Immersion mask inspection with hybrid-microscopic systems at 193 nm

التفاصيل البيبلوغرافية
العنوان: Immersion mask inspection with hybrid-microscopic systems at 193 nm
المؤلفون: Alexander Menck, Uwe Horn, Axel Zibold, Steffen Weissenberg, Robert Brunner, Gerd Buchda, Reinhard Steiner
المصدر: SPIE Proceedings.
بيانات النشر: SPIE, 2004.
سنة النشر: 2004
مصطلحات موضوعية: Diffraction, Microscope, Materials science, business.industry, Mask inspection, law.invention, Optics, Optical microscope, law, Solid immersion lens, Water immersion objective, business, Lithography, Immersion lithography
الوصف: The capability of a high NA, large working distance, microscope objective was demonstrated by investigating different mask features. The microscope objective is based on a hybrid concept combining diffractive and refractive optical elements. Resolution down to 125 nm lines and spaces (L/S) is demonstrated by investigating periodic chrome on glass structures. A significant additional improvement of the resolution is achieved by inducing a solid immersion lens (SIL).
تدمد: 0277-786X
الوصول الحر: https://explore.openaire.eu/search/publication?articleId=doi_________::8f4786e112fadb32af620af82184115fTest
https://doi.org/10.1117/12.569019Test
رقم الانضمام: edsair.doi...........8f4786e112fadb32af620af82184115f
قاعدة البيانات: OpenAIRE