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المؤلفون: Brent P. Gila, C. R. Abernathy, Lars F. Voss, M. Hlad, Stephen J. Pearton, Fan Ren
المصدر: Applied Surface Science. 252:8010-8014
مصطلحات موضوعية: Materials science, Passivation, Gate dielectric, Analytical chemistry, General Physics and Astronomy, Surfaces and Interfaces, General Chemistry, Condensed Matter Physics, Surfaces, Coatings and Films, Sputtering, Etching (microfabrication), Dry etching, Inductively coupled plasma, Thin film, Molecular beam epitaxy
الوصول الحر: https://explore.openaire.eu/search/publication?articleId=doi_________::bbd34ffb868e0188f57562886a89238cTest
https://doi.org/10.1016/j.apsusc.2005.10.018Test -
2
المؤلفون: Fan Ren, Steve Pearton, M. Hlad, Lars F. Voss, Brent P. Gila, C. R. Abernathy
المصدر: Journal of Electronic Materials. 35:680-684
مصطلحات موضوعية: Reflection high-energy electron diffraction, Plasma etching, Passivation, Chemistry, Analytical chemistry, Dielectric, Condensed Matter Physics, Electronic, Optical and Magnetic Materials, Gate oxide, Materials Chemistry, Dry etching, Electrical and Electronic Engineering, Inductively coupled plasma, Molecular beam epitaxy
الوصول الحر: https://explore.openaire.eu/search/publication?articleId=doi_________::b663e93c238e16966705537213fc2434Test
https://doi.org/10.1007/s11664-006-0120-2Test -
3
المؤلفون: J.W Lee, C. R. Abernathy, I.K. Baek, S.R. Yoo, W.T. Lim, M.H. Jeon, G. S. Cho, S. J. Pearton
المصدر: Solid-State Electronics. 48:189-192
مصطلحات موضوعية: Chemistry, Bipolar junction transistor, Analytical chemistry, Heterojunction, Plasma, Condensed Matter Physics, Electronic, Optical and Magnetic Materials, Etching (microfabrication), Materials Chemistry, Dry etching, Electrical and Electronic Engineering, Inductively coupled plasma, Inert gas, Common emitter
الوصول الحر: https://explore.openaire.eu/search/publication?articleId=doi_________::166f2bb6c6c7da71dc8a5e901bd258e1Test
https://doi.org/10.1016/s0038-1101Test(03)00288-0 -
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المؤلفون: C. R. Abernathy, K. P. Lee, Eric Lambers, Fan Ren, Brent P. Gila, J.H. Shin, Steve Pearton, K.H. Baik, P.Y. Park, S. Norasetthekul
المصدر: Applied Surface Science. 185:52-59
مصطلحات موضوعية: Plasma etching, Chemistry, Scanning electron microscope, fungi, technology, industry, and agriculture, Analytical chemistry, General Physics and Astronomy, chemistry.chemical_element, macromolecular substances, Surfaces and Interfaces, General Chemistry, Activation energy, Condensed Matter Physics, Surfaces, Coatings and Films, stomatognathic system, Sputtering, Etching (microfabrication), Chlorine, Dry etching, Reactive-ion etching
الوصول الحر: https://explore.openaire.eu/search/publication?articleId=doi_________::d679a4556144a0c1cc1e22a6a3dffa8aTest
https://doi.org/10.1016/s0169-4332Test(01)00593-1 -
5
المؤلفون: Brent P. Gila, Fan Ren, C. R. Abernathy, K.H. Baik, Stephen J. Pearton, S. Norasetthekul, J.H. Shin, P.Y. Park, B. Luo, Eric Lambers
المصدر: Applied Surface Science. 183:26-32
مصطلحات موضوعية: Auger electron spectroscopy, Plasma etching, fungi, Gate dielectric, technology, industry, and agriculture, Analytical chemistry, General Physics and Astronomy, chemistry.chemical_element, macromolecular substances, Surfaces and Interfaces, General Chemistry, Condensed Matter Physics, Surfaces, Coatings and Films, stomatognathic system, chemistry, Etching (microfabrication), Fluorine, Dry etching, Inductively coupled plasma, Thin film
الوصول الحر: https://explore.openaire.eu/search/publication?articleId=doi_________::f474dee7f54b1edfd2e7eefb78581f3cTest
