المؤلفون: A. Amini, Morteza Fathipour, M. Mehran, S. Mohajerzadeh, Soheil Azimi, Amin Vali

المصدر: Journal of Vacuum Science & Technology B, Nanotechnology and Microelectronics: Materials, Processing, Measurement, and Phenomena. 28:1125-1131

مصطلحات موضوعية: Materials science, Silicon, Passivation, business.industry, Process Chemistry and Technology, chemistry.chemical_element, Nanotechnology, Surfaces, Coatings and Films, Electronic, Optical and Magnetic Materials, chemistry, Etching (microfabrication), Materials Chemistry, Deep reactive-ion etching, Optoelectronics, Dry etching, Electrical and Electronic Engineering, Reactive-ion etching, Silicon oxide, business, Instrumentation, Power density

الوصول الحر: https://explore.openaire.eu/search/publication?articleId=doi_________::c602bf0b8daf6e007b93499ff9e7ec13Test
https://doi.org/10.1116/1.3497033Test

المؤلفون: S.-B. Jo, M.-W. Lee, S.-G. Lee, E.-H. Lee, S.-G. Park, B.-H. O

المصدر: Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films. 23:905-910

مصطلحات موضوعية: Fabrication, Materials science, Passivation, Silicon, business.industry, Hybrid silicon laser, Nanocrystalline silicon, chemistry.chemical_element, Nanotechnology, Surfaces and Interfaces, Substrate (electronics), Condensed Matter Physics, Surfaces, Coatings and Films, chemistry, Etching (microfabrication), Optoelectronics, Deposition (phase transition), business

الوصول الحر: https://explore.openaire.eu/search/publication?articleId=doi_________::a7a5ed3e897501e440a5f70287d27a40Test
https://doi.org/10.1116/1.1943467Test

المؤلفون: Jyrki Kiihamäki

المصدر: Kiihamäki, J 2000, ' Deceleration of silicon etch rate at high aspect ratios ', Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films, vol. 18, no. 4, pp. 1385-1389 . https://doi.org/10.1116/1.582359Test

مصطلحات موضوعية: Materials science, Silicon, Passivation, business.industry, Conductance, chemistry.chemical_element, Nanotechnology, Surfaces and Interfaces, Condensed Matter Physics, Aspect ratio (image), Surfaces, Coatings and Films, chemistry, Etch pit density, Etching (microfabrication), Deep reactive-ion etching, Optoelectronics, business, Deposition (law)

الوصول الحر: https://explore.openaire.eu/search/publication?articleId=doi_dedup___::b621ec869ae959397a2da6f1f75044a5Test
https://doi.org/10.1116/1.582359Test

المؤلفون: Rudolf Hezel, Armin G. Aberle, Thomas Lauinger, Jens Moschner

المصدر: Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films. 16:530-543

مصطلحات موضوعية: Materials science, Silicon, Passivation, business.industry, Nanocrystalline silicon, chemistry.chemical_element, Nanotechnology, Surfaces and Interfaces, Chemical vapor deposition, Condensed Matter Physics, Surfaces, Coatings and Films, Monocrystalline silicon, chemistry.chemical_compound, Silicon nitride, chemistry, Plasma-enhanced chemical vapor deposition, Optoelectronics, Crystalline silicon, business

الوصول الحر: https://explore.openaire.eu/search/publication?articleId=doi_________::0f802ea226629c426c6552b89771b0b8Test
https://doi.org/10.1116/1.581095Test

المؤلفون: G. Lucovsky, Z. Lu, Klaus J. Bachmann, Nikolaus Dietz, S. Habermehl

المصدر: Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films. 12:990-994

مصطلحات موضوعية: Materials science, Passivation, Low-energy electron diffraction, Silicon, Analytical chemistry, chemistry.chemical_element, Nanotechnology, Surfaces and Interfaces, Chemical vapor deposition, Condensed Matter Physics, Epitaxy, Surfaces, Coatings and Films, chemistry, Remote plasma, Thin film, Vicinal

