Performance characteristics of p-channel FinFETs with varied Si-fin extension lengths for source and drain contacts

التفاصيل البيبلوغرافية
العنوان: Performance characteristics of p-channel FinFETs with varied Si-fin extension lengths for source and drain contacts
المؤلفون: Deshi Li, Chii-Wen Chen, Wen-Shiang Liao, Haoshuang Gu, Mu-Chun Wang, Xuecheng Zou, Yue-Gie Liaw
المصدر: Semiconductors. 51:1650-1655
بيانات النشر: Pleiades Publishing Ltd, 2017.
سنة النشر: 2017
مصطلحات موضوعية: 010302 applied physics, Materials science, Equivalent series resistance, business.industry, Silicon on insulator, 02 engineering and technology, 021001 nanoscience & nanotechnology, Condensed Matter Physics, 01 natural sciences, Atomic and Molecular Physics, and Optics, Electronic, Optical and Magnetic Materials, P channel, Subthreshold swing, 0103 physical sciences, Electrode, Optoelectronics, Wafer, 0210 nano-technology, business, AND gate, Leakage (electronics)
الوصف: The length of Source/Drain (S/D) extension (LSDE) of nano-node p-channel FinFETs (pFinFETs) on SOI wafer influencing the device performance is exposed, especially in drive current and gate/S/D leakage. In observation, the longer LSDEpFinFET provides a larger series resistance and degrades the drive current (IDS), but the isolation capability between the S/D contacts and the gate electrode is increased. The shorter LSDE plus the shorter channel length demonstrates a higher trans-conductance (G m ) contributing to a higher drive current. Moreover, the subthreshold swing (S.S.) at longer channel length and longer LSDE represents a higher value indicating the higher amount of the interface states which possibly deteriorate the channel mobility causing the lower drive current.
تدمد: 1090-6479
1063-7826
الوصول الحر: https://explore.openaire.eu/search/publication?articleId=doi_________::35c355f44b8729e1533184789481b715Test
https://doi.org/10.1134/s1063782617120120Test
حقوق: CLOSED
رقم الانضمام: edsair.doi...........35c355f44b8729e1533184789481b715
قاعدة البيانات: OpenAIRE