التفاصيل البيبلوغرافية
| العنوان: |
An ultra-high vacuum system for fabricating clean two-dimensional material devices. |
| المؤلفون: |
Guo, Shuaifei, Luo, Mingyan, Shi, Gang, Tian, Ning, Huang, Zhe, Yang, Fangyuan, Ma, Liguo, Wang, Nai Zhou, Shi, Qinzhen, Xu, Kailiang, Xu, Zihan, Watanabe, Kenji, Taniguchi, Takashi, Chen, Xian Hui, Shen, Dawei, Zhang, Liyuan, Ruan, Wei, Zhang, Yuanbo |
| المصدر: |
Review of Scientific Instruments; Jan2023, Vol. 94 Issue 1, p1-10, 10p |
| مصطلحات موضوعية: |
ULTRAHIGH vacuum, CONDENSED matter physics, ELECTRON mobility, ELECTRON gas, HETEROSTRUCTURES |
| مستخلص: |
High mobility electron gases confined at material interfaces have been a venue for major discoveries in condensed matter physics. Ultra-high vacuum (UHV) technologies played a key role in creating such high-quality interfaces. The advent of two-dimensional (2D) materials brought new opportunities to explore exotic physics in flat lands. UHV technologies may once again revolutionize research in low dimensions by facilitating the construction of ultra-clean interfaces with a wide variety of 2D materials. Here, we describe the design and operation of a UHV 2D material device fabrication system, in which the entire fabrication process is performed under pressure lower than 5 × 10−10 mbar. Specifically, the UHV system enables the exfoliation of atomically clean 2D materials. Subsequent in situ assembly of van der Waals heterostructures produces high-quality interfaces that are free of contamination. We demonstrate functionalities of this system through exemplary fabrication of various 2D materials and their heterostructures. [ABSTRACT FROM AUTHOR] |
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| قاعدة البيانات: |
Complementary Index |
