المؤلفون: Yordan M. Georgiev, Anushka S. Gangnaik, Gillian Collins, Justin D. Holmes

المصدر: Journal of Vacuum Science & Technology B, Nanotechnology and Microelectronics: Materials, Processing, Measurement, and Phenomena. 34:041603

مصطلحات موضوعية: Materials science, Passivation, Process Chemistry and Technology, Oxide, chemistry.chemical_element, Germanium, Nanotechnology, 02 engineering and technology, 010402 general chemistry, 021001 nanoscience & nanotechnology, 01 natural sciences, 0104 chemical sciences, Surfaces, Coatings and Films, Electronic, Optical and Magnetic Materials, chemistry.chemical_compound, Resist, chemistry, Materials Chemistry, Surface modification, Electrical and Electronic Engineering, 0210 nano-technology, Instrumentation, Layer (electronics), Hydrogen silsesquioxane, Electron-beam lithography

الوصول الحر: https://explore.openaire.eu/search/publication?articleId=doi_________::533e416c75f839c2b3e3f380e83e3007Test
https://doi.org/10.1116/1.4948916Test

المؤلفون: Filippos Farmakis, Yufeng Hao, Ioannis Kymissis, Konstantinos Alexandrou, James Hone, Nikolaos Georgoulas, Alexandros Arapis

المصدر: Journal of Vacuum Science & Technology B, Nanotechnology and Microelectronics: Materials, Processing, Measurement, and Phenomena. 34:041805

مصطلحات موضوعية: Materials science, Passivation, Annealing (metallurgy), chemistry.chemical_element, Nanotechnology, 02 engineering and technology, 01 natural sciences, Oxygen, law.invention, Aluminium, law, Desorption, 0103 physical sciences, Materials Chemistry, Electrical and Electronic Engineering, Instrumentation, 010302 applied physics, business.industry, Graphene, Process Chemistry and Technology, 021001 nanoscience & nanotechnology, Surfaces, Coatings and Films, Electronic, Optical and Magnetic Materials, chemistry, Optoelectronics, Field-effect transistor, 0210 nano-technology, business, Water vapor

الوصول الحر: https://explore.openaire.eu/search/publication?articleId=doi_________::9ef6a96fece593ef188525ac676fe2bcTest
https://doi.org/10.1116/1.4952409Test

المؤلفون: Maxime Darnon, Laurent Vallier, L. Mollard, Thorsten Lill, Olivier Joubert, Thierry Chevolleau, Erwine Pargon

المساهمون: Laboratoire des technologies de la microélectronique (LTM), Commissariat à l'énergie atomique et aux énergies alternatives (CEA)-Université Joseph Fourier - Grenoble 1 (UJF)-Centre National de la Recherche Scientifique (CNRS), Clot, Marielle, Université Joseph Fourier - Grenoble 1 (UJF)-Commissariat à l'énergie atomique et aux énergies alternatives (CEA)-Centre National de la Recherche Scientifique (CNRS)

المصدر: Journal of Vacuum Science and Technology
Journal of Vacuum Science and Technology, American Vacuum Society (AVS), 2005, B 23, pp.1913-1923
Journal of Vacuum Science and Technology, 2005, B 23, pp.1913-1923

مصطلحات موضوعية: 010302 applied physics, Silicon, Passivation, Plasma parameters, business.industry, General Engineering, chemistry.chemical_element, High density, Nanotechnology, 02 engineering and technology, Plasma, 021001 nanoscience & nanotechnology, 01 natural sciences, chemistry, Resist, Gate oxide, 0103 physical sciences, Optoelectronics, 0210 nano-technology, business, Critical dimension, ComputingMilieux_MISCELLANEOUS

الوصول الحر: https://explore.openaire.eu/search/publication?articleId=doi_dedup___::df1d2d19a379aa28c64c66beb5d1d6eaTest
https://doi.org/10.1116/1.2008272Test