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المؤلفون: Lee Choonghyun, John Bruley, Takashi Ando, Pouya Hashemi, Eduard A. Cartier, Vijay Narayanan
المصدر: ECS Transactions. 86:51-58
مصطلحات موضوعية: Materials science, chemistry, Stack (abstract data type), business.industry, chemistry.chemical_element, Optoelectronics, Germanium, Strained silicon, business, High-κ dielectric
الوصول الحر: https://explore.openaire.eu/search/publication?articleId=doi_________::759b0d283ff62035fd584f616cf0e849Test
https://doi.org/10.1149/08607.0051ecstTest -
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المؤلفون: Eduard A. Cartier, Renee Mo, Takashi Ando, Kevin K. Chan, John Rozen, Pouya Hashemi, Yohei Ogawa, John Bruley, Siyuranga O. Koswatta, Vijay Narayanan
المصدر: IEEE Electron Device Letters. 38:303-305
مصطلحات موضوعية: 010302 applied physics, In situ, Electron mobility, Materials science, Silicon, business.industry, Gate dielectric, Analytical chemistry, Electrical engineering, chemistry.chemical_element, Equivalent oxide thickness, 02 engineering and technology, 021001 nanoscience & nanotechnology, 01 natural sciences, Electronic, Optical and Magnetic Materials, Silicon-germanium, chemistry.chemical_compound, chemistry, 0103 physical sciences, Leakage current density, Electrical and Electronic Engineering, 0210 nano-technology, business, Scaling
الوصول الحر: https://explore.openaire.eu/search/publication?articleId=doi_________::18392a0e3b6f9a0b9135da21fd931dd9Test
https://doi.org/10.1109/led.2017.2654485Test -
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المؤلفون: John Rozen, Martin M. Frank, Eduard A. Cartier, Takashi Ando, Vijay Narayanan
المصدر: IRPS
مصطلحات موضوعية: 010302 applied physics, Materials science, business.industry, Gate stack, Electron trapping, chemistry.chemical_element, Hardware_PERFORMANCEANDRELIABILITY, 02 engineering and technology, 021001 nanoscience & nanotechnology, 01 natural sciences, Hafnium oxide, law.invention, Stress (mechanics), Capacitor, chemistry, law, 0103 physical sciences, Hardware_INTEGRATEDCIRCUITS, Optoelectronics, 0210 nano-technology, business, Tin, Aluminum oxide
الوصول الحر: https://explore.openaire.eu/search/publication?articleId=doi_________::92a1e18a83210b3586abc8514eb3b2f1Test
https://doi.org/10.1109/irps.2018.8353604Test -
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المؤلفون: Rajan K. Pandey, Shahab Siddiqui, Dominic J. Schepis, Takashi Ando
مصطلحات موضوعية: 010302 applied physics, Materials science, business.industry, Gate dielectric, chemistry.chemical_element, Equivalent oxide thickness, 02 engineering and technology, Dielectric, 021001 nanoscience & nanotechnology, 01 natural sciences, Hafnium, Atomic layer deposition, chemistry, Gate oxide, 0103 physical sciences, MOSFET, Optoelectronics, Field-effect transistor, 0210 nano-technology, business
الوصول الحر: https://explore.openaire.eu/search/publication?articleId=doi_________::17877364d4be9fac062d4da4145579e6Test
https://doi.org/10.1016/b978-0-12-812311-9.00005-0Test -
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المؤلفون: Shogo Mochizuki, Hemanth Jagannathan, Richard G. Southwick, Rajan K. Pandey, Lee Choonghyun, Ruqiang Bao, Balasubramanian S. Haran, Takashi Ando, Aniruddha Konar, Vijay Narayanan, Paul C. Jamison
المصدر: ASICON
مصطلحات موضوعية: Electron mobility, Materials science, Silicon, Carrier scattering, Scattering, business.industry, Phonon, X band, chemistry.chemical_element, Silicon-germanium, Threshold voltage, chemistry.chemical_compound, chemistry, Optoelectronics, business
الوصول الحر: https://explore.openaire.eu/search/publication?articleId=doi_________::cb1cc81e412c323adadd8503a6417dbaTest
https://doi.org/10.1109/asicon.2017.8252540Test -
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المؤلفون: Effendi Leobandung, Lee Choonghyun, John Bruley, Siyuranga O. Koswatta, Sebastian Engelmann, John A. Ott, K.K. Chan, Vijay Narayanan, Michael F. Lofaro, Eduard A. Cartier, Takashi Ando, R. Mo, Pouya Hashemi, Simon Dawes, K.-L. Lee
المصدر: 2017 Symposium on VLSI Technology.
