions, PHASE shift (Nuclear physics), ELECTRON beams, INSERTION loss (Telecommunication)

المؤلفون: Vinje, Jakob¹ (AUTHOR) jakob.vinje@ntnu.no, Beckwith, Kai S.² (AUTHOR), Sikorski, Pawel¹ (AUTHOR)

المصدر: Journal of Microelectromechanical Systems. Apr2020, Vol. 29 Issue 2, p160-169. 10p.

مصطلحات موضوعية: *ELECTRON beam lithography, *POLYMER structure, *CELL anatomy, *OPTICAL apertures, *NUMERICAL apertures

المؤلفون: Caroline Campbell, Abigail Casey, Gregory Triplett

المصدر: Heliyon, Vol 8, Iss 5, Pp e09475- (2022)

مصطلحات موضوعية: Bowtie nanoantennas, Surface Enhanced Raman Spectroscopy (SERS), Fabrication, Electron beam lithography, Nanopatterning, Exposure, Science (General), Q1-390, Social sciences (General), H1-99

وصف الملف: electronic resource

العلاقة: http://www.sciencedirect.com/science/article/pii/S2405844022007630Test; https://doaj.org/toc/2405-8440Test

الوصول الحر: https://doaj.org/article/55c23bff1b884010b6cc2491140944c8Test

المؤلفون: Jin‐Su Choi, Geehong Kim, Won-Sup Lee, Won Seok Chang, Hongki Yoo

مصطلحات موضوعية: Nanoscale Lithographic Patterning Techniques, Biomedical Engineering, FOS Medical engineering, Engineering, Physical Sciences, Electron Beam Lithography Resolution and Applications, Electrical and Electronic Engineering, FOS Electrical engineering, electronic engineering, information engineering, Chemical Mechanical Polishing in Microelectronics Manufacturing, High-Resolution Patterning, Patterning Techniques, Nanolithography Techniques, Patterning Materials, Nanoscale Patterning, Maskless lithography, Digital micromirror device, Photomask, Lithography, Microfabrication, Optics, Materials science, Photolithography, Duty cycle, Microelectromechanical systems, Computer science, Quality philosophy, Image quality, Fabrication, Optoelectronics, Nanotechnology

العلاقة: https://dx.doi.org/10.60692/59rtn-61m24Test

الإتاحة: https://doi.org/10.60692/ey15a-8c73910.60692/59rtn-61m24Test

المؤلفون: Fang, Shao-Yun¹, Chen, Wei-Yu¹, Chang, Yao-Wen²

المصدر: IEEE Transactions on Computer-Aided Design of Integrated Circuits & Systems. Feb2013, Vol. 32 Issue 2, p189-201. 13p.

مصطلحات موضوعية: *PRODUCTION scheduling, ELECTRON beam lithography, PHOTOMASKS, MICROFABRICATION, GRAPH theory, HEATING

المؤلفون: Moneck, Matthew T.¹, Okada, Takeru², Fujimori, Jiro³, Kasuya, Takayuki³, Katsumura, Masahiro³, Iida, Tetsuya³, Kuriyama, Kazumi³, Lin, Wen-Chin⁴, Sokalski, Vincent⁵, Powell, Stephen⁴, Bain, James A.⁴, Zhu, Jian-Gang⁴

المصدر: IEEE Transactions on Magnetics. Oct2011, Vol. 47 Issue 10, p2656-2659. 4p.

مصطلحات موضوعية: *HARD disks, *TECHNOLOGY, MAGNETIC recording heads, ELECTRON beam lithography, MICROFABRICATION, IONS, ELECTRON beams

المؤلفون: Laurvick, Tod V.¹, Coutu Jr., Ronald A.¹, Sattler, James M.¹, Lake, Robert A.¹ ronald.coutu@afit.edu

المصدر: Journal of Micro/Nanolithography, MEMS & MOEMS. Jul2016, Vol. 15 Issue 3, p031602-1-031602-11. 11p.

مصطلحات موضوعية: *ELECTRON beam lithography, *SEMICONDUCTOR wafers, *MICROELECTROMECHANICAL systems, *FABRICATION (Manufacturing), *THREE-dimensional printing

المؤلفون: Dietrich K., Zilk M., Steglich M., Siefke T., Hübner U., Pertsch T., Rockstuhl C., Tünnermann A., Kley E.-B.

مصطلحات موضوعية: ddc:620, ddc:540, ddc:530, Electron beam lithography, Electron beams, Nanostructured materials, Self assembly, Bottom up approach, Bulk materials, Character projections, cute-wire-pair, Isotropic materials, Magnetic response, Optical response, Shaped surfaces, Fabrication

وصف الملف: application/pdf

العلاقة: ESSN:1616-3028; https://oa.tib.eu/renate/handle/123456789/6734Test; https://doi.org/10.34657/5781Test

الإتاحة: https://doi.org/10.34657/578110.1002/adfm.201905722Test
https://oa.tib.eu/renate/handle/123456789/6734Test

المؤلفون: Lin, Dakui, Liu, Zhengkun, Dietrich, Kay, Sokolov, Andréy, Sertsu, Mewael Giday, Zhou, Hongjun, Huo, Tonglin, Kroker, Stefanie, Chen, Huoyao, Qiu, Keqiang, Xu, Xiangdong, Schäfers, Franz, Liu, Ying, Kley, Ernst-Bernhard, Hong, Yilin

المصدر: Journal of Synchrotron Radiation; Sep2019, Vol. 26 Issue 5, p1782-1789, 8p

مصطلحات موضوعية: SOFT X rays, ELECTRON holography, ELECTRON beam lithography, ELECTRON beams, FIREPLACES, PHOTOMASKS

المؤلفون: Hirose, N.¹, Ohta, H., Matsui, T., Fukuda, M.

المصدر: IEEE Transactions on Applied Superconductivity. 1997, Vol. 7 Issue 2, p2635-2637. 3p.

مصطلحات موضوعية: *GOLD, SUPERCONDUCTOR-normal-superconductor devices, ELECTRON beam lithography, JOSEPHSON junctions, JOSEPHSON effect, NIOBIUM