المؤلفون: Yamamoto, Kei, Takahashi, Kotaro, Nagasaki, Hideo, Yoshino, Fumihiro, Motoyama, Hiroki, Uno, Seiji, Yamaguchi, Shuhei

المساهمون: Kojima, Yosuke

المصدر: Photomask Japan 2023: XXIX Symposium on Photomask and Next-Generation Lithography Mask Technology

الإتاحة: https://doi.org/10.1117/12.2685159Test

المؤلفون: Yamamoto, Kei, Takahashi, Kotaro, Nagasaki, Hideo, Yoshino, Fumihiro, Motoyama, Hiroki, Uno, Seiji, Yamaguchi, Shuhei

المساهمون: Kasprowicz, Bryan S., Liang, Ted

المصدر: Photomask Technology 2022

الإتاحة: https://doi.org/10.1117/12.2639980Test

المؤلفون: Shirakawa, Michihiro, Tsubaki, Hideaki, Furutani, Hajime, Nihashi, Wataru, Tango, Naohiro, Marumo, Kazuhiro, Yamamoto, Kei, Takahashi, Hidenori, Goto, Akiyoshi, Fujita, Mitsuhiro

المساهمون: Hohle, Christoph K., Gronheid, Roel

المصدر: SPIE Proceedings ; Advances in Patterning Materials and Processes XXXIV ; ISSN 0277-786X

الإتاحة: https://doi.org/10.1117/12.2257956Test

المؤلفون: Tsubaki, Hideaki, Nihashi, Wataru, Tsuchihashi, Toru, Yamamoto, Kei, Goto, Takahiro

المساهمون: Panning, Eric M., Goldberg, Kenneth A.

المصدر: Extreme Ultraviolet (EUV) Lithography VII ; SPIE Proceedings ; ISSN 0277-786X

الإتاحة: https://doi.org/10.1117/12.2218761Test

المؤلفون: Tarutani, Shinji, Fujii, Kana, Yamamoto, Kei, Iwato, Kaoru, Shirakawa, Michihiro

المساهمون: Somervell, Mark H., Wallow, Thomas I.

المصدر: SPIE Proceedings ; Advances in Resist Materials and Processing Technology XXIX ; ISSN 0277-786X

الإتاحة: https://doi.org/10.1117/12.916281Test

المؤلفون: Kanna, Shinichi, Inabe, Haruki, Yamamoto, Kei, Fukuhara, Toshiaki, Tarutani, Shinji, Kanda, Hiromi, Kenji, Wada, Kodama, Kunihiko, Shitabatake, Koji

المساهمون: Lin, Qinghuang

المصدر: SPIE Proceedings ; Advances in Resist Technology and Processing XXIII ; ISSN 0277-786X

الإتاحة: https://doi.org/10.1117/12.657805Test

المؤلفون: Kanna, Shinichi, Inabe, Haruki, Yamamoto, Kei, Tarutani, Shinji, Kanda, Hiromi, Mizutani, Kazuyoshi, Kitada, Kazuyuki, Uno, Seiji, Kawabe, Yasumasa

المساهمون: Sturtevant, John L.

المصدر: SPIE Proceedings ; Advances in Resist Technology and Processing XXII ; ISSN 0277-786X

الإتاحة: https://doi.org/10.1117/12.600490Test