مصطلحات موضوعية: 010302 applied physics, Materials science, Silicon, business.industry, Condensation, Electrical engineering, chemistry.chemical_element, 02 engineering and technology, Swing, 021001 nanoscience & nanotechnology, 01 natural sciences, PMOS logic, Silicon-germanium, chemistry.chemical_compound, Reliability (semiconductor), chemistry, Logic gate, 0103 physical sciences, Optoelectronics, 0210 nano-technology, business, Metal gate
الوصول الحر: https://explore.openaire.eu/search/publication?articleId=doi_________::ec0079a35d56bfbee758f1af23022379Test
https://doi.org/10.23919/vlsit.2017.7998214Test -
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المؤلفون: Stephen W. Bedell, Martin M. Frank, Vijay Narayanan, Yu Zhu, Takashi Ando
المصدر: ECS Transactions. 61:213-223
مصطلحات موضوعية: Materials science, Silicon silicon, chemistry, business.industry, Electrical engineering, Gate stack, chemistry.chemical_element, Optoelectronics, Germanium, business, Communication channel
الوصول الحر: https://explore.openaire.eu/search/publication?articleId=doi_dedup___::7f3919f8518852d80fdd159df7f51657Test
https://doi.org/10.1149/06102.0213ecstTest -
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المؤلفون: S. Yamaguchi, Kaori Tai, S. Kadomura, Takashi Ando, Heiji Watanabe, H. Iwamoto, Shinichi Yoshida, T. Hirano
المصدر: IEEE Transactions on Electron Devices. 56:3223-3227
مصطلحات موضوعية: Electron mobility, Materials science, Silicon, business.industry, Electrical engineering, chemistry.chemical_element, Electronic, Optical and Magnetic Materials, Stack (abstract data type), chemistry, Logic gate, MOSFET, Optoelectronics, Work function, Electrical and Electronic Engineering, business, Metal gate, High-κ dielectric
الوصول الحر: https://explore.openaire.eu/search/publication?articleId=doi_________::2785fac758a34d2aa4e880bf9c6ca4edTest
https://doi.org/10.1109/ted.2009.2030432Test -
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المؤلفون: Yukio Tagawa, Hitoshi Wakabayashi, Y. Tateshita, Tomoyuki Hirano, Kazuki Tanaka, Naoki Nagashima, S. Yamaguchi, Kaori Tai, Sayuri Kanda, Hayato Iwamoto, Masaki Saito, Mayumi Yamanaka, Takashi Ando, Masanori Tukamoto, Shingo Kadomura, Masashi Nakata, Itaru Oshiyama, Salam Kazi, Ryo Yamamoto
المصدر: Japanese Journal of Applied Physics. 47:2345-2348
مصطلحات موضوعية: Electron mobility, Materials science, Physics and Astronomy (miscellaneous), business.industry, General Engineering, General Physics and Astronomy, chemistry.chemical_element, Threshold voltage, Atomic layer deposition, chemistry, CMOS, MOSFET, Optoelectronics, Work function, Tin, business, High-κ dielectric
الوصول الحر: https://explore.openaire.eu/search/publication?articleId=doi_________::de478ea60c46909157025f428f77ff50Test
https://doi.org/10.1143/jjap.47.2345Test -
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المؤلفون: Kenichiro Togoe, Takashi Ando, Yoshio Harada, Nobuo Itoh
المصدر: Journal of the Japan Institute of Metals. 71:90-95
مصطلحات موضوعية: Plasma sprayed coating, Materials science, Alloy, Metallurgy, Metals and Alloys, chemistry.chemical_element, engineering.material, Condensed Matter Physics, Container (type theory), chemistry, Mechanics of Materials, Aluminium, Materials Chemistry, engineering
الوصول الحر: https://explore.openaire.eu/search/publication?articleId=doi_________::fd51c3c32a31ccbf615af33172e6bb72Test
https://doi.org/10.2320/jinstmet.71.90Test