دورية أكاديمية
Effect of boron concentration on local structure and spontaneous polarization in AlBN thin films
| العنوان: | Effect of boron concentration on local structure and spontaneous polarization in AlBN thin films |
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| المؤلفون: | S. Calderon V, John Hayden, M. Delower, Jon-Paul Maria, Elizabeth C. Dickey |
| المصدر: | APL Materials, Vol 12, Iss 2, Pp 021105-021105-7 (2024) |
| بيانات النشر: | AIP Publishing LLC, 2024. |
| سنة النشر: | 2024 |
| المجموعة: | LCC:Biotechnology LCC:Physics |
| مصطلحات موضوعية: | Biotechnology, TP248.13-248.65, Physics, QC1-999 |
| الوصف: | The discovery of ferroelectricity in polar wurtzite-based ternary materials, such as Al1−xBxN, has attracted attention due to their compatibility with complementary metal–oxide–semiconductor processes and potential use in integrated non-volatile memory devices. However, the origin of ferroelectricity and the fundamental control of the polarization switching in these materials are still under intensive investigation but appear to be related to local disorder induced from the alloying. In this work, we report the effect of boron alloying on the local structure of Al1−xBxN films deposited by magnetron sputtering. Our results reveal a diminished crystalline order as a function of boron concentration, accompanied by a reduction in the spontaneous polarization. The film disorder is primarily associated with the dissimilar bond lengths between Al–N and B–N and the formation of threading dislocations induced by B incorporation in the structure. |
| نوع الوثيقة: | article |
| وصف الملف: | electronic resource |
| اللغة: | English |
| تدمد: | 2166-532X |
| العلاقة: | https://doaj.org/toc/2166-532XTest |
| DOI: | 10.1063/5.0179942 |
| الوصول الحر: | https://doaj.org/article/bb0b0a997ce64e2eb42a85b29cc69bdaTest |
| رقم الانضمام: | edsdoj.bb0b0a997ce64e2eb42a85b29cc69bda |
| قاعدة البيانات: | Directory of Open Access Journals |
Full Text Finder | تدمد: | 2166532X |
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| DOI: | 10.1063/5.0179942 |