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المؤلفون: A. Shimazaki, N. Hirashita, I. Nishiyama, T. Matsunaga, M. Matsuura, Mizuho Morita, T. Jimbo, H. Okumura, N. Yabumoto, M. Nishizuka
المصدر: Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films. 19:1255-1260
مصطلحات موضوعية: Materials science, Silicon, Thermal desorption spectroscopy, Analytical chemistry, chemistry.chemical_element, Surfaces and Interfaces, Substrate (electronics), Condensed Matter Physics, Temperature measurement, Isothermal process, Surfaces, Coatings and Films, chemistry, Desorption, Calibration, Wafer
الوصول الحر: https://explore.openaire.eu/search/publication?articleId=doi_________::05d13c87b7e07235f136a2c8a335e68cTest
https://doi.org/10.1116/1.1380231Test -
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المصدر: Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films. 8:3337-3340
مصطلحات موضوعية: Chemical substance, Materials science, Moisture, Passivation, Metallurgy, Surfaces and Interfaces, Condensed Matter Physics, Surfaces, Coatings and Films, Metal, Outgassing, Volume (thermodynamics), visual_art, visual_art.visual_art_medium, Science, technology and society, Layer (electronics)
الوصول الحر: https://explore.openaire.eu/search/publication?articleId=doi_________::cef702e1f93cbddf677b796ab3a3a058Test
https://doi.org/10.1116/1.576546Test