Passivation of the SiNx/GaAs (110) interface

التفاصيل البيبلوغرافية
العنوان: Passivation of the SiNx/GaAs (110) interface
المؤلفون: K. Rajesh, L. J. Huang, W. M. Lau, J. M. Baribeau, S. Ingrey, Dolf Landheer
المصدر: Canadian Journal of Physics. 74:100-103
بيانات النشر: Canadian Science Publishing, 1996.
سنة النشر: 1996
مصطلحات موضوعية: Physics, Passivation, Photoemission spectroscopy, business.industry, Interface (computing), General Physics and Astronomy, Gate insulator, Substrate (electronics), law.invention, Capacitor, chemistry.chemical_compound, Silicon nitride, chemistry, law, Optoelectronics, business, Deposition (law)
الوصف: Passivation of the SiNx/GaAs (110) interface was performed with different surface treatments including sulphur passivation and a Si or Si/Ge interface control layer on sulphur-passivated surfaces prior to silicon nitride deposition. The interface state density was measured with capacitance–voltage (CV) measurements of metal–insulator–semiconductor capacitors fabricated on the passivated surfaces using remote plasma-deposited silicon nitride as the gate insulator. The interface structures of the capacitors were analyzed by X-ray reflectivity and X-ray photoemission spectroscopy. It was found that the Si/Ge/S multilayer passivation approach led to the best CV results for an n-type substrate. The results also show that sulphur passivation could suppress As(Ga) segregation and that the interfacial atomic structure was not the only factor that determines the passivation. By comparing the quasi-static and high-frequency (1 MHz) CV data, we found that the minimum interface state density of the fabricated capacitors made on n-type substrates was about 1012 eV−1 cm−2.
تدمد: 1208-6045
0008-4204
الوصول الحر: https://explore.openaire.eu/search/publication?articleId=doi_________::abff3fb06141ad364a3d94a9761fe500Test
https://doi.org/10.1139/p96-841Test
حقوق: CLOSED
رقم الانضمام: edsair.doi...........abff3fb06141ad364a3d94a9761fe500
قاعدة البيانات: OpenAIRE