https://doi.org/10.1016/s0169-4332Test(01)00542-6 -
6
المؤلفون: Steve Pearton, K. P. Lee, C. R. Abernathy, K. D. Mackenzie, Fan Ren, Y Nakagawa, B. Luo, A. P. Zhang, M. E. Overberg, D.G Kent
المصدر: Solid-State Electronics. 45:1837-1842
مصطلحات موضوعية: Materials science, Plasma exposure, Annealing (metallurgy), Materials Chemistry, Electronic engineering, Analytical chemistry, Schottky diode, Plasma, Dry etching, Electrical and Electronic Engineering, Conductivity, Condensed Matter Physics, Electronic, Optical and Magnetic Materials
الوصول الحر: https://explore.openaire.eu/search/publication?articleId=doi_________::263f34cc106bf7bdfedbe11787212f1fTest
https://doi.org/10.1016/s0038-1101Test(01)00248-9 -
7
المؤلفون: K. P. Lee, B. Luo, K. D. Mackenzie, Steve Pearton, M. E. Overberg, Y Nakagawa, Fang-Fang Ren, A. P. Zhang, C. R. Abernathy, D.G Kent
المصدر: Solid-State Electronics. 45:467-470
مصطلحات موضوعية: Materials science, Reactive nitrogen, Annealing (metallurgy), Materials Chemistry, Analytical chemistry, Schottky diode, Plasma treatment, Dry etching, Plasma, Electrical and Electronic Engineering, Condensed Matter Physics, Electronic, Optical and Magnetic Materials
الوصول الحر: https://explore.openaire.eu/search/publication?articleId=doi_________::ddefdacb72f20c4724d39225febf3178Test
https://doi.org/10.1016/s0038-1101Test(01)00016-8 -
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المؤلفون: Jung Han, G. T. Dang, John Lopata, J. W. Lee, A. P. Zhang, C. R. Abernathy, William Scott Hobson, Fan Ren, S. N. G. Chu, Stephen J. Pearton, K. P. Lee
المصدر: Solid-State Electronics. 45:243-247
مصطلحات موضوعية: Materials science, Equivalent series resistance, Heterostructure-emitter bipolar transistor, business.industry, Heterojunction bipolar transistor, Bipolar junction transistor, Heterojunction, Condensed Matter Physics, Electronic, Optical and Magnetic Materials, Materials Chemistry, Optoelectronics, Dry etching, Electrical and Electronic Engineering, business, Contact area, Common emitter
الوصول الحر: https://explore.openaire.eu/search/publication?articleId=doi_________::90a482feb5c9a07431692bc86de470f8Test
https://doi.org/10.1016/s0038-1101Test(01)00015-6 -
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المؤلفون: Fan Ren, Brent P. Gila, S. J. Pearton, C. R. Abernathy, K.P. Lee, David C. Hays
المصدر: Journal of Electronic Materials. 29:285-290
مصطلحات موضوعية: Plasma etching, Gate dielectric, Oxide, Analytical chemistry, Heterojunction, Dielectric, Nitride, Condensed Matter Physics, Electronic, Optical and Magnetic Materials, Ion, chemistry.chemical_compound, chemistry, Materials Chemistry, Dry etching, Electrical and Electronic Engineering
الوصول الحر: https://explore.openaire.eu/search/publication?articleId=doi_________::eee6213432688fcb2307a0683ae151d2Test
https://doi.org/10.1007/s11664-000-0064-xTest -
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المؤلفون: H. Cho, Fan Ren, M. W. Devre, D. Johnson, Stephen J. Pearton, B. H. Reelfs, L. C. Meyer, J.W Lee, J. N. Sasserath, E. Toussaint, David C. Hays, C. R. Abernathy
المصدر: Applied Surface Science. 156:76-84
مصطلحات موضوعية: Chemistry, High selectivity, Inorganic chemistry, Analytical chemistry, General Physics and Astronomy, Surfaces and Interfaces, General Chemistry, Condensed Matter Physics, Electron spectroscopy, Surfaces, Coatings and Films, Ion, Etching (microfabrication), Desorption, Dry etching, Inductively coupled plasma, Selectivity
الوصول الحر: https://explore.openaire.eu/search/publication?articleId=doi_________::a25bdb5ab763948dbe188b89476e29f0Test
https://doi.org/10.1016/s0169-4332Test(99)00363-3