مؤتمر
Instability trade-off of inter-layer or inter-metal dielectrics formation with low-k dielectrics on active and field device's characteristics
| العنوان: | Instability trade-off of inter-layer or inter-metal dielectrics formation with low-k dielectrics on active and field device's characteristics |
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| المؤلفون: | Chen, M.J., Shih, J.R., Yu, K.F., Hsieh, C.C., Sung, W.L., Lin, F.S., Chu, L.H., Shiue, R.Y., Peng, Y.K., Yue, J.T. |
| المصدر: | 2001 6th International Symposium on Plasma- and Process-Induced Damage (IEEE Cat. No.01TH8538) |
| بيانات النشر: | American Vacuum Soc |
| سنة النشر: | 2002 |
| نوع الوثيقة: | conference object |
| اللغة: | unknown |
| DOI: | 10.1109/ppid.2001.929967 |
| الإتاحة: | https://doi.org/10.1109/ppid.2001.929967Test http://xplorestaging.ieee.org/ielx5/7404/20112/00929967.pdf?arnumber=929967Test |
| رقم الانضمام: | edsbas.F346FD48 |
| قاعدة البيانات: | BASE |
| DOI: | 10.1109/ppid.2001.929967 |
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