الوصول الحر: https://explore.openaire.eu/search/publication?articleId=doi_________::18c0ec350c28e1c178f97da16dc97236Test
https://doi.org/10.1116/1.579077Test

المؤلفون: D. J. Johnson, Paola Atkinson, Neil J. Curson, Donald A. MacLaren, William Allison, Bodil Holst

المصدر: Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films. 20:285-287

مصطلحات موضوعية: Silicon, Passivation, Hydrogen, chemistry.chemical_element, Nanotechnology, Surfaces and Interfaces, Condensed Matter Physics, Oxygen, Surfaces, Coatings and Films, Crystal, chemistry, Chemical engineering, Scientific method, Microscopy, Inert gas

الوصول الحر: https://explore.openaire.eu/search/publication?articleId=doi_________::5d586f92140e5eee2b8f8b33d205d01dTest
https://doi.org/10.1116/1.1419084Test

المؤلفون: Mark Kiehlbauch, David N. Ruzic, Kevin J. Torek, Zihao Ouyang, Alex J. Schrinsky, Wenyu Xu

المصدر: Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films. 32:041303

مصطلحات موضوعية: Through-silicon via, Passivation, Silicon, business.industry, chemistry.chemical_element, Nanotechnology, Surfaces and Interfaces, Condensed Matter Physics, Finite element method, Surfaces, Coatings and Films, Ion, chemistry, Etching (microfabrication), Optoelectronics, Deposition (phase transition), Reactive-ion etching, business

الوصول الحر: https://explore.openaire.eu/search/publication?articleId=doi_________::8ff4e037c6b9c1ea4eab8002d897e0d9Test
https://doi.org/10.1116/1.4882215Test

المؤلفون: Stacey F. Bent, Andrew V. Teplyakov

المصدر: Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films. 31:050810

مصطلحات موضوعية: Silicon, Passivation, business.industry, chemistry.chemical_element, Nanotechnology, Surfaces and Interfaces, Semiconductor device, Condensed Matter Physics, Surfaces, Coatings and Films, Semiconductor, chemistry, Microelectronics, Surface modification, Energy transformation, Electronics, business

الوصول الحر: https://explore.openaire.eu/search/publication?articleId=doi_________::046095b6d5cc859a27af4cc4e42cea9cTest
https://doi.org/10.1116/1.4810784Test

المؤلفون: Daniel S. Engstrøm, Yeong-Ah Soh

المصدر: Journal of Vacuum Science & Technology B, Nanotechnology and Microelectronics: Materials, Processing, Measurement, and Phenomena. 31:021806

مصطلحات موضوعية: Materials science, Silicon, Passivation, business.industry, Process Chemistry and Technology, Nanowire, chemistry.chemical_element, Tapering, Nanotechnology, Surfaces, Coatings and Films, Electronic, Optical and Magnetic Materials, Ion, chemistry, Materials Chemistry, Deep reactive-ion etching, Optoelectronics, Electrical and Electronic Engineering, Reactive-ion etching, business, Instrumentation, Layer (electronics)

الوصول الحر: https://explore.openaire.eu/search/publication?articleId=doi_________::9f9917c7d95cdfe9faafbecf37ed3069Test
https://doi.org/10.1116/1.4793500Test

المؤلفون: G Gijs Dingemans, Wmm Erwin Kessels

المساهمون: Plasma & Materials Processing, Atomic scale processing, Processing of low-dimensional nanomaterials

المصدر: Journal of Vacuum Science and Technology A: Vacuum, Surfaces, and Films, 30(4):040802, 040802-1/27. AVS Science and Technology Society

مصطلحات موضوعية: Materials science, Passivation, Silicon, Solar electricity, business.industry, chemistry.chemical_element, Nanotechnology, Context (language use), Surfaces and Interfaces, Condensed Matter Physics, Surfaces, Coatings and Films, Atomic layer deposition, chemistry, Photovoltaics, Nanometre, Thin film, business

وصف الملف: application/pdf

الوصول الحر: https://explore.openaire.eu/search/publication?articleId=doi_dedup___::495d7c0a7083e7e6bd9982ee4a8b467fTest
https://doi.org/10.1116/1.4728